DE3688808D1 - Fluessigmetall-ionenquelle. - Google Patents

Fluessigmetall-ionenquelle.

Info

Publication number
DE3688808D1
DE3688808D1 DE8686107046T DE3688808T DE3688808D1 DE 3688808 D1 DE3688808 D1 DE 3688808D1 DE 8686107046 T DE8686107046 T DE 8686107046T DE 3688808 T DE3688808 T DE 3688808T DE 3688808 D1 DE3688808 D1 DE 3688808D1
Authority
DE
Germany
Prior art keywords
metal ion
ion source
liquid metal
liquid
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686107046T
Other languages
English (en)
Other versions
DE3688808T2 (de
Inventor
Hifumi Tamura
Tohru Ishitani
Kaoru Umemura
Yoshimi Kawanami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE3688808D1 publication Critical patent/DE3688808D1/de
Application granted granted Critical
Publication of DE3688808T2 publication Critical patent/DE3688808T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
DE86107046T 1985-05-24 1986-05-23 Flüssigmetall-Ionenquelle. Expired - Fee Related DE3688808T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60110474A JPH0746585B2 (ja) 1985-05-24 1985-05-24 イオンビーム装置およびイオンビーム形成方法

Publications (2)

Publication Number Publication Date
DE3688808D1 true DE3688808D1 (de) 1993-09-09
DE3688808T2 DE3688808T2 (de) 1994-01-05

Family

ID=14536623

Family Applications (1)

Application Number Title Priority Date Filing Date
DE86107046T Expired - Fee Related DE3688808T2 (de) 1985-05-24 1986-05-23 Flüssigmetall-Ionenquelle.

Country Status (4)

Country Link
US (1) US4733134A (de)
EP (1) EP0202685B1 (de)
JP (1) JPH0746585B2 (de)
DE (1) DE3688808T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0308560A1 (de) * 1987-09-22 1989-03-29 Universite De Reims Champagne Ardenne Geladene Teilchenkanone, welche die pulsierte Emission von Teilchen mit einer gewissen Energie erlaubt
JP2528859B2 (ja) * 1987-02-27 1996-08-28 株式会社日立製作所 荷電粒子源
JP2653454B2 (ja) * 1988-02-15 1997-09-17 輝彦 田島 パルスイオンビーム発生装置
US6914386B2 (en) * 2003-06-20 2005-07-05 Applied Materials Israel, Ltd. Source of liquid metal ions and a method for controlling the source
US20090224700A1 (en) * 2004-01-15 2009-09-10 Yu-Jiuan Chen Beam Transport System and Method for Linear Accelerators
US7129513B2 (en) * 2004-06-02 2006-10-31 Xintek, Inc. Field emission ion source based on nanostructure-containing material
US7667209B2 (en) * 2006-07-06 2010-02-23 Hitachi High-Technologies Corporation Focused ION beam apparatus
EP2068343B1 (de) * 2007-11-13 2011-08-31 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Quelle für geladene Teilchen mit automatischer Spitzenformierung
WO2009111149A1 (en) * 2008-03-03 2009-09-11 Alis Corporation Gas field ion source with coated tip
DE102008022181B4 (de) * 2008-05-05 2019-05-02 Arianegroup Gmbh Ionentriebwerk
US8453426B2 (en) * 2009-04-06 2013-06-04 Raytheon Company Current controlled field emission thruster
US9062377B2 (en) * 2012-10-05 2015-06-23 Varian Semiconductor Equipment Associates, Inc. Reducing glitching in an ion implanter
DE102020114999A1 (de) 2020-06-05 2021-12-09 Technische Universität Dresden Verfahren und Vorrichtung zum Betreiben einer Flüssigmetall-Ionenquelle oder Flüssigmetall-Elektronenquelle sowie Flüssigmetall-Ionenquelle oder Flüssigmetall-Elektronenquelle

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4344019A (en) * 1980-11-10 1982-08-10 The United States Of America As Represented By The United States Department Of Energy Penning discharge ion source with self-cleaning aperture
JPS57205953A (en) * 1981-06-12 1982-12-17 Jeol Ltd Ion source
US4422013A (en) * 1981-07-21 1983-12-20 The United States Of America As Represented By The Secretary Of The Navy MPD Intense beam pulser
JPS58169761A (ja) * 1982-03-30 1983-10-06 Jeol Ltd 電界放出型イオンビ−ム発生装置
JPS58198824A (ja) * 1982-05-14 1983-11-18 Hitachi Ltd 電子衝撃型電界放出イオン源
JPS58198815A (ja) * 1982-05-14 1983-11-18 Hitachi Ltd 電子衝撃型電界放出イオン源
JPS58225537A (ja) * 1982-06-25 1983-12-27 Hitachi Ltd イオン源装置
JPS59165356A (ja) * 1983-03-09 1984-09-18 Hitachi Ltd イオン源
JPS60105148A (ja) * 1983-11-11 1985-06-10 Hitachi Ltd 液体金属イオン源
JPH0622094B2 (ja) * 1983-11-28 1994-03-23 株式会社日立製作所 液体金属イオン源
US4629931A (en) * 1984-11-20 1986-12-16 Hughes Aircraft Company Liquid metal ion source

Also Published As

Publication number Publication date
EP0202685B1 (de) 1993-08-04
EP0202685A3 (en) 1989-01-18
JPH0746585B2 (ja) 1995-05-17
JPS61269838A (ja) 1986-11-29
EP0202685A2 (de) 1986-11-26
US4733134A (en) 1988-03-22
DE3688808T2 (de) 1994-01-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee