DE3781023D1 - Lichtempfindliches material mit silberhalogenid, reduktionsmittel und einer photopolymerisierbaren verbindung. - Google Patents

Lichtempfindliches material mit silberhalogenid, reduktionsmittel und einer photopolymerisierbaren verbindung.

Info

Publication number
DE3781023D1
DE3781023D1 DE8787106514T DE3781023T DE3781023D1 DE 3781023 D1 DE3781023 D1 DE 3781023D1 DE 8787106514 T DE8787106514 T DE 8787106514T DE 3781023 T DE3781023 T DE 3781023T DE 3781023 D1 DE3781023 D1 DE 3781023D1
Authority
DE
Germany
Prior art keywords
reducing agent
sensitive material
light sensitive
photopolymerizable compound
silver halogenide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787106514T
Other languages
English (en)
Other versions
DE3781023T2 (de
Inventor
Makoto Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE3781023D1 publication Critical patent/DE3781023D1/de
Publication of DE3781023T2 publication Critical patent/DE3781023T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/0285—Silver salts, e.g. a latent silver salt image

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
DE8787106514T 1986-05-06 1987-05-06 Lichtempfindliches material mit silberhalogenid, reduktionsmittel und einer photopolymerisierbaren verbindung. Expired - Fee Related DE3781023T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61104226A JPH0623850B2 (ja) 1986-05-06 1986-05-06 乾式画像形成方法

Publications (2)

Publication Number Publication Date
DE3781023D1 true DE3781023D1 (de) 1992-09-17
DE3781023T2 DE3781023T2 (de) 1993-03-04

Family

ID=14375047

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787106514T Expired - Fee Related DE3781023T2 (de) 1986-05-06 1987-05-06 Lichtempfindliches material mit silberhalogenid, reduktionsmittel und einer photopolymerisierbaren verbindung.

Country Status (5)

Country Link
US (1) US4853312A (de)
EP (1) EP0247396B1 (de)
JP (1) JPH0623850B2 (de)
CA (1) CA1310851C (de)
DE (1) DE3781023T2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2525671B2 (ja) * 1989-06-22 1996-08-21 富士写真フイルム株式会社 感光材料
US5229248A (en) * 1990-08-16 1993-07-20 Konica Corporation Silver halide photographic light sensitive material
US5451612A (en) * 1993-08-17 1995-09-19 Cenegy; Louis F. Integral skin polyurethane

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE573717A (de) * 1958-02-17
BE577894A (de) * 1958-04-28
NL274158A (de) * 1961-02-02
BE720061A (de) * 1967-08-28 1969-02-03
GB1247251A (en) * 1968-01-10 1971-09-22 Fuji Photo Film Co Ltd Process for the formation of polymer images from photographic images
JPS57211146A (en) * 1981-06-23 1982-12-24 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS5858538A (ja) * 1981-10-02 1983-04-07 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
JPS58149040A (ja) * 1982-03-02 1983-09-05 Mitsui Toatsu Chem Inc 紫外線硬化パタ−ン形成用組成物
JPS59188644A (ja) * 1983-04-09 1984-10-26 Fuji Photo Film Co Ltd 画像形成方法
JPS6169062A (ja) * 1984-09-12 1986-04-09 Fuji Photo Film Co Ltd 画像形成法
EP0174634B1 (de) * 1984-09-12 1987-12-09 Fuji Photo Film Co., Ltd. Bilderzeugungsverfahren
EP0203613B1 (de) * 1985-05-30 1989-10-25 Fuji Photo Film Co., Ltd. Mikrokapseln enthaltendes lichtempfindliches Material und dieses benutzendes Bildaufzeichnungsverfahren
JPH0619550B2 (ja) * 1986-01-10 1994-03-16 富士写真フイルム株式会社 画像形成方法および感光材料

Also Published As

Publication number Publication date
JPH0623850B2 (ja) 1994-03-30
DE3781023T2 (de) 1993-03-04
CA1310851C (en) 1992-12-01
EP0247396A3 (en) 1989-08-09
EP0247396B1 (de) 1992-08-12
EP0247396A2 (de) 1987-12-02
JPS62275235A (ja) 1987-11-30
US4853312A (en) 1989-08-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee