DE3689349D1 - Ionenquelle. - Google Patents
Ionenquelle.Info
- Publication number
- DE3689349D1 DE3689349D1 DE86113440T DE3689349T DE3689349D1 DE 3689349 D1 DE3689349 D1 DE 3689349D1 DE 86113440 T DE86113440 T DE 86113440T DE 3689349 T DE3689349 T DE 3689349T DE 3689349 D1 DE3689349 D1 DE 3689349D1
- Authority
- DE
- Germany
- Prior art keywords
- ion source
- ion
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60214627A JPS6276137A (ja) | 1985-09-30 | 1985-09-30 | イオン源 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3689349D1 true DE3689349D1 (de) | 1994-01-13 |
DE3689349T2 DE3689349T2 (de) | 1994-05-19 |
Family
ID=16658865
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3689349T Expired - Fee Related DE3689349T2 (de) | 1985-09-30 | 1986-09-30 | Ionenquelle. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4713585A (de) |
EP (1) | EP0217361B1 (de) |
JP (1) | JPS6276137A (de) |
DE (1) | DE3689349T2 (de) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0654644B2 (ja) * | 1985-10-04 | 1994-07-20 | 株式会社日立製作所 | イオン源 |
JPH0711072B2 (ja) * | 1986-04-04 | 1995-02-08 | 株式会社日立製作所 | イオン源装置 |
JP2582552B2 (ja) * | 1986-05-29 | 1997-02-19 | 三菱電機株式会社 | イオン注入装置 |
US4947085A (en) * | 1987-03-27 | 1990-08-07 | Mitsubishi Denki Kabushiki Kaisha | Plasma processor |
JPS63244619A (ja) * | 1987-03-30 | 1988-10-12 | Sumitomo Metal Ind Ltd | プラズマ装置 |
US4973883A (en) * | 1987-05-01 | 1990-11-27 | Semiconductor Energy Laborator Co., Ltd. | Plasma processing apparatus with a lisitano coil |
US5059866A (en) * | 1987-10-01 | 1991-10-22 | Apricot S.A. | Method and apparatus for cooling electrons, ions or plasma |
JPH01132033A (ja) * | 1987-11-17 | 1989-05-24 | Hitachi Ltd | イオン源及び薄膜形成装置 |
DE3803355A1 (de) * | 1988-02-05 | 1989-08-17 | Leybold Ag | Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage |
DE68926923T2 (de) * | 1988-03-16 | 1996-12-19 | Hitachi Ltd | Mikrowellenionenquelle |
US5146138A (en) * | 1988-04-05 | 1992-09-08 | Mitsubishi Denki Kabushiki Kaisha | Plasma processor |
US5115167A (en) * | 1988-04-05 | 1992-05-19 | Mitsubishi Denki Kabushiki Kaisha | Plasma processor |
JP2618001B2 (ja) * | 1988-07-13 | 1997-06-11 | 三菱電機株式会社 | プラズマ反応装置 |
US5003178A (en) * | 1988-11-14 | 1991-03-26 | Electron Vision Corporation | Large-area uniform electron source |
GB8905073D0 (en) * | 1989-03-06 | 1989-04-19 | Nordiko Ltd | Ion gun |
US5227695A (en) * | 1989-06-05 | 1993-07-13 | Centre National De La Recherche Scientifique | Device for coupling microwave energy with an exciter and for distributing it therealong for the purpose of producing a plasma |
US5841236A (en) * | 1989-10-02 | 1998-11-24 | The Regents Of The University Of California | Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication |
US5032202A (en) * | 1989-10-03 | 1991-07-16 | Martin Marietta Energy Systems, Inc. | Plasma generating apparatus for large area plasma processing |
US5081398A (en) * | 1989-10-20 | 1992-01-14 | Board Of Trustees Operating Michigan State University | Resonant radio frequency wave coupler apparatus using higher modes |
US5208512A (en) * | 1990-10-16 | 1993-05-04 | International Business Machines Corporation | Scanned electron cyclotron resonance plasma source |
US5190703A (en) * | 1990-12-24 | 1993-03-02 | Himont, Incorporated | Plasma reactor chamber |
FR2671931A1 (fr) * | 1991-01-22 | 1992-07-24 | Metal Process | Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma. |
IT1246684B (it) * | 1991-03-07 | 1994-11-24 | Proel Tecnologie Spa | Propulsore ionico a risonanza ciclotronica. |
US5189446A (en) * | 1991-05-17 | 1993-02-23 | International Business Machines Corporation | Plasma wafer processing tool having closed electron cyclotron resonance |
CA2102201A1 (en) * | 1991-05-21 | 1992-11-22 | Ebrahim Ghanbari | Cluster tool soft etch module and ecr plasma generator therefor |
US5306985A (en) * | 1992-07-17 | 1994-04-26 | Sematech, Inc. | ECR apparatus with magnetic coil for plasma refractive index control |
DE4403125A1 (de) * | 1994-02-02 | 1995-08-03 | Fraunhofer Ges Forschung | Vorrichtung zur Plasmaerzeugung |
CN1076863C (zh) * | 1994-06-10 | 2001-12-26 | 松下电器产业株式会社 | 半导体元件的制造设备及制造方法 |
IT1269413B (it) * | 1994-10-21 | 1997-04-01 | Proel Tecnologie Spa | Sorgente di plasma a radiofrequenza |
GB2311164A (en) * | 1996-03-13 | 1997-09-17 | Atomic Energy Authority Uk | Large area plasma generator |
US6356188B1 (en) | 2000-09-25 | 2002-03-12 | Ford Global Technologies, Inc. | Wheel lift identification for an automotive vehicle |
US8158016B2 (en) * | 2004-02-04 | 2012-04-17 | Veeco Instruments, Inc. | Methods of operating an electromagnet of an ion source |
DE102007051444B4 (de) * | 2007-10-25 | 2012-11-08 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zum Trockenätzen von kontinuierlich bewegten Materialien |
KR20110032679A (ko) * | 2009-09-23 | 2011-03-30 | 현대자동차주식회사 | 광택특성이 향상된 플라스틱 및 플라스틱 표면의 광택 처리 방법 |
KR101134480B1 (ko) * | 2009-09-28 | 2012-04-13 | 현대자동차주식회사 | 나노 엠보 패턴 표면을 갖는 플라스틱 및 이의 제조 방법 |
US8907307B2 (en) * | 2011-03-11 | 2014-12-09 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and method for maskless patterned implantation |
US8692468B2 (en) * | 2011-10-03 | 2014-04-08 | Varian Semiconductor Equipment Associates, Inc. | Transformer-coupled RF source for plasma processing tool |
DE102013225608A1 (de) * | 2013-12-11 | 2015-06-11 | Apo Gmbh Massenkleinteilbeschichtung | Vorrichtung und Verfahren zur Oberflächenbehandlung von Kleinteilen mittels Plasma |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3230418A (en) * | 1961-06-23 | 1966-01-18 | Raphael A Dandl | Device having high-gradient magnetic cusp geometry |
JPS5947421B2 (ja) * | 1980-03-24 | 1984-11-19 | 株式会社日立製作所 | マイクロ波イオン源 |
FR2550681B1 (fr) * | 1983-08-12 | 1985-12-06 | Centre Nat Rech Scient | Source d'ions a au moins deux chambres d'ionisation, en particulier pour la formation de faisceaux d'ions chimiquement reactifs |
FR2556498B1 (fr) * | 1983-12-07 | 1986-09-05 | Commissariat Energie Atomique | Source d'ions multicharges a plusieurs zones de resonance cyclotronique electronique |
US4647818A (en) * | 1984-04-16 | 1987-03-03 | Sfe Technologies | Nonthermionic hollow anode gas discharge electron beam source |
JPH0740468B2 (ja) * | 1984-12-11 | 1995-05-01 | 株式会社日立製作所 | 高周波プラズマ発生装置 |
US4652795A (en) * | 1985-03-14 | 1987-03-24 | Denton Vacuum Inc. | External plasma gun |
-
1985
- 1985-09-30 JP JP60214627A patent/JPS6276137A/ja active Granted
-
1986
- 1986-09-26 US US06/911,790 patent/US4713585A/en not_active Expired - Fee Related
- 1986-09-30 DE DE3689349T patent/DE3689349T2/de not_active Expired - Fee Related
- 1986-09-30 EP EP86113440A patent/EP0217361B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0217361A2 (de) | 1987-04-08 |
EP0217361A3 (en) | 1988-08-03 |
EP0217361B1 (de) | 1993-12-01 |
US4713585A (en) | 1987-12-15 |
JPH0564407B2 (de) | 1993-09-14 |
JPS6276137A (ja) | 1987-04-08 |
DE3689349T2 (de) | 1994-05-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |