DE3580521D1 - Mikrowellen-ionenquelle. - Google Patents

Mikrowellen-ionenquelle.

Info

Publication number
DE3580521D1
DE3580521D1 DE8585107117T DE3580521T DE3580521D1 DE 3580521 D1 DE3580521 D1 DE 3580521D1 DE 8585107117 T DE8585107117 T DE 8585107117T DE 3580521 T DE3580521 T DE 3580521T DE 3580521 D1 DE3580521 D1 DE 3580521D1
Authority
DE
Germany
Prior art keywords
ion source
microwave ion
microwave
source
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8585107117T
Other languages
English (en)
Inventor
Yasuhiro Torii
Seitaro Matsuo
Iwao Watanabe
Masaru Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Application granted granted Critical
Publication of DE3580521D1 publication Critical patent/DE3580521D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
DE8585107117T 1984-06-11 1985-06-10 Mikrowellen-ionenquelle. Expired - Lifetime DE3580521D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59118258A JPH0616384B2 (ja) 1984-06-11 1984-06-11 マイクロ波イオン源

Publications (1)

Publication Number Publication Date
DE3580521D1 true DE3580521D1 (de) 1990-12-20

Family

ID=14732167

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585107117T Expired - Lifetime DE3580521D1 (de) 1984-06-11 1985-06-10 Mikrowellen-ionenquelle.

Country Status (5)

Country Link
US (1) US4857809A (de)
EP (1) EP0164715B1 (de)
JP (1) JPH0616384B2 (de)
CA (1) CA1238415A (de)
DE (1) DE3580521D1 (de)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0746588B2 (ja) * 1986-09-09 1995-05-17 日本電信電話株式会社 マイクロ波イオン源
DE3708716C2 (de) * 1987-03-18 1993-11-04 Hans Prof Dr Rer Nat Oechsner Hochfrequenz-ionenquelle
JPS6443950A (en) * 1987-08-10 1989-02-16 Nippon Telegraph & Telephone Microwave ion source
JP2625756B2 (ja) * 1987-09-08 1997-07-02 住友金属工業株式会社 プラズマプロセス装置
US4778561A (en) * 1987-10-30 1988-10-18 Veeco Instruments, Inc. Electron cyclotron resonance plasma source
JPH01120738A (ja) * 1987-11-04 1989-05-12 Nissin Electric Co Ltd マイクロ波イオン源
DE3738352A1 (de) * 1987-11-11 1989-05-24 Technics Plasma Gmbh Filamentloses magnetron-ionenstrahlsystem
DE3803355A1 (de) * 1988-02-05 1989-08-17 Leybold Ag Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage
JPH0735291Y2 (ja) * 1988-03-16 1995-08-09 日新電機株式会社 イオン源
DE68926923T2 (de) * 1988-03-16 1996-12-19 Hitachi Ltd Mikrowellenionenquelle
EP0339554A3 (de) * 1988-04-26 1989-12-20 Hauzer Holding B.V. Hochfrequenz-Ionenstrahlquelle
US4883968A (en) * 1988-06-03 1989-11-28 Eaton Corporation Electron cyclotron resonance ion source
JP2618001B2 (ja) * 1988-07-13 1997-06-11 三菱電機株式会社 プラズマ反応装置
GB8820359D0 (en) * 1988-08-26 1988-09-28 Atomic Energy Authority Uk Charged particle grid
DE3834984A1 (de) * 1988-10-14 1990-04-19 Leybold Ag Einrichtung zur erzeugung von elektrisch geladenen und/oder ungeladenen teilchen
JPH03122273A (ja) * 1989-10-06 1991-05-24 Hitachi Ltd マイクロ波を用いた成膜装置
US5142198A (en) * 1989-12-21 1992-08-25 Applied Science And Technology, Inc. Microwave reactive gas discharge device
GB9009319D0 (en) * 1990-04-25 1990-06-20 Secr Defence Gaseous radical source
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source
US5051659A (en) * 1991-01-30 1991-09-24 The United States Of America As Represented By The Secretary Of The Navy Bulk plasma generation
US5234526A (en) * 1991-05-24 1993-08-10 Lam Research Corporation Window for microwave plasma processing device
JP3076414B2 (ja) * 1991-07-26 2000-08-14 キヤノン株式会社 マイクロ波プラズマｃｖｄ法による堆積膜形成装置
JPH05144397A (ja) * 1991-11-20 1993-06-11 Mitsubishi Electric Corp イオン源
AU5017293A (en) * 1992-09-01 1994-03-29 University Of North Carolina At Chapel Hill, The High pressure magnetically assisted inductively coupled plasma
AU5098293A (en) * 1992-09-02 1994-03-29 University Of North Carolina At Chapel Hill, The Method for plasma processing at high pressures
IT1269413B (it) * 1994-10-21 1997-04-01 Proel Tecnologie Spa Sorgente di plasma a radiofrequenza
US5625259A (en) * 1995-02-16 1997-04-29 Applied Science And Technology, Inc. Microwave plasma applicator with a helical fluid cooling channel surrounding a microwave transparent discharge tube
US6228438B1 (en) * 1999-08-10 2001-05-08 Unakis Balzers Aktiengesellschaft Plasma reactor for the treatment of large size substrates
US8158016B2 (en) * 2004-02-04 2012-04-17 Veeco Instruments, Inc. Methods of operating an electromagnet of an ion source
US7791047B2 (en) * 2003-12-12 2010-09-07 Semequip, Inc. Method and apparatus for extracting ions from an ion source for use in ion implantation
JP2006344527A (ja) * 2005-06-09 2006-12-21 Tdk Corp イオン源
JP4099181B2 (ja) * 2005-07-11 2008-06-11 Ｔｄｋ株式会社 イオンビームエッチング方法及びイオンビームエッチング装置
JP2009132948A (ja) * 2007-11-28 2009-06-18 Toyota Motor Corp プラズマｃｖｄ装置
US7915597B2 (en) * 2008-03-18 2011-03-29 Axcelis Technologies, Inc. Extraction electrode system for high current ion implanter
WO2010132069A1 (en) * 2009-05-15 2010-11-18 Alpha Source Llc Particle beam isotope generator apparatus, system, and method
ES2696227B2 (es) * 2018-07-10 2019-06-12 Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat Fuente de iones interna para ciclotrones de baja erosion
CN109411319A (zh) * 2018-11-16 2019-03-01 合肥飞帆等离子科技有限公司 一种新型等离子体阴极电子束源及3d打印机
CN115665962B (zh) * 2022-12-19 2024-01-23 广东省新兴激光等离子体技术研究院 引出带状离子束的离子源

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5820118B2 (ja) * 1975-10-29 1983-04-21 株式会社日立製作所 イオンカソクソウチ
US4058748A (en) * 1976-05-13 1977-11-15 Hitachi, Ltd. Microwave discharge ion source
JPS55141729A (en) * 1979-04-21 1980-11-05 Nippon Telegr & Teleph Corp <Ntt> Ion-shower device
US4393333A (en) * 1979-12-10 1983-07-12 Hitachi, Ltd. Microwave plasma ion source
JPS5947421B2 (ja) * 1980-03-24 1984-11-19 株式会社日立製作所 マイクロ波イオン源
EP0106497B1 (de) * 1982-09-10 1988-06-01 Nippon Telegraph And Telephone Corporation Ionenflutgerät
JPS6043620B2 (ja) * 1982-11-25 1985-09-28 日新ハイボルテージ株式会社 マイクロ波イオン源
US4523127A (en) * 1983-02-02 1985-06-11 Ga Technologies Inc. Cyclotron resonance maser amplifier and waveguide window
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
FR2556498B1 (fr) * 1983-12-07 1986-09-05 Commissariat Energie Atomique Source d'ions multicharges a plusieurs zones de resonance cyclotronique electronique
EP0154824B1 (de) * 1984-03-16 1991-09-18 Hitachi, Ltd. Ionenquelle

Also Published As

Publication number Publication date
JPH0616384B2 (ja) 1994-03-02
EP0164715A2 (de) 1985-12-18
JPS60264032A (ja) 1985-12-27
US4857809A (en) 1989-08-15
EP0164715A3 (en) 1987-04-15
EP0164715B1 (de) 1990-11-14
CA1238415A (en) 1988-06-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition