EP0295743B1 - Ionenquelle mit vier Elektroden - Google Patents

Ionenquelle mit vier Elektroden Download PDF

Info

Publication number
EP0295743B1
EP0295743B1 EP88201173A EP88201173A EP0295743B1 EP 0295743 B1 EP0295743 B1 EP 0295743B1 EP 88201173 A EP88201173 A EP 88201173A EP 88201173 A EP88201173 A EP 88201173A EP 0295743 B1 EP0295743 B1 EP 0295743B1
Authority
EP
European Patent Office
Prior art keywords
cathode
anode
ion source
plasma
rings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP88201173A
Other languages
English (en)
French (fr)
Other versions
EP0295743A1 (de
Inventor
Henri Bernardet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SODERN SA
Koninklijke Philips NV
Original Assignee
D'ETUDES ET DE REALISATIONS NUCLEAIRES - SODERN Ste
SODERN SA
Philips Gloeilampenfabrieken NV
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by D'ETUDES ET DE REALISATIONS NUCLEAIRES - SODERN Ste, SODERN SA, Philips Gloeilampenfabrieken NV, Koninklijke Philips Electronics NV filed Critical D'ETUDES ET DE REALISATIONS NUCLEAIRES - SODERN Ste
Publication of EP0295743A1 publication Critical patent/EP0295743A1/de
Application granted granted Critical
Publication of EP0295743B1 publication Critical patent/EP0295743B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details

Definitions

  • the invention relates to a vacuum arc ion source comprising an anode and a cathode arranged opposite, polarized at different potentials and the main arc of which leads to the formation of a plasma directed perpendicular to the surface of the cathode is initiated by the projection of another plasma between said anode and said cathode for a short time relative to the arc pulse length.
  • the projection has the shape of a cone.
  • the ions can be extracted by means of an acceleration electrode brought to a negative voltage and of an extraction electrode, the latter being for example the anti-micro-projection system of particles.
  • Ion sources are used to create ions in isotopic separators, mass spectrometers, implanters, plasma machines, accelerators, neutron tubes etc ... They generally use the ionization of a gas injected into an almost closed volume.
  • Sources of vacuum arc ions of the kind mentioned in the preamble are of three electrode structure: anode, cathode and arc control trigger.
  • An example of a structure commonly used is given in the article "Metal Vapor Vacuum Arc Ion Source” by T.G. Brown et al., Published in Review of Engineer Instruments, volume 57, No.6, June 1986, pages 1069-1084.
  • the ion source of the invention is remarkable in that the projection of the initial plasma is obtained by means of two autonomous triggers, one known as the cathode trigger which can be close to the anode, the other known as trigger anode may be close to the cathode and suitably polarized with respect to said anode and said cathode.
  • triggers are formed, for example, by the superposition of two concentric circular rings, separated from each other, the anode and the cathode being arranged in the central zone of said rings and symmetrically with respect to their axis.
  • Figure 1 shows in section the block diagram of an ion source according to the invention.
  • Figure 2 shows a particular embodiment of such a source.
  • FIG. 3 shows the diagrams of some types of extraction electrodes.
  • a cathode 1 of cylindrical shape is arranged opposite an anode.
  • This anode can be a metal disc 2 pierced with a circular opening in its center as shown in Figure 1a, or a metal grid 3 as shown in Figure 1b.
  • control plasma behaves like an electrical conductor of extensible form; during its passage between the cathode and the anode of the ion source, there is a short circuit between these two electrodes: the electrons of the control plasma are attracted by the anode and the ions by the cathode.
  • the process is as follows: the electrons in the plasma have a mobility much higher than the ions and the control plasma (out of respect for its overall electrical neutrality) will take the potential of anode 2 or 3.
  • the potential difference applied to the ion source and the plasma ions are extracted by creating a cathode sheath whose height will depend on the ion density of the plasma.
  • the resulting electric field on the cathode is very high and, depending on the trigger adjustment parameters (trigger current, duration of application: a few hundred nanoseconds to a few microseconds, cathode-anode trigger distance), there may be (or no) striking the arc.
  • a cathode plasma 7 is formed from very bright points and very small dimensions (cathode spots).
  • the arcing between the two triggers notably facilitates the control of the source in accordance with the invention.
  • FIG. 2 shows an advantageous embodiment of the invention.
  • a metal part 8 pierced with a central opening 9 serves as a support for the entire device. On this part is mounted the support 10 of the anode 2 also serving for its polarization. An insulating ring 11 secured to the support 10 ensures the attachment of the triggers 4 and 5.
  • the cathode 1 mounted on a metal rod 12 passing through the central opening 9 is adjustable longitudinally by means of the bellows 13; it is isolated from the triggers by the crown 14 also integral with the support 8.
  • the output 15 for polarization of the triggers is made through another opening 16 likewise made in the support 8.
  • the cathode plasma 7 is generated as indicated above.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)

Claims (5)

  1. Vakuum-Bogen-Ionenquele mit einer Anode und einer Kathode, die einander gegenüberliegend angeordnet und mit verschiedenen Potentialen polarisiert sind, und wobei der Hauptbogen, der zu der Bildung eines Plasmas führt, das aus dem Material der Elektroden besteht, senkrecht zu der Oberfläche der Kathode gerichtet ist, durch die Strahlung eines weiteren Plasmas zwischen der genannten Anode und der genannten Kathode ausgelöst wird, und zwar während einer gegenüber der Bogenimpulslänge kurzen Dauer, dadurch gekennzeichnet, daß die Strahlung dieses anderen Plasmas mittels zweier einzelner Gitter erhalten wird, wobei das eine Gitter als Kathodengitter bezeichnet wird und das andere als Anodengitter, und wobei die beiden Gitter gegenüber der genannten Anode und Kathode auf geeignete Weise polarisiert sind.
  2. Ionenquelle nach Anspruch 1, dadurch gekennzeichnet, daß das genannte Anodengitter und das genannte Kathodengitter durch Überlagerung zweier von einander getrennter konzentrischer kreisrunder Ringe gebildet sind.
  3. Ionenquelle nach Anspruch 2, dadurch gekennzeichnet, daß die genannten Ringe aus zwei wulstförmigen, massiven metallischen durch einen schmalen Spalt voneinander getrennten Elektroden gebildet sind.
  4. Ionenquelle nach Anspruch 2, dadurch gekennzeichnet, daß die genannten Ringe aus einer Metallschicht mit oder ohne Hydrid auf einem isolierenden Substrat gebildet und durch eine in der genannten Schicht vorgesehene Rille begrenzt sind.
  5. Ionenquelle nach Anspruch 2, dadurch gekennzeichnet, daß die genannten Ringe aus einer Halbleiterschicht mit Plasmastrahlung durch Leitung (z.B. eine Kohlenstoffschicht) gebildet und durch eine in der genannten Schicht vorgesehene Rille voneinander getrennt sind.
EP88201173A 1987-06-12 1988-06-08 Ionenquelle mit vier Elektroden Expired - Lifetime EP0295743B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8708196A FR2616587B1 (fr) 1987-06-12 1987-06-12 Source d'ions a quatre electrodes
FR8708196 1987-06-12

Publications (2)

Publication Number Publication Date
EP0295743A1 EP0295743A1 (de) 1988-12-21
EP0295743B1 true EP0295743B1 (de) 1992-05-06

Family

ID=9351971

Family Applications (1)

Application Number Title Priority Date Filing Date
EP88201173A Expired - Lifetime EP0295743B1 (de) 1987-06-12 1988-06-08 Ionenquelle mit vier Elektroden

Country Status (5)

Country Link
US (1) US4939425A (de)
EP (1) EP0295743B1 (de)
JP (1) JPS643941A (de)
DE (1) DE3870720D1 (de)
FR (1) FR2616587B1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2667980A1 (fr) * 1990-10-12 1992-04-17 Sodern Source d'electrons presentant un dispositif de retention de matieres.
US5089707A (en) * 1990-11-14 1992-02-18 Ism Technologies, Inc. Ion beam generating apparatus with electronic switching between multiple cathodes
CN100533650C (zh) * 2003-10-31 2009-08-26 塞恩技术有限公司 离子源控制系统
CN103094049B (zh) * 2011-10-28 2015-11-25 清华大学 电离规
JP6439966B2 (ja) * 2014-10-03 2018-12-19 日新イオン機器株式会社 イオン源
JP6268680B2 (ja) * 2016-06-14 2018-01-31 日新イオン機器株式会社 イオン源の運転方法
CN109712861B (zh) * 2018-12-25 2021-05-14 哈工大机器人（岳阳）军民融合研究院 一种防短路功能的离子光学系统及微型离子源

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3097321A (en) * 1960-12-05 1963-07-09 Westinghouse Electric Corp High energy arc electrodes
GB1129888A (en) * 1964-12-30 1968-10-09 Ass Elect Ind Improvements relating to plasma torch assemblies
US3356897A (en) * 1965-01-18 1967-12-05 Jr Thomas A Barr Arc plasma generator with starter
US4301391A (en) * 1979-04-26 1981-11-17 Hughes Aircraft Company Dual discharge plasma device

Also Published As

Publication number Publication date
FR2616587A1 (fr) 1988-12-16
US4939425A (en) 1990-07-03
JPS643941A (en) 1989-01-09
FR2616587B1 (fr) 1989-11-24
EP0295743A1 (de) 1988-12-21
DE3870720D1 (de) 1992-06-11

Similar Documents

Publication Publication Date Title
EP0473233B1 (de) Hochfluss-Neutronenröhre
Schoenbach et al. Microhollow cathode discharges
US2636990A (en) Ion source unit
EP0480518B1 (de) Elektronenquelle mit teilchenhaltender Anordnung
EP0295743B1 (de) Ionenquelle mit vier Elektroden
US3460745A (en) Magnetically confined electrical discharge getter ion vacuum pump having a cathode projection extending into the anode cell
EP0300566B1 (de) Vakuumbogen-Flüssigmetall-Ionenquelle
US6236054B1 (en) Ion source for generating ions of a gas or vapor
EP0362946A1 (de) Die Rückbeschleunigung von Sekundärelektronen begrenzende Ionenextraktions- und -beschleunigungseinrichtung in einer abgeschmolzenen Hochflup-Neutronenröhre
EP0362947B1 (de) Mit einer multizellulären Ionenquelle mit magnetischem Einschluss versehene abgeschmolzene Neutronenröhre
EP0340832B1 (de) Abgedichtete Hochfluss-Neutronenröhre
US3414702A (en) Nonthermionic electron beam apparatus
US3517240A (en) Method and apparatus for forming a focused monoenergetic ion beam
EP0077738B1 (de) Ionenquelle mit Gasionisierungsraum mit Elektronenschwingungen
US3610985A (en) Ion source having two operative cathodes
US5637869A (en) Detector for time-of-flight mass-spectrometers with low timing errors and simultaneously large aperture
Ryabchikov Emission properties of broad‐beam vacuum arc ion sources
EP0362953A1 (de) Mit einer Ionenquelle mit elektrostatischem Einschluss versehene abgeschmolzene Neutronenröhre
US4801849A (en) Ion source operating by surface ionization in particular for providing an ion probe
EP0362945A1 (de) Einrichtung zur Verbesserung der Penning-Ionenquelle in einer Neutronenröhre
JP2657909B2 (ja) 気体放電閉路スイッチ
US3073987A (en) Electron discharge device with getter
FR2647593A1 (fr) Piege a ions de faible energie
Wallin et al. Field ionization of cesium atoms diffusion out from an iridium foil, studied by time-of-flight mass spectrometry
EP0300932B1 (de) ELektronenquelle

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): CH DE FR GB LI NL

17P Request for examination filed

Effective date: 19890614

17Q First examination report despatched

Effective date: 19901217

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): CH DE FR GB LI NL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Effective date: 19920506

REF Corresponds to:

Ref document number: 3870720

Country of ref document: DE

Date of ref document: 19920611

RAP2 Party data changed (patent owner data changed or rights of a patent transferred)

Owner name: N.V. PHILIPS' GLOEILAMPENFABRIEKEN

Owner name: SOCIETE ANONYME D'ETUDES ET REALISATIONS NUCLEAIRE

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)
K2C1 Correction of patent specification (title page) published

Effective date: 19920506

NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 19940629

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 19940826

Year of fee payment: 7

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 19940922

Year of fee payment: 7

REG Reference to a national code

Ref country code: CH

Ref legal event code: PFA

Free format text: PHILIPS ELECTRONICS N.V.

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 19950531

Year of fee payment: 8

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Effective date: 19950630

Ref country code: CH

Effective date: 19950630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Effective date: 19960229

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Effective date: 19960301

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Effective date: 19960608

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 19960608