DE3852336D1 - Verfahren zur Ausbildung eines abgeschirmten Wellenleiters. - Google Patents

Verfahren zur Ausbildung eines abgeschirmten Wellenleiters.

Info

Publication number
DE3852336D1
DE3852336D1 DE3852336T DE3852336T DE3852336D1 DE 3852336 D1 DE3852336 D1 DE 3852336D1 DE 3852336 T DE3852336 T DE 3852336T DE 3852336 T DE3852336 T DE 3852336T DE 3852336 D1 DE3852336 D1 DE 3852336D1
Authority
DE
Germany
Prior art keywords
forming
shielded waveguide
waveguide
shielded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3852336T
Other languages
English (en)
Other versions
DE3852336T2 (de
Inventor
John Edward Cronin
Michael Albert Leach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3852336D1 publication Critical patent/DE3852336D1/de
Publication of DE3852336T2 publication Critical patent/DE3852336T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/0218Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
    • H05K1/0219Printed shielding conductors for shielding around or between signal conductors, e.g. coplanar or coaxial printed shielding conductors
    • H05K1/0221Coaxially shielded signal lines comprising a continuous shielding layer partially or wholly surrounding the signal lines
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/538Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
    • H01L23/5384Conductive vias through the substrate with or without pins, e.g. buried coaxial conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6616Vertical connections, e.g. vias
    • H01L2223/6622Coaxial feed-throughs in active or passive substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/095Conductive through-holes or vias
    • H05K2201/096Vertically aligned vias, holes or stacked vias
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0733Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49016Antenna or wave energy "plumbing" making
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49123Co-axial cable
DE3852336T 1987-04-27 1988-03-29 Verfahren zur Ausbildung eines abgeschirmten Wellenleiters. Expired - Fee Related DE3852336T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/043,264 US4776087A (en) 1987-04-27 1987-04-27 VLSI coaxial wiring structure

Publications (2)

Publication Number Publication Date
DE3852336D1 true DE3852336D1 (de) 1995-01-19
DE3852336T2 DE3852336T2 (de) 1995-05-24

Family

ID=21926295

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3852336T Expired - Fee Related DE3852336T2 (de) 1987-04-27 1988-03-29 Verfahren zur Ausbildung eines abgeschirmten Wellenleiters.

Country Status (5)

Country Link
US (1) US4776087A (de)
EP (1) EP0288767B1 (de)
JP (1) JPH088259B2 (de)
CA (1) CA1271267A (de)
DE (1) DE3852336T2 (de)

Families Citing this family (68)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5476970A (en) * 1984-02-16 1995-12-19 Velsicol Chemical Corporation Method for preparing aryl ketones
JP2947818B2 (ja) * 1988-07-27 1999-09-13 株式会社日立製作所 微細孔への金属穴埋め方法
JPH02105532A (ja) * 1988-10-14 1990-04-18 Nec Corp 半導体集積回路装置
JPH02137330A (ja) * 1988-11-18 1990-05-25 Nec Corp 半導体装置
FR2650471B1 (fr) * 1989-07-27 1991-10-11 Bull Sa Procede de formation de piliers du reseau multicouche d'une carte de connexion d'au moins un circuit integre de haute densite
US5003273A (en) * 1989-12-04 1991-03-26 Itt Corporation Multilayer printed circuit board with pseudo-coaxial transmission lines
EP0460857B1 (de) * 1990-05-31 1997-03-19 Canon Kabushiki Kaisha Verfahren zur Herstellung einer Halbleitervorrichtung mit einer Verdrahtungsstruktur hoher Dichte
US5182849A (en) * 1990-12-21 1993-02-02 Hughes Aircraft Company Process of manufacturing lightweight, low cost microwave components
FR2674680B1 (fr) * 1991-03-26 1993-12-03 Thomson Csf Procede de realisation de connexions coaxiales pour composant electronique, et boitier de composant comportant de telles connexions.
SE468573B (sv) * 1991-06-14 1993-02-08 Ericsson Telefon Ab L M Anordningar med boejliga, ytorienterade striplineledningar samt foerfarande foer framstaellning av en saadan anordning
JP2681425B2 (ja) * 1991-12-05 1997-11-26 三菱電機株式会社 半導体集積回路装置
JP2924450B2 (ja) * 1992-05-22 1999-07-26 日本電気株式会社 半導体装置
US5363550A (en) * 1992-12-23 1994-11-15 International Business Machines Corporation Method of Fabricating a micro-coaxial wiring structure
US5421083A (en) * 1994-04-01 1995-06-06 Motorola, Inc. Method of manufacturing a circuit carrying substrate having coaxial via holes
US5733175A (en) * 1994-04-25 1998-03-31 Leach; Michael A. Polishing a workpiece using equal velocity at all points overlapping a polisher
US5607341A (en) * 1994-08-08 1997-03-04 Leach; Michael A. Method and structure for polishing a wafer during manufacture of integrated circuits
US5589707A (en) * 1994-11-07 1996-12-31 International Business Machines Corporation Multi-surfaced capacitor for storing more charge per horizontal chip area
US5811882A (en) * 1996-09-24 1998-09-22 Philips Electronics North America Corporation On-chip shielding coaxial conductors for mixed-signal IC
US6576848B1 (en) 1996-11-22 2003-06-10 International Business Machines Corporation Integrated circuit chip wiring structure with crossover capability and method of manufacturing the same
US5818110A (en) * 1996-11-22 1998-10-06 International Business Machines Corporation Integrated circuit chip wiring structure with crossover capability and method of manufacturing the same
US6294455B1 (en) 1997-08-20 2001-09-25 Micron Technology, Inc. Conductive lines, coaxial lines, integrated circuitry, and methods of forming conductive lines, coaxial lines, and integrated circuitry
US6143616A (en) * 1997-08-22 2000-11-07 Micron Technology, Inc. Methods of forming coaxial integrated circuitry interconnect lines
US6187677B1 (en) 1997-08-22 2001-02-13 Micron Technology, Inc. Integrated circuitry and methods of forming integrated circuitry
FI106585B (fi) * 1997-10-22 2001-02-28 Nokia Mobile Phones Ltd Koaksiaalijohto, menetelmä koaksiaalijohdon valmistamiseksi ja langaton viestin
US6060388A (en) * 1997-10-29 2000-05-09 International Business Machines Corporation Conductors for microelectronic circuits and method of manufacture
US6000120A (en) * 1998-04-16 1999-12-14 Motorola, Inc. Method of making coaxial transmission lines on a printed circuit board
KR100308871B1 (ko) * 1998-12-28 2001-11-03 윤덕용 동축 구조의 신호선 및 그의 제조 방법
US6388198B1 (en) 1999-03-09 2002-05-14 International Business Machines Corporation Coaxial wiring within SOI semiconductor, PCB to system for high speed operation and signal quality
US6403393B1 (en) 1999-09-01 2002-06-11 International Business Machines Corporation Device having integrated optical and copper conductors and method of fabricating same
DE10026933C1 (de) * 2000-05-30 2001-12-06 Infineon Technologies Ag Faradaykäfig für integrierte Schaltung
SE522650C2 (sv) 2000-10-31 2004-02-24 Ericsson Telefon Ab L M Anordning på ett mönsterkort och förfarande för tillverkning av en sådan anordning
US6975189B1 (en) * 2000-11-02 2005-12-13 Telasic Communications, Inc. On-chip multilayer metal shielded transmission line
US6600395B1 (en) * 2000-12-28 2003-07-29 Nortel Networks Limited Embedded shielded stripline (ESS) structure using air channels within the ESS structure
GB2379089A (en) * 2001-08-21 2003-02-26 Ubinetics Ltd RF screening for printed circuit boards
US7239219B2 (en) * 2001-12-03 2007-07-03 Microfabrica Inc. Miniature RF and microwave components and methods for fabricating such components
US9614266B2 (en) 2001-12-03 2017-04-04 Microfabrica Inc. Miniature RF and microwave components and methods for fabricating such components
AU2002360464A1 (en) * 2001-12-03 2003-06-17 Memgen Corporation Miniature rf and microwave components and methods for fabricating such components
US6770822B2 (en) * 2002-02-22 2004-08-03 Bridgewave Communications, Inc. High frequency device packages and methods
US6731513B2 (en) * 2002-03-15 2004-05-04 Memx, Inc. Shielded multi-conductor interconnect bus for MEMS
US6760901B2 (en) * 2002-04-11 2004-07-06 International Business Machines Corporation Trough adjusted optical proximity correction for vias
US6667549B2 (en) 2002-05-01 2003-12-23 Bridgewave Communications, Inc. Micro circuits with a sculpted ground plane
US6809384B1 (en) 2002-08-09 2004-10-26 Pts Corporation Method and apparatus for protecting wiring and integrated circuit device
US10297421B1 (en) 2003-05-07 2019-05-21 Microfabrica Inc. Plasma etching of dielectric sacrificial material from reentrant multi-layer metal structures
US7411279B2 (en) * 2004-06-30 2008-08-12 Endwave Corporation Component interconnect with substrate shielding
US7348666B2 (en) * 2004-06-30 2008-03-25 Endwave Corporation Chip-to-chip trench circuit structure
DE102005045059B4 (de) * 2005-09-21 2011-05-19 Infineon Technologies Ag Integrierte Schaltungsanordnung mit mehreren Leitstrukturlagen und Spule sowie Verfahren zur Herstellung
DE102005045056B4 (de) * 2005-09-21 2007-06-21 Infineon Technologies Ag Integrierte Schaltungsanordnung mit mehreren Leitstrukturlagen und Kondensator
DE102005045057A1 (de) * 2005-09-21 2007-03-22 Infineon Technologies Ag Integrierte Schaltungsanordnung mit mehreren Leitstrukturlagen und Koaxialleitung sowie Verfahren
US8581113B2 (en) 2007-12-19 2013-11-12 Bridgewave Communications, Inc. Low cost high frequency device package and methods
JP5252491B2 (ja) * 2008-08-22 2013-07-31 独立行政法人産業技術総合研究所 多層微細配線構造
US8344819B2 (en) * 2008-10-28 2013-01-01 Broadcom Corporation Conformal reference planes in substrates
US20100307798A1 (en) * 2009-06-03 2010-12-09 Izadian Jamal S Unified scalable high speed interconnects technologies
TWI387407B (zh) * 2009-06-10 2013-02-21 Htc Corp 軟式印刷電路板其及組成方法
JP2011100989A (ja) * 2009-10-09 2011-05-19 Renesas Electronics Corp 半導体装置
US8779592B2 (en) * 2012-05-01 2014-07-15 Taiwan Semiconductor Manufacturing Company, Ltd. Via-free interconnect structure with self-aligned metal line interconnections
JP2014120710A (ja) * 2012-12-19 2014-06-30 Nippon Telegr & Teleph Corp <Ntt> 多層高周波伝送線路およびその製造方法
US9368454B2 (en) 2013-10-10 2016-06-14 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor device with shielding layer in post-passivation interconnect structure
US9992859B2 (en) * 2015-09-25 2018-06-05 Intel Corporation Low loss and low cross talk transmission lines using shaped vias
EP3297093B1 (de) * 2016-09-16 2019-01-02 Rosenberger Hochfrequenztechnik GmbH & Co. KG Steckverbinder zum verbinden einer optischen faser und eines elektrischen leiters
CN106783812A (zh) * 2016-12-30 2017-05-31 上海集成电路研发中心有限公司 一种全屏蔽片上共面波导传输结构及其制备方法
US10276518B2 (en) * 2017-03-21 2019-04-30 Taiwan Semiconductor Manufacturing Company Limited Semiconductor arrangement in fan out packaging including magnetic structure around transmission line
DE102018109028B4 (de) 2017-06-30 2023-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Halbleitervorrichtung mit Abschirmstruktur zur Verringerung von Übersprechen und Verfahren zur Herstellung derselben
US10269728B2 (en) 2017-06-30 2019-04-23 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device with shielding structure for cross-talk reduction
KR101942741B1 (ko) * 2017-10-20 2019-01-28 삼성전기 주식회사 반도체 패키지
CN107768345A (zh) * 2017-10-27 2018-03-06 德淮半导体有限公司 半导体装置及其制造方法
EP3518280B1 (de) * 2018-01-25 2020-11-04 Murata Manufacturing Co., Ltd. Elektronisches produkt mit eingebettetem porösem dielektrikum und herstellungsverfahren
US11350520B2 (en) * 2019-08-08 2022-05-31 At&S Austria Technologie & Systemtechnik Aktiengesellschaft Component carrier and method of manufacturing the same
KR20220082600A (ko) 2020-12-10 2022-06-17 삼성전기주식회사 인쇄회로기판

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1079204A (en) * 1963-12-24 1967-08-16 Hughes Aircraft Co Improvements in and relating to thin film electrical devices
US3351816A (en) * 1965-02-04 1967-11-07 Bunker Ramo Planar coaxial circuitry
US3560893A (en) * 1968-12-27 1971-02-02 Rca Corp Surface strip transmission line and microwave devices using same
DE2246730B2 (de) * 1972-09-22 1977-09-15 Siemens AG, 1000 Berlin und 8000 München Hochfrequenzleitung zur verbindung elektrischer baugruppen
US3904997A (en) * 1973-09-13 1975-09-09 Microwave Ass Trapped-radiation microwave transmission line
US4379307A (en) * 1980-06-16 1983-04-05 Rockwell International Corporation Integrated circuit chip transmission line
US4389429A (en) * 1980-06-16 1983-06-21 Rockwell International Corporation Method of forming integrated circuit chip transmission line
US4581291A (en) * 1983-12-29 1986-04-08 Bongianni Wayne L Microminiature coaxial cable and methods manufacture
JPS60214561A (ja) * 1984-04-10 1985-10-26 Sanyo Electric Co Ltd 半導体集積回路
US4575700A (en) * 1984-05-17 1986-03-11 Cornell Research Foundation, Inc. Parallel plate transmission lines integrated with coplanar waveguides or slot lines and method of making same
EP0175604B1 (de) * 1984-08-23 1989-07-19 Fairchild Semiconductor Corporation Verfahren zum Herstellen von Kontaktlöchern auf integrierten Schaltungen
US4673904A (en) * 1984-11-14 1987-06-16 Itt Corporation Micro-coaxial substrate
GB2168857A (en) * 1984-11-14 1986-06-25 Int Standard Electric Corp Method and structure for interconnecting high frequency components
EP0195977B1 (de) * 1985-03-15 1994-09-28 Hewlett-Packard Company Metallisches Verbindungssystem mit einer ebenen Fläche
JPS61230340A (ja) * 1985-04-05 1986-10-14 Nec Ic Microcomput Syst Ltd 半導体集積回路装置
JPS62202572A (ja) * 1986-02-28 1987-09-07 Canon Inc 半導体装置

Also Published As

Publication number Publication date
DE3852336T2 (de) 1995-05-24
EP0288767B1 (de) 1994-12-07
JPH088259B2 (ja) 1996-01-29
EP0288767A3 (en) 1990-06-20
EP0288767A2 (de) 1988-11-02
US4776087A (en) 1988-10-11
JPS63268257A (ja) 1988-11-04
CA1271267A (en) 1990-07-03

Similar Documents

Publication Publication Date Title
DE3852336T2 (de) Verfahren zur Ausbildung eines abgeschirmten Wellenleiters.
DE3688178T2 (de) Verfahren zur Bildextraktion eines sich bewegenden Objekts.
DE3861537D1 (de) Verfahren zur herstellung eines gewuerzmittels.
DE3881058T2 (de) Verfahren zur mesophase-peche-herstellung.
DE69002755T2 (de) Verfahren zur herstellung eines gelöteten gegenstandes.
DE3868128D1 (de) Verfahren zur herstellung eines supraleitenden gegenstandes.
DE3776240D1 (de) Verfahren zur herstellung eines ferritfilmes.
DE3863585D1 (de) Verfahren zur heliumgewinnung.
DE69015855T2 (de) Verfahren zur Herstellung eines Kabelzusammenbaus.
DE68915377T2 (de) Verfahren zur Herstellung eines Wellenleiters.
ATE52892T1 (de) Verfahren zur herstellung eines gewuerzes.
DE3867171D1 (de) Verfahren zur behandlung einer fluessigkeit.
AT383625B (de) Verfahren zur verfestigung eines faservlieses
DE3763837D1 (de) Verfahren zur erzeugung eines faservlieses.
DE3687954D1 (de) Verfahren zur herstellung eines tetraalkoxysilans.
DE3787849T2 (de) Verfahren zur katalytischen Transhalogenierung eines Polyiodobenzols.
DE3580390D1 (de) Verfahren zur herstellung eines lactons.
DE3852542D1 (de) Verfahren zur verbesserung eines profils.
DE3872344T2 (de) Verfahren zur herstellung von metallfasergegenstaenden.
DE3780995T2 (de) Verfahren zur herstellung eines metallischen musters.
AT376966B (de) Verfahren zur herstellung eines furanderivats
DE3672263D1 (de) Verfahren zur herstellung eines phosphorschirmes.
DE3851850D1 (de) Verfahren zur Herstellung eines harten metallischen Gegenstandes.
AT371876B (de) Verfahren zur herstellung eines bauwerkes
DE3688050D1 (de) Verfahren zur herstellung eines karbonhaltigen faserstoffs.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee