DE3878065D1 - Testanordnung und -verfahren fuer integrierte schaltungen, womit das bestimmen von oberflaechenschichteffekten moeglich wird. - Google Patents
Testanordnung und -verfahren fuer integrierte schaltungen, womit das bestimmen von oberflaechenschichteffekten moeglich wird.Info
- Publication number
- DE3878065D1 DE3878065D1 DE8888420237T DE3878065T DE3878065D1 DE 3878065 D1 DE3878065 D1 DE 3878065D1 DE 8888420237 T DE8888420237 T DE 8888420237T DE 3878065 T DE3878065 T DE 3878065T DE 3878065 D1 DE3878065 D1 DE 3878065D1
- Authority
- DE
- Germany
- Prior art keywords
- surface layer
- integrated circuits
- test arrangement
- layer effects
- determines surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002344 surface layer Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8709903A FR2618021B1 (fr) | 1987-07-07 | 1987-07-07 | Structure et procede de test pour circuit integre permettant la determination des effets de surface de couches |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3878065D1 true DE3878065D1 (de) | 1993-03-18 |
DE3878065T2 DE3878065T2 (de) | 1993-09-09 |
Family
ID=9353103
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8888420237T Expired - Fee Related DE3878065T2 (de) | 1987-07-07 | 1988-07-06 | Testanordnung und -verfahren fuer integrierte schaltungen, womit das bestimmen von oberflaechenschichteffekten moeglich wird. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4906921A (de) |
EP (1) | EP0299887B1 (de) |
JP (1) | JPH0191430A (de) |
KR (1) | KR890003011A (de) |
DE (1) | DE3878065T2 (de) |
FR (1) | FR2618021B1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2886176B2 (ja) * | 1989-03-23 | 1999-04-26 | 三菱電機株式会社 | 埋め込みチャネルの物性特性測定法 |
US5196787A (en) * | 1989-10-19 | 1993-03-23 | Texas Instruments Incorporated | Test circuit for screening parts |
US5059897A (en) * | 1989-12-07 | 1991-10-22 | Texas Instruments Incorporated | Method and apparatus for testing passive substrates for integrated circuit mounting |
US5196802A (en) * | 1990-04-23 | 1993-03-23 | The United States Of America As Represented By The Secretary Of The Navy | Method and apparatus for characterizing the quality of electrically thin semiconductor films |
JP3017871B2 (ja) * | 1991-01-02 | 2000-03-13 | テキサス インスツルメンツ インコーポレイテツド | Icデバイスに対するチップ上のバラツキ検知回路 |
US5239270A (en) * | 1992-02-24 | 1993-08-24 | National Semiconductor Corporation | Wafer level reliability contact test structure and method |
US5600578A (en) * | 1993-08-02 | 1997-02-04 | Advanced Micro Devices, Inc. | Test method for predicting hot-carrier induced leakage over time in short-channel IGFETs and products designed in accordance with test results |
US5548224A (en) * | 1995-01-20 | 1996-08-20 | Vlsi Technology, Inc | Method and apparatus for wafer level prediction of thin oxide reliability |
KR100397675B1 (ko) * | 1998-12-16 | 2004-02-14 | 제일모직주식회사 | 내열도가 우수한 열가소성 수지 조성물 |
US6144040A (en) * | 1999-01-22 | 2000-11-07 | Lucent Technologies Inc. | Van der pauw structure to measure the resistivity of a doped area under diffusion areas and gate structures |
KR100663347B1 (ko) * | 2004-12-21 | 2007-01-02 | 삼성전자주식회사 | 중첩도 측정마크를 갖는 반도체소자 및 그 형성방법 |
DE102009006482B4 (de) * | 2009-01-28 | 2013-05-02 | Atlanta Antriebssysteme E. Seidenspinner Gmbh & Co. Kg | Getriebe mit Gegenlager |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3974443A (en) * | 1975-01-02 | 1976-08-10 | International Business Machines Corporation | Conductive line width and resistivity measuring system |
US4467400A (en) * | 1981-01-16 | 1984-08-21 | Burroughs Corporation | Wafer scale integrated circuit |
US4479088A (en) * | 1981-01-16 | 1984-10-23 | Burroughs Corporation | Wafer including test lead connected to ground for testing networks thereon |
US4486705A (en) * | 1981-01-16 | 1984-12-04 | Burroughs Corporation | Method of testing networks on a wafer having grounding points on its periphery |
GB2173037A (en) * | 1985-03-29 | 1986-10-01 | Philips Electronic Associated | Semiconductor devices employing conductivity modulation |
US4672314A (en) * | 1985-04-12 | 1987-06-09 | Rca Corporation | Comprehensive semiconductor test structure |
-
1987
- 1987-07-07 FR FR8709903A patent/FR2618021B1/fr not_active Expired - Fee Related
-
1988
- 1988-06-23 JP JP63155981A patent/JPH0191430A/ja active Pending
- 1988-07-06 EP EP88420237A patent/EP0299887B1/de not_active Expired - Lifetime
- 1988-07-06 DE DE8888420237T patent/DE3878065T2/de not_active Expired - Fee Related
- 1988-07-07 KR KR1019880008413A patent/KR890003011A/ko not_active Application Discontinuation
- 1988-07-07 US US07/216,164 patent/US4906921A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0299887B1 (de) | 1993-02-03 |
KR890003011A (ko) | 1989-04-12 |
JPH0191430A (ja) | 1989-04-11 |
US4906921A (en) | 1990-03-06 |
FR2618021A1 (fr) | 1989-01-13 |
EP0299887A1 (de) | 1989-01-18 |
DE3878065T2 (de) | 1993-09-09 |
FR2618021B1 (fr) | 1990-01-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |