EP0300566B1 - Vakuumbogen-Flüssigmetall-Ionenquelle - Google Patents

Vakuumbogen-Flüssigmetall-Ionenquelle Download PDF

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Publication number
EP0300566B1
EP0300566B1 EP88201511A EP88201511A EP0300566B1 EP 0300566 B1 EP0300566 B1 EP 0300566B1 EP 88201511 A EP88201511 A EP 88201511A EP 88201511 A EP88201511 A EP 88201511A EP 0300566 B1 EP0300566 B1 EP 0300566B1
Authority
EP
European Patent Office
Prior art keywords
anode
metal
ion source
cathode
reservoir
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP88201511A
Other languages
English (en)
French (fr)
Other versions
EP0300566A1 (de
Inventor
Henri Société Civile S.P.I.D. Bernardet
Jean-Claude Société Civile S.P.I.D. Pauwels
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
SODERN SA
Philips Gloeilampenfabrieken NV
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SODERN SA, Philips Gloeilampenfabrieken NV, Koninklijke Philips Electronics NV filed Critical SODERN SA
Publication of EP0300566A1 publication Critical patent/EP0300566A1/de
Application granted granted Critical
Publication of EP0300566B1 publication Critical patent/EP0300566B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H01J27/22—Metal ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge

Definitions

  • the invention relates to a vacuum arc ion source comprising a cathode, a control trigger, an anode and means for polarizing said cathode, control trigger and anode so that a first jet of plasma emanating from said cathode is formed in the anode-cathode space, the electrons of said plasma being attracted to the anode to heat the material until it vaporizes and to then ionize the vapor emitted in order to form a second jet of plasma emanating from the anode and directed to an extraction electrode.
  • Ion sources are used in many devices: implanters, accelerators, neutron tubes, mass spectrometers, etc.
  • vacuum arc sources offer the possibility of reducing the pumping means between the ion source and the acceleration zone and of having large extraction surfaces.
  • the anode is an electron collector while the cathode emits electrons and plasma (formed from the cathode material).
  • the reduction in the anode surface exposed to the electronic flux has the effect of causing an increase in the density of the electron bombardment and consequently of the energy deposited.
  • a threshold value a function of the anode and cathode materials, of the arc current and of the exposed anode surface, the appearance of light areas themselves emitting plasma from the anode material.
  • the properties of the emitted plasmas are close to those of the cathode spots (angle, density, speed), but the flow of matter emitted in the form of plasma can be controlled (geometric structure, arc current, temporal characteristics of the pulses) by l intermediary of the temperature of the anode which thus results from the energy brought by the electrons and from the energy dissipated, on the anode in particular, in the creation of the vapor emitted and then ionized.
  • the duration of use of a vacuum arc ion source is generally limited.
  • the present invention aims to create a plasma source for which this period of use is increased.
  • the vacuum arc ion source comprises means for providing a layer of metal to cover the anode surface, said means comprising a reservoir for metal and a wall permeable to metal. between the tank and the anode surface.
  • the metal is vaporized and ionized on the anode surface. To compensate for the losses of metal, this is transferred from the tank to the anode surface through the wall. The duration of use of the ion source is thereby increased.
  • the permeable wall is preferably made of a material which has a large difference in temperature with respect to the metal necessary for obtaining the same vapor pressure.
  • the plasma will then be composed exclusively of metal ions originating from the metal layer.
  • Said permeable wall is preferably arranged so as not to be blocked by the deposition of cathode material.
  • Said cathode material is preferably chosen so as not to disturb the wettability characteristics of the anode.
  • said metal is a liquid and said wall separating the reservoir from the anode surface is made of a material comprising numerous pores allowing the passage of liquid metal by capillary action such as for example a sintered tungsten or nickel.
  • said metal is a liquid and said tank-anodic surface separation wall is crossed by contiguous slots allowing the surface of the anode to be fed by surface diffusion.
  • An interesting solution for materials liquid at room temperature such as mercury is the use of an anode cooled at low temperature and capable of being supplied by the high vapor pressure (for example some 10 ⁇ 3 torrs) of this compound in the residual vacuum.
  • the material condenses on the anode and is thus vaporized and ionized, as for metals in the liquid phase, by the electrons of the arc.
  • Another solution making it possible to increase the duration of use of the ion sources is the use of cathode material much less refractory than the anode but compatible with the wettability properties necessary: to unclog the pores or the orifices of arrival liquid metal (or liquefied), the ion source is operated without liquid metal, at higher energies allowing the creation of anode spots on the cathode material deposited on the anode. The energy must however remain below the threshold leading to anode spots on solid anode material. This mode (called conditioning) is preparatory to the proper functioning of the ion source.
  • FIG. 1a represents the block diagram of a source of liquid metal ions with a vacuum arc of the biplanar type according to the invention.
  • Figure 1b shows sections of porous anode and anode with slots.
  • FIG. 5 represents the block diagram of a source of liquid metal ions with a vacuum arc of the coplanar type according to the invention.
  • FIG. 1a a section along a vertical plane shows a metal cathode 1 in the form of a circular crown, the face opposite the opening 2 is protected by an insulating screen 3.
  • the anode 4 disposed opposite the opening 2 along the axis of the crown and held by an insulating disc 5 forming a screen, according to the invention comprises a reservoir 6 containing the liquid metal 7.
  • the lower part of this reservoir has a narrowed shape so as to present a surface area 8 of small dimensions constituting the anode proper separated from the liquid area of the reservoir by a wall 9.
  • auxiliary electrodes 10 and 11 in the form of a crown for example and separated by a groove 12 of the order of 0.1 mm and constituting the control trigger.
  • This auxiliary discharge is essential for the correct functioning of the source; it could be of another definition and for example obtained by an anodic trigger very close to the cathode of the source.
  • cathode 3 and anode 5 screens serve as a support for crown 1 and reservoir 6 respectively and to form a screen for microparticles possibly released by the anode in the volume where ionization occurs and occult the cathode and the trigger which emit parasitic ions.
  • the wall 9 separating the liquid metal 7 from the anode surface 8 is made of a material comprising numerous pores 13, as shown in FIG. 1b, showing a section with enlarged area of this wall in a horizontal plane. This gives the passage by capillarity from the reservoir part to the anode surface.
  • the mode of supply of this anode surface can also be achieved by means of contiguous slots 14 passing through the wall 9 as shown in FIG. 1b also showing a section with enlarged area of this wall in a horizontal plane.
  • the anodic surface is thus covered by surface diffusion and the anodic material chosen is then a function of its characteristics of wettability by the liquid metal.
  • the wall 9 is constituted for example by a porous sintered system such as tungsten. This frit is surrounded by the liquid metal which has diffused by capillary action towards the surface area 8 of the anode opposite the opening 2.
  • the plasma jets 15 and 16 emitted respectively by the trigger and the cathode produce between the cathode and the anode a flow of electrons 17 which comes to controllably heat the part of the anode constituted by the sintered element in intimate contact with the diffused metal element.
  • the metal element is gallium, it has a vapor pressure of 1 mm of mercury at a temperature of 300 ° C, while the tungsten used as a support material has the same vapor pressure at 4500 ° C .
  • the metal element alone will be vaporized to form, after ionization, a plasma jet 18 directed perpendicular to the anode surface and composed exclusively of metal ions.
  • the pressure of the liquid metal in the tank can be fixed by a piston 19 and spring 20 system.
  • the tank is provided with a drain 21 which can be replaced by a tap.
  • a heating system can be arranged to liquefy non-liquid metals at room temperature.
  • FIG. 2a shows a structure in which a plurality of sources identical to the basic model described above is used.
  • the upper part and the lower part are respectively a vertical section along the plane passing through AA ′ and a horizontal section along the plane passing through BB ′ on which we have identified the cathodes 1 with their screens 3, the triggers 10, the anode surfaces 8 and the anode supports 5, the liquid metal 7 and the porous anode parts 9.
  • FIG. 2b represents a structure with anode in the shape of a thin crown.
  • a multicore of concentric anodes 22 can thus be arranged as indicated on the horizontal section along the plane passing through BB ′.
  • the cathode 24 and its screen 23 as well as the trigger 25 are also in the form of a crown.
  • the vertical section along the plane passing through AA ′ does not differ from that shown in Figure 2a.
  • the anodes 26 are in the form of flat parallelepipeds arranged at 90 °; they are separated by the screens 27.
  • the cathodes 28 and their insulating screen 29, the triggers 30 are arranged along the generatrices of a cylinder as indicated on the sections vertical along the plane passing through AA ′ and horizontal along the plane passing through BB ′.
  • FIG. 4 shows a structure with several superimposed anodes, each of them 31 having the shape of a flat cylinder.
  • the cathodes 32 and their screens 33 as well as the triggers 34 are arranged in crowns also superimposed.
  • a vertical central column 35 common to anodic multicylinders, allows their supply of liquid metal, as indicated on the vertical sections along the plane AA ′ and horizontal along the plane BB ′.
  • the structures presented in the previous figures are of the biplanar type, that is to say that the anode and the cathode are in different planes and that the cathode and anode plasmas are projected in opposite directions.
  • An example of another so-called coplanar version is shown in Figure 5; as for the biplanar version, the cathode can have the shape of a circular crown 36 whose small anode 4 is located on the axis.
  • An insulating material 37 separates the two electrodes and insulates them to voltages which can vary from a few kilovolts to about twenty kilovolts.
  • the insulator also has the function of moving the emission of the cathode spots away from the axis so as to facilitate their interception by a screen 38 pierced in its center with an orifice allowing essentially and only the plasma 18 emitted by the spot anodic.
  • the trigger 10, 11 required for the control can be circular and of the same structure as in the biplanar source.
  • the biplanar structure has the advantage of being easier to initiate (lower anode-cathode voltage and lower trigger control current) due to the shorter and more direct path of the electrons.
  • the invention also covers all the versions of cathode electrode shape intermediate between the so-called biplanar and coplanar structures as shown in the diagrams in FIG. 6, representing a structure with a semi-cylindrical cathode 39 and in FIGS. 7a and 7b representing structures with frustoconical cathodes 40 and 41.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)

Claims (11)

  1. Vakuumbogen-Flüssigmetall-Ionenquelle mit einer Kathode (1), einer Steuerelektrode (10, 11), einer Anode (4) und Mitteln zum Polarisieren der genannten Kathode (1), Steuerelektrode (10, 11) und Anode (4), dass im Anoden-Kathodenraum ein von der Kathode ausgehender erster Plasmastrahl gebildet wird, die Elektronen des Plasmas nach der Anode angezogen werden, um das Material bis zur Verdampfung zu erhitzen und darauf den erzeugten Dampf zu ionisieren, um einen zweiten von der Anode ausgehenden und auf eine Extraktionselektrode gerichteten Plasmastrahl zu bilden, dadurch gekennzeichnet, dass die Vakuumbogen-Ionenquelle Mittel zum Liefern einer Metallschicht zum Bedecken der Anodenfläche (8) enthält, wobei diese Mittel einen Behälter (6) für das Metall und eine für das Metall durchlässige Wand (9) zwischen dem Behälter (6) und der Anodenfläche (8) enthalten.
  2. Ionenquelle nach Anspruch 1,
    dadurch gekennzeichnet, dass die durchlässige Wand (9) in einem Material verwirklicht ist, das in bezug auf das Metall einen grossen Unterschied in erforderlcihen Temperaturen zum Erhalten desselben Dampfdrucks aufweist.
  3. Ionenquelle nach Anspruch 1 oder 2,
    dadurch gekennzeichnet, dass die durchlässige Wand (9) derart angeordnet ist, dass sie durch den Niederschlag von Kathodenmaterial nicht abgeschlossen wird.
  4. Ionenquelle nach einem der Ansprüche 1, 2 und 3, dadurch gekennzeichnet, dass das Kathodenmaterial derart gewählt ist, dass es nicht störend ist für die Benetzungseigenschaften der Anode.
  5. Ionenquelle nach einem oder mehreren der vorangehenden Ansprüche, dadurch gekennzeichnet, dass das Metall flüssig ist udn die durchlässige Wand, die den Behälter (6) von der Anodenfläche (8) trennt, aus einem Material mit vielen Poren besteht.
  6. Ionenquelle nach Anspruch 5,
    dadurch gekennzeichnet, dass die Wand (9) Sintermaterial aus Wolfram oder Nickel ist.
  7. Ionenquelle nach einem der Ansprüche 1, 2 oder 4, dadurch gekennzeichnet, dass das Metall flüssig ist und die den Behälter (6) von der anodenfläche (80 trennende Wand von durchgehenden Schlitzen (14) durchsetzt ist, die die Versorgung der Anodenfläche durch Oberflächendiffusion ermöglichen.
  8. Ionenquelle nach einem der Ansprüche 5, 6 oder 7, dadurch gekennzeichnet, dass das Metall ein bei Umgebungstemperatur flüssiges Metall mit einem niedrigen Dampfdruck ist.
  9. Ionenquelle nach Anspruch 8,
    dadurch gekennzeichnet, dass das Metall ein Element aus der Gruppe mit Gallium, Zäsium und Quecksilber ist.
  10. Ionenquelle nach einem der Ansprüche 5, 6 oder 7, dadurch gekennzeichnet, dass der Behälter (6) mit Heizmitteln versehen ist, und das Metall durch Erwärmen des Behälters verflüssigbar ist, wobei das Metall einen geringen Dampfdruck hat.
  11. Ionenquelle nach Anspruch 10,
    dadurch gekennzeichnet, dass das Metall ein Element der Gruppe mit Zinn, Indium, Wismut und Blei ist.
EP88201511A 1987-07-22 1988-07-14 Vakuumbogen-Flüssigmetall-Ionenquelle Expired - Lifetime EP0300566B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8710391A FR2618604B1 (fr) 1987-07-22 1987-07-22 Source d'ions de metaux liquides a arc sous vide
FR8710391 1987-07-22

Publications (2)

Publication Number Publication Date
EP0300566A1 EP0300566A1 (de) 1989-01-25
EP0300566B1 true EP0300566B1 (de) 1993-02-10

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP88201511A Expired - Lifetime EP0300566B1 (de) 1987-07-22 1988-07-14 Vakuumbogen-Flüssigmetall-Ionenquelle

Country Status (5)

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US (1) US5008585A (de)
EP (1) EP0300566B1 (de)
JP (1) JPH01157046A (de)
DE (1) DE3878331T2 (de)
FR (1) FR2618604B1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0399374B1 (de) * 1989-05-26 1995-04-19 Micrion Corporation Herstellungsverfahren und Vorrichtung für Ionenquelle
US5089707A (en) * 1990-11-14 1992-02-18 Ism Technologies, Inc. Ion beam generating apparatus with electronic switching between multiple cathodes
JP3060876B2 (ja) * 1995-02-15 2000-07-10 日新電機株式会社 金属イオン注入装置
US7058024B1 (en) 1999-02-03 2006-06-06 Lucent Technologies, Inc. Automatic telecommunications link identification system
US7276847B2 (en) * 2000-05-17 2007-10-02 Varian Semiconductor Equipment Associates, Inc. Cathode assembly for indirectly heated cathode ion source
AT500917B8 (de) * 2004-07-20 2007-02-15 Arc Seibersdorf Res Gmbh Flüssigmetall-ionenquelle
JP4988327B2 (ja) * 2006-02-23 2012-08-01 ルネサスエレクトロニクス株式会社 イオン注入装置
KR20080112790A (ko) * 2007-06-22 2008-12-26 삼성전자주식회사 반도체 소자의 박막 형성 방법
DE102007058504A1 (de) 2007-12-05 2009-07-09 Acino Ag Transdermales therapeutisches System mit einem Gehalt an einem Modulator für nikotinische Acetylcholinrezeptoren (nAChR)
US10580610B2 (en) * 2013-03-15 2020-03-03 General Electric Company Cold cathode switching device and converter
CN104217911A (zh) * 2013-10-18 2014-12-17 常州博锐恒电子科技有限公司 一种侧引出mevva金属离子源
JP6927493B2 (ja) * 2016-10-11 2021-09-01 国立大学法人横浜国立大学 イオン源
US11728140B1 (en) * 2022-01-31 2023-08-15 Axcelis Technologies, Inc. Hydraulic feed system for an ion source

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57205953A (en) * 1981-06-12 1982-12-17 Jeol Ltd Ion source
JPS58163135A (ja) * 1982-03-20 1983-09-27 Nippon Denshi Zairyo Kk イオン源
JPS61142645A (ja) * 1984-12-17 1986-06-30 Hitachi Ltd 正，負兼用イオン源
US4638210A (en) * 1985-04-05 1987-01-20 Hughes Aircraft Company Liquid metal ion source
JPS62259332A (ja) * 1985-10-23 1987-11-11 Nippon Denshi Zairyo Kk イオン発生装置

Also Published As

Publication number Publication date
US5008585A (en) 1991-04-16
DE3878331T2 (de) 1993-08-05
JPH01157046A (ja) 1989-06-20
FR2618604B1 (fr) 1989-11-24
FR2618604A1 (fr) 1989-01-27
DE3878331D1 (de) 1993-03-25
EP0300566A1 (de) 1989-01-25

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