EP0295743B1 - Ionenquelle mit vier Elektroden - Google Patents
Ionenquelle mit vier Elektroden Download PDFInfo
- Publication number
- EP0295743B1 EP0295743B1 EP88201173A EP88201173A EP0295743B1 EP 0295743 B1 EP0295743 B1 EP 0295743B1 EP 88201173 A EP88201173 A EP 88201173A EP 88201173 A EP88201173 A EP 88201173A EP 0295743 B1 EP0295743 B1 EP 0295743B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- cathode
- anode
- ion source
- plasma
- rings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
Definitions
- the invention relates to a vacuum arc ion source comprising an anode and a cathode arranged opposite, polarized at different potentials and the main arc of which leads to the formation of a plasma directed perpendicular to the surface of the cathode is initiated by the projection of another plasma between said anode and said cathode for a short time relative to the arc pulse length.
- the projection has the shape of a cone.
- the ions can be extracted by means of an acceleration electrode brought to a negative voltage and of an extraction electrode, the latter being for example the anti-micro-projection system of particles.
- Ion sources are used to create ions in isotopic separators, mass spectrometers, implanters, plasma machines, accelerators, neutron tubes etc ... They generally use the ionization of a gas injected into an almost closed volume.
- Sources of vacuum arc ions of the kind mentioned in the preamble are of three electrode structure: anode, cathode and arc control trigger.
- An example of a structure commonly used is given in the article "Metal Vapor Vacuum Arc Ion Source” by T.G. Brown et al., Published in Review of Engineer Instruments, volume 57, No.6, June 1986, pages 1069-1084.
- the ion source of the invention is remarkable in that the projection of the initial plasma is obtained by means of two autonomous triggers, one known as the cathode trigger which can be close to the anode, the other known as trigger anode may be close to the cathode and suitably polarized with respect to said anode and said cathode.
- triggers are formed, for example, by the superposition of two concentric circular rings, separated from each other, the anode and the cathode being arranged in the central zone of said rings and symmetrically with respect to their axis.
- Figure 1 shows in section the block diagram of an ion source according to the invention.
- Figure 2 shows a particular embodiment of such a source.
- FIG. 3 shows the diagrams of some types of extraction electrodes.
- a cathode 1 of cylindrical shape is arranged opposite an anode.
- This anode can be a metal disc 2 pierced with a circular opening in its center as shown in Figure 1a, or a metal grid 3 as shown in Figure 1b.
- control plasma behaves like an electrical conductor of extensible form; during its passage between the cathode and the anode of the ion source, there is a short circuit between these two electrodes: the electrons of the control plasma are attracted by the anode and the ions by the cathode.
- the process is as follows: the electrons in the plasma have a mobility much higher than the ions and the control plasma (out of respect for its overall electrical neutrality) will take the potential of anode 2 or 3.
- the potential difference applied to the ion source and the plasma ions are extracted by creating a cathode sheath whose height will depend on the ion density of the plasma.
- the resulting electric field on the cathode is very high and, depending on the trigger adjustment parameters (trigger current, duration of application: a few hundred nanoseconds to a few microseconds, cathode-anode trigger distance), there may be (or no) striking the arc.
- a cathode plasma 7 is formed from very bright points and very small dimensions (cathode spots).
- the arcing between the two triggers notably facilitates the control of the source in accordance with the invention.
- FIG. 2 shows an advantageous embodiment of the invention.
- a metal part 8 pierced with a central opening 9 serves as a support for the entire device. On this part is mounted the support 10 of the anode 2 also serving for its polarization. An insulating ring 11 secured to the support 10 ensures the attachment of the triggers 4 and 5.
- the cathode 1 mounted on a metal rod 12 passing through the central opening 9 is adjustable longitudinally by means of the bellows 13; it is isolated from the triggers by the crown 14 also integral with the support 8.
- the output 15 for polarization of the triggers is made through another opening 16 likewise made in the support 8.
- the cathode plasma 7 is generated as indicated above.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
Claims (5)
- Vakuum-Bogen-Ionenquele mit einer Anode und einer Kathode, die einander gegenüberliegend angeordnet und mit verschiedenen Potentialen polarisiert sind, und wobei der Hauptbogen, der zu der Bildung eines Plasmas führt, das aus dem Material der Elektroden besteht, senkrecht zu der Oberfläche der Kathode gerichtet ist, durch die Strahlung eines weiteren Plasmas zwischen der genannten Anode und der genannten Kathode ausgelöst wird, und zwar während einer gegenüber der Bogenimpulslänge kurzen Dauer, dadurch gekennzeichnet, daß die Strahlung dieses anderen Plasmas mittels zweier einzelner Gitter erhalten wird, wobei das eine Gitter als Kathodengitter bezeichnet wird und das andere als Anodengitter, und wobei die beiden Gitter gegenüber der genannten Anode und Kathode auf geeignete Weise polarisiert sind.
- Ionenquelle nach Anspruch 1, dadurch gekennzeichnet, daß das genannte Anodengitter und das genannte Kathodengitter durch Überlagerung zweier von einander getrennter konzentrischer kreisrunder Ringe gebildet sind.
- Ionenquelle nach Anspruch 2, dadurch gekennzeichnet, daß die genannten Ringe aus zwei wulstförmigen, massiven metallischen durch einen schmalen Spalt voneinander getrennten Elektroden gebildet sind.
- Ionenquelle nach Anspruch 2, dadurch gekennzeichnet, daß die genannten Ringe aus einer Metallschicht mit oder ohne Hydrid auf einem isolierenden Substrat gebildet und durch eine in der genannten Schicht vorgesehene Rille begrenzt sind.
- Ionenquelle nach Anspruch 2, dadurch gekennzeichnet, daß die genannten Ringe aus einer Halbleiterschicht mit Plasmastrahlung durch Leitung (z.B. eine Kohlenstoffschicht) gebildet und durch eine in der genannten Schicht vorgesehene Rille voneinander getrennt sind.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8708196A FR2616587B1 (fr) | 1987-06-12 | 1987-06-12 | Source d'ions a quatre electrodes |
FR8708196 | 1987-06-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0295743A1 EP0295743A1 (de) | 1988-12-21 |
EP0295743B1 true EP0295743B1 (de) | 1992-05-06 |
Family
ID=9351971
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP88201173A Expired - Lifetime EP0295743B1 (de) | 1987-06-12 | 1988-06-08 | Ionenquelle mit vier Elektroden |
Country Status (5)
Country | Link |
---|---|
US (1) | US4939425A (de) |
EP (1) | EP0295743B1 (de) |
JP (1) | JPS643941A (de) |
DE (1) | DE3870720D1 (de) |
FR (1) | FR2616587B1 (de) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2667980A1 (fr) * | 1990-10-12 | 1992-04-17 | Sodern | Source d'electrons presentant un dispositif de retention de matieres. |
US5089707A (en) * | 1990-11-14 | 1992-02-18 | Ism Technologies, Inc. | Ion beam generating apparatus with electronic switching between multiple cathodes |
US7498586B2 (en) * | 2003-10-31 | 2009-03-03 | Saintech Pty, Ltd. | Ion source control system |
CN103094049B (zh) * | 2011-10-28 | 2015-11-25 | 清华大学 | 电离规 |
JP6439966B2 (ja) * | 2014-10-03 | 2018-12-19 | 日新イオン機器株式会社 | イオン源 |
JP6268680B2 (ja) * | 2016-06-14 | 2018-01-31 | 日新イオン機器株式会社 | イオン源の運転方法 |
CN109712861B (zh) * | 2018-12-25 | 2021-05-14 | 哈工大机器人(岳阳)军民融合研究院 | 一种防短路功能的离子光学系统及微型离子源 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3097321A (en) * | 1960-12-05 | 1963-07-09 | Westinghouse Electric Corp | High energy arc electrodes |
GB1129888A (en) * | 1964-12-30 | 1968-10-09 | Ass Elect Ind | Improvements relating to plasma torch assemblies |
US3356897A (en) * | 1965-01-18 | 1967-12-05 | Jr Thomas A Barr | Arc plasma generator with starter |
US4301391A (en) * | 1979-04-26 | 1981-11-17 | Hughes Aircraft Company | Dual discharge plasma device |
-
1987
- 1987-06-12 FR FR8708196A patent/FR2616587B1/fr not_active Expired
-
1988
- 1988-06-08 DE DE8888201173T patent/DE3870720D1/de not_active Expired - Lifetime
- 1988-06-08 EP EP88201173A patent/EP0295743B1/de not_active Expired - Lifetime
- 1988-06-09 JP JP63140648A patent/JPS643941A/ja active Pending
- 1988-06-10 US US07/205,124 patent/US4939425A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2616587B1 (fr) | 1989-11-24 |
US4939425A (en) | 1990-07-03 |
JPS643941A (en) | 1989-01-09 |
FR2616587A1 (fr) | 1988-12-16 |
EP0295743A1 (de) | 1988-12-21 |
DE3870720D1 (de) | 1992-06-11 |
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