DE3864207D1 - Lichtempfindliches material mit silberhalogenid, reduktionsmittel und einer photopolymerisierbaren verbindung. - Google Patents

Lichtempfindliches material mit silberhalogenid, reduktionsmittel und einer photopolymerisierbaren verbindung.

Info

Publication number
DE3864207D1
DE3864207D1 DE8888111039T DE3864207T DE3864207D1 DE 3864207 D1 DE3864207 D1 DE 3864207D1 DE 8888111039 T DE8888111039 T DE 8888111039T DE 3864207 T DE3864207 T DE 3864207T DE 3864207 D1 DE3864207 D1 DE 3864207D1
Authority
DE
Germany
Prior art keywords
reducing agent
sensitive material
light sensitive
photopolymerizable compound
silver halogenide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888111039T
Other languages
English (en)
Inventor
Shigeo Koizumi
Yoshihide Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE3864207D1 publication Critical patent/DE3864207D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/0285Silver salts, e.g. a latent silver salt image
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/111Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE8888111039T 1987-07-10 1988-07-11 Lichtempfindliches material mit silberhalogenid, reduktionsmittel und einer photopolymerisierbaren verbindung. Expired - Fee Related DE3864207D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62172400A JPH0721633B2 (ja) 1987-07-10 1987-07-10 感光材料

Publications (1)

Publication Number Publication Date
DE3864207D1 true DE3864207D1 (de) 1991-09-19

Family

ID=15941242

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888111039T Expired - Fee Related DE3864207D1 (de) 1987-07-10 1988-07-11 Lichtempfindliches material mit silberhalogenid, reduktionsmittel und einer photopolymerisierbaren verbindung.

Country Status (4)

Country Link
US (1) US4985339A (de)
EP (1) EP0298522B1 (de)
JP (1) JPH0721633B2 (de)
DE (1) DE3864207D1 (de)

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JP3522923B2 (ja) 1995-10-23 2004-04-26 富士写真フイルム株式会社 ハロゲン化銀感光材料
JP2002029173A (ja) * 2000-07-18 2002-01-29 Fuji Photo Film Co Ltd 平版印刷版包装構造
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US7282321B2 (en) 2003-03-26 2007-10-16 Fujifilm Corporation Lithographic printing method and presensitized plate
US20050153239A1 (en) 2004-01-09 2005-07-14 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method using the same
US7146909B2 (en) 2004-07-20 2006-12-12 Fuji Photo Film Co., Ltd. Image forming material
US20060032390A1 (en) 2004-07-30 2006-02-16 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
DE602005005403T2 (de) 2004-08-24 2009-04-23 Fujifilm Corp. Verfahren zur Herstellung einer lithographischen Druckplatte
JP2006064920A (ja) * 2004-08-26 2006-03-09 Konica Minolta Medical & Graphic Inc 平版印刷版材料
JP2006062188A (ja) 2004-08-26 2006-03-09 Fuji Photo Film Co Ltd 色画像形成材料及び平版印刷版原版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
US20060150846A1 (en) 2004-12-13 2006-07-13 Fuji Photo Film Co. Ltd Lithographic printing method
JP2006181838A (ja) 2004-12-27 2006-07-13 Fuji Photo Film Co Ltd 平版印刷版原版
JP2007055224A (ja) 2005-01-26 2007-03-08 Fujifilm Corp 平版印刷版原版、平版印刷方法および平版印刷版原版の梱包体
EP1696268B1 (de) 2005-02-28 2016-11-09 FUJIFILM Corporation Flachdruckplattenvorläufer
JP4759343B2 (ja) 2005-08-19 2011-08-31 富士フイルム株式会社 平版印刷版原版および平版印刷方法
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
JP4945432B2 (ja) 2006-12-28 2012-06-06 富士フイルム株式会社 平版印刷版の作製方法
EP1947514A3 (de) 2007-01-17 2010-12-29 FUJIFILM Corporation Verfahren zur Herstellung einer Lithografiedruckform
JP4881756B2 (ja) 2007-02-06 2012-02-22 富士フイルム株式会社 感光性組成物、平版印刷版原版、平版印刷方法、及び新規シアニン色素
JP2008230024A (ja) 2007-03-20 2008-10-02 Fujifilm Corp 平版印刷版原版および平版印刷版の作製方法
ATE471812T1 (de) 2007-03-23 2010-07-15 Fujifilm Corp Negativ-lithografiedruckplattenvorläufer und lithografiedruckverfahren damit
JP5046744B2 (ja) 2007-05-18 2012-10-10 富士フイルム株式会社 平版印刷版原版、及びそれを用いた印刷方法
JP5376844B2 (ja) 2007-06-21 2013-12-25 富士フイルム株式会社 平版印刷版原版および平版印刷方法
EP2006091B1 (de) 2007-06-22 2010-12-08 FUJIFILM Corporation Lithographiedruckplattenvorläufer und Plattenherstellungsverfahren
EP2011643B1 (de) 2007-07-02 2010-10-13 FUJIFILM Corporation Flachdruckplattenvorläufer und Flachdruckverfahren damit
JP2009069761A (ja) 2007-09-18 2009-04-02 Fujifilm Corp 平版印刷版の製版方法
JP5322537B2 (ja) 2007-10-29 2013-10-23 富士フイルム株式会社 平版印刷版原版
JP5155677B2 (ja) 2008-01-22 2013-03-06 富士フイルム株式会社 平版印刷版原版、およびその製版方法
JP2009184188A (ja) 2008-02-05 2009-08-20 Fujifilm Corp 平版印刷版原版および印刷方法
JP2009214428A (ja) 2008-03-11 2009-09-24 Fujifilm Corp 平版印刷版原版および平版印刷方法
JP2009236942A (ja) 2008-03-25 2009-10-15 Fujifilm Corp 平版印刷版原版及びその製版方法
JP4914864B2 (ja) 2008-03-31 2012-04-11 富士フイルム株式会社 平版印刷版の作製方法
US20090260531A1 (en) 2008-04-18 2009-10-22 Fujifilm Corporation Aluminum alloy plate for lithographic printing plate, lithographic printing plate support, presensitized plate, method of manufacturing aluminum alloy plate for lithographic printing plate and method of manufacturing lithographic printing plate support
JP5296434B2 (ja) 2008-07-16 2013-09-25 富士フイルム株式会社 平版印刷版用原版
JP5449898B2 (ja) 2008-09-22 2014-03-19 富士フイルム株式会社 平版印刷版原版、及びそれを用いた印刷方法
JP5408942B2 (ja) 2008-09-22 2014-02-05 富士フイルム株式会社 平版印刷版原版および製版方法
US20110168044A1 (en) 2008-09-24 2011-07-14 Fujifilm Corporation Method of preparing lithographic printing plate
JP5660268B2 (ja) 2008-09-30 2015-01-28 富士フイルム株式会社 平版印刷版原版、平版印刷版の製版方法及び重合性モノマー
US20130014657A1 (en) 2010-03-30 2013-01-17 Fujifilm Corporation Plate making method of lithographic printing plate
BR112013003865B1 (pt) 2010-08-27 2020-05-26 Fujifilm Corporation Precursor de placa de impressão litográfica do tipo revelação onpress e método de fabricar placa para realização de um processamento de revelação on-press por um método
JP5789448B2 (ja) 2010-08-31 2015-10-07 富士フイルム株式会社 平版印刷版原版及びその製版方法
JP5705584B2 (ja) 2011-02-24 2015-04-22 富士フイルム株式会社 平版印刷版の製版方法
JP5244987B2 (ja) 2011-02-28 2013-07-24 富士フイルム株式会社 平版印刷版原版及びその製版方法
JP5740275B2 (ja) 2011-09-30 2015-06-24 富士フイルム株式会社 機上現像型の平版印刷版原版を用いる印刷方法
JP5771738B2 (ja) 2012-02-23 2015-09-02 富士フイルム株式会社 発色性組成物、発色性硬化組成物、平版印刷版原版及び製版方法、並びに発色性化合物
WO2014045783A1 (ja) 2012-09-20 2014-03-27 富士フイルム株式会社 平版印刷版原版及び製版方法
EP2963495B1 (de) 2013-02-27 2019-06-05 FUJIFILM Corporation Infrarotempfindliche chromogene zusammensetzung, infrarothärtbare chromogene zusammensetzung, lithografiedruckplattenvorläufer und plattenherstellungsverfahren
WO2015115598A1 (ja) 2014-01-31 2015-08-06 富士フイルム株式会社 赤外線感光性発色組成物、平版印刷版原版、平版印刷版の製版方法、及び、赤外線感光性発色剤

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DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement

Also Published As

Publication number Publication date
EP0298522A3 (en) 1990-03-14
EP0298522A2 (de) 1989-01-11
EP0298522B1 (de) 1991-08-14
JPH0721633B2 (ja) 1995-03-08
US4985339A (en) 1991-01-15
JPS6417047A (en) 1989-01-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee