DE3878331D1 - Vakuumbogen-fluessigmetall-ionenquelle. - Google Patents

Vakuumbogen-fluessigmetall-ionenquelle.

Info

Publication number
DE3878331D1
DE3878331D1 DE8888201511T DE3878331T DE3878331D1 DE 3878331 D1 DE3878331 D1 DE 3878331D1 DE 8888201511 T DE8888201511 T DE 8888201511T DE 3878331 T DE3878331 T DE 3878331T DE 3878331 D1 DE3878331 D1 DE 3878331D1
Authority
DE
Germany
Prior art keywords
metal ion
ion source
liquid metal
vacuum arc
arc liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888201511T
Other languages
English (en)
Other versions
DE3878331T2 (de
Inventor
Henri Societe Civile Bernardet
Jean-Claude Societe Ci Pauwels
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3878331D1 publication Critical patent/DE3878331D1/de
Publication of DE3878331T2 publication Critical patent/DE3878331T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/22—Metal ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
DE8888201511T 1987-07-22 1988-07-14 Vakuumbogen-fluessigmetall-ionenquelle. Expired - Fee Related DE3878331T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8710391A FR2618604B1 (fr) 1987-07-22 1987-07-22 Source d'ions de metaux liquides a arc sous vide

Publications (2)

Publication Number Publication Date
DE3878331D1 true DE3878331D1 (de) 1993-03-25
DE3878331T2 DE3878331T2 (de) 1993-08-05

Family

ID=9353437

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888201511T Expired - Fee Related DE3878331T2 (de) 1987-07-22 1988-07-14 Vakuumbogen-fluessigmetall-ionenquelle.

Country Status (5)

Country Link
US (1) US5008585A (de)
EP (1) EP0300566B1 (de)
JP (1) JPH01157046A (de)
DE (1) DE3878331T2 (de)
FR (1) FR2618604B1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0399374B1 (de) * 1989-05-26 1995-04-19 Micrion Corporation Herstellungsverfahren und Vorrichtung für Ionenquelle
US5089707A (en) * 1990-11-14 1992-02-18 Ism Technologies, Inc. Ion beam generating apparatus with electronic switching between multiple cathodes
JP3060876B2 (ja) * 1995-02-15 2000-07-10 日新電機株式会社 金属イオン注入装置
US7058024B1 (en) 1999-02-03 2006-06-06 Lucent Technologies, Inc. Automatic telecommunications link identification system
US7276847B2 (en) * 2000-05-17 2007-10-02 Varian Semiconductor Equipment Associates, Inc. Cathode assembly for indirectly heated cathode ion source
AT500917B8 (de) * 2004-07-20 2007-02-15 Arc Seibersdorf Res Gmbh Flüssigmetall-ionenquelle
JP4988327B2 (ja) * 2006-02-23 2012-08-01 ルネサスエレクトロニクス株式会社 イオン注入装置
KR20080112790A (ko) * 2007-06-22 2008-12-26 삼성전자주식회사 반도체 소자의 박막 형성 방법
DE102007058504A1 (de) 2007-12-05 2009-07-09 Acino Ag Transdermales therapeutisches System mit einem Gehalt an einem Modulator für nikotinische Acetylcholinrezeptoren (nAChR)
US10580610B2 (en) * 2013-03-15 2020-03-03 General Electric Company Cold cathode switching device and converter
CN104217911A (zh) * 2013-10-18 2014-12-17 常州博锐恒电子科技有限公司 一种侧引出mevva金属离子源
JP6927493B2 (ja) * 2016-10-11 2021-09-01 国立大学法人横浜国立大学 イオン源
US11728140B1 (en) * 2022-01-31 2023-08-15 Axcelis Technologies, Inc. Hydraulic feed system for an ion source

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57205953A (en) * 1981-06-12 1982-12-17 Jeol Ltd Ion source
JPS58163135A (ja) * 1982-03-20 1983-09-27 Nippon Denshi Zairyo Kk イオン源
JPS61142645A (ja) * 1984-12-17 1986-06-30 Hitachi Ltd 正，負兼用イオン源
US4638210A (en) * 1985-04-05 1987-01-20 Hughes Aircraft Company Liquid metal ion source
JPS62259332A (ja) * 1985-10-23 1987-11-11 Nippon Denshi Zairyo Kk イオン発生装置

Also Published As

Publication number Publication date
FR2618604A1 (fr) 1989-01-27
EP0300566B1 (de) 1993-02-10
DE3878331T2 (de) 1993-08-05
JPH01157046A (ja) 1989-06-20
FR2618604B1 (fr) 1989-11-24
US5008585A (en) 1991-04-16
EP0300566A1 (de) 1989-01-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee