DE3576880D1 - Elektronenimpuls-typ-ionenquelle. - Google Patents

Elektronenimpuls-typ-ionenquelle.

Info

Publication number
DE3576880D1
DE3576880D1 DE8585300853T DE3576880T DE3576880D1 DE 3576880 D1 DE3576880 D1 DE 3576880D1 DE 8585300853 T DE8585300853 T DE 8585300853T DE 3576880 T DE3576880 T DE 3576880T DE 3576880 D1 DE3576880 D1 DE 3576880D1
Authority
DE
Germany
Prior art keywords
ion source
type ion
pulse type
electronic pulse
electronic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585300853T
Other languages
English (en)
Inventor
Fumio Watanabe
Yoshiaki Hara
Masao Miyamoto
Yasuo Kusumoto
Shojiro Komaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Application granted granted Critical
Publication of DE3576880D1 publication Critical patent/DE3576880D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/205—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers with electrons, e.g. electron impact ionisation, electron attachment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
  • Electron Sources, Ion Sources (AREA)
DE8585300853T 1984-03-26 1985-02-08 Elektronenimpuls-typ-ionenquelle. Expired - Fee Related DE3576880D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59058030A JPS60202649A (ja) 1984-03-26 1984-03-26 二重格子陽極電子衝撃型イオン源

Publications (1)

Publication Number Publication Date
DE3576880D1 true DE3576880D1 (de) 1990-05-03

Family

ID=13072546

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585300853T Expired - Fee Related DE3576880D1 (de) 1984-03-26 1985-02-08 Elektronenimpuls-typ-ionenquelle.

Country Status (4)

Country Link
US (1) US4620102A (de)
EP (1) EP0156473B1 (de)
JP (1) JPS60202649A (de)
DE (1) DE3576880D1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2596580A1 (fr) * 1986-03-26 1987-10-02 Centre Nat Rech Scient Generateur de plasma
JPS62296332A (ja) * 1986-06-16 1987-12-23 Hitachi Ltd イオン源
US4886971A (en) * 1987-03-13 1989-12-12 Mitsubishi Denki Kabushiki Kaisha Ion beam irradiating apparatus including ion neutralizer
DE3718244A1 (de) * 1987-05-30 1988-12-08 Grix Raimund Speicherionenquelle fuer flugzeit-massenspektrometer
US5006706A (en) * 1989-05-31 1991-04-09 Clemson University Analytical method and apparatus
FR2657724A1 (fr) * 1990-01-26 1991-08-02 Nermag Ste Nouvelle Source ionique pour spectrometre de masse quadripolaire.
US5302827A (en) * 1993-05-11 1994-04-12 Mks Instruments, Inc. Quadrupole mass spectrometer
GB9409953D0 (en) * 1994-05-17 1994-07-06 Fisons Plc Mass spectrometer and electron impact ion source therefor
US6037587A (en) * 1997-10-17 2000-03-14 Hewlett-Packard Company Chemical ionization source for mass spectrometry
JP2006266854A (ja) * 2005-03-23 2006-10-05 Shinku Jikkenshitsu:Kk 全圧測定電極付き四重極質量分析計及びこれを用いる真空装置
JP4881657B2 (ja) * 2006-06-14 2012-02-22 株式会社アルバック 質量分析計用イオン源
WO2008114684A1 (ja) * 2007-03-16 2008-09-25 National University Corporation NARA Institute of Science and Technology エネルギー分析器、２次元表示型エネルギー分析器および光電子顕微鏡
US20090101834A1 (en) * 2007-10-23 2009-04-23 Applied Materials, Inc. Ion beam extraction assembly in an ion implanter
CN101471222B (zh) * 2007-12-29 2010-11-24 同方威视技术股份有限公司 用于离子迁移率谱仪的迁移管结构
US8008632B2 (en) 2008-07-24 2011-08-30 Seagate Technology Llc Two-zone ion beam carbon deposition
JP5054226B2 (ja) * 2009-03-18 2012-10-24 株式会社アルバック 酸素の検出方法，空気リークの判別方法，ガス成分検出装置，及び真空処理装置
US9373474B2 (en) * 2009-03-27 2016-06-21 Osaka University Ion source, and mass spectroscope provided with same
US9093243B2 (en) * 2013-05-23 2015-07-28 National University Of Singapore Gun configured to generate charged particles
US9799504B2 (en) * 2015-12-11 2017-10-24 Horiba Stec, Co., Ltd. Ion source, quadrupole mass spectrometer and residual gas analyzing method
JP6898753B2 (ja) 2017-03-06 2021-07-07 住友重機械イオンテクノロジー株式会社 イオン生成装置
CN106835022A (zh) * 2017-03-31 2017-06-13 上海伟钊光学科技股份有限公司 双曲线回转面栅网板离子源
JP7040954B2 (ja) * 2018-02-09 2022-03-23 株式会社アルバック 質量分析計用のイオン源

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1237028A (en) * 1969-04-28 1971-06-30 Mullard Ltd Ion source
DE2810736A1 (de) * 1978-03-13 1979-09-27 Max Planck Gesellschaft Feldemissionskathode sowie herstellungsverfahren und verwendung hierfuer

Also Published As

Publication number Publication date
EP0156473A2 (de) 1985-10-02
JPH0234410B2 (de) 1990-08-03
US4620102A (en) 1986-10-28
EP0156473B1 (de) 1990-03-28
JPS60202649A (ja) 1985-10-14
EP0156473A3 (en) 1987-04-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee