DE3789838T2 - Verfahren zum Verbinden eines Drahtes. - Google Patents

Verfahren zum Verbinden eines Drahtes.

Info

Publication number
DE3789838T2
DE3789838T2 DE3789838T DE3789838T DE3789838T2 DE 3789838 T2 DE3789838 T2 DE 3789838T2 DE 3789838 T DE3789838 T DE 3789838T DE 3789838 T DE3789838 T DE 3789838T DE 3789838 T2 DE3789838 T2 DE 3789838T2
Authority
DE
Germany
Prior art keywords
bonding
coordinate
coordinate values
data
cad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3789838T
Other languages
German (de)
English (en)
Other versions
DE3789838D1 (de
Inventor
Mitsusada Shibasaka
Kazuyuki Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3789838D1 publication Critical patent/DE3789838D1/de
Publication of DE3789838T2 publication Critical patent/DE3789838T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8512—Aligning
    • H01L2224/85148—Aligning involving movement of a part of the bonding apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42—Wire connectors; Manufacturing methods related thereto
    • H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01005—Boron [B]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01006—Carbon [C]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01033—Arsenic [As]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01039—Yttrium [Y]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01066—Dysprosium [Dy]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/0107—Ytterbium [Yb]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01082—Lead [Pb]

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Wire Bonding (AREA)
DE3789838T 1986-09-02 1987-09-01 Verfahren zum Verbinden eines Drahtes. Expired - Lifetime DE3789838T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61206553A JPS6362241A (ja) 1986-09-02 1986-09-02 ワイヤボンデイング方法

Publications (2)

Publication Number Publication Date
DE3789838D1 DE3789838D1 (de) 1994-06-23
DE3789838T2 true DE3789838T2 (de) 1994-09-22

Family

ID=16525294

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3789838T Expired - Lifetime DE3789838T2 (de) 1986-09-02 1987-09-01 Verfahren zum Verbinden eines Drahtes.

Country Status (5)

Country Link
US (1) US4864514A (enExample)
EP (1) EP0258869B1 (enExample)
JP (1) JPS6362241A (enExample)
KR (1) KR960002991B1 (enExample)
DE (1) DE3789838T2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19935422A1 (de) * 1999-07-28 2001-02-01 Daimler Chrysler Ag Verfahren zur Erzeugung einer Leitungsstruktur mit wenigstens einem Kabelbündel

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2701991B2 (ja) * 1990-12-21 1998-01-21 ローム株式会社 ワイヤボンダ
DE4324870A1 (de) * 1993-07-23 1995-02-09 Weidmueller Interface Einrichtung mit Selbstauskunft und Verfahren zu deren Herstellung
US5465217A (en) * 1993-08-16 1995-11-07 Motorola, Inc. Method for automatic tab artwork building
DE4423007A1 (de) * 1994-06-30 1996-01-11 Siemens Ag Verfahren zur Erzeugung eines Prüfprogrammes
EP0694858A2 (en) * 1994-07-29 1996-01-31 Hewlett-Packard Company Method and apparatus for computer-aided design of different-sized RF modular hybrid circuits
JP3320226B2 (ja) * 1994-11-30 2002-09-03 富士通株式会社 配線ｃａｄ装置
US5608638A (en) * 1995-02-06 1997-03-04 Advanced Micro Devices Device and method for automation of a build sheet to manufacture a packaged integrated circuit
JP3049540B2 (ja) * 1995-12-05 2000-06-05 株式会社新川 被覆ワイヤのワイヤボンディング方法
JP3218382B2 (ja) * 1995-12-05 2001-10-15 株式会社新川 被覆ワイヤのワイヤボンディング方法
CN1106036C (zh) * 1997-05-15 2003-04-16 日本电气株式会社 芯片型半导体装置的制造方法
US6256549B1 (en) 1998-05-13 2001-07-03 Cirrus Logic, Inc. Integrated manufacturing solutions
US6357036B1 (en) * 1998-10-02 2002-03-12 Cirrus Logic, Inc. Computerized method and apparatus for designing wire bond diagrams and locating bond pads for a semiconductor device
US6289492B1 (en) * 1998-12-18 2001-09-11 Cognex Corporation Methods and apparatuses for defining a region on an elongated object
KR100442697B1 (ko) * 2002-03-11 2004-08-02 삼성전자주식회사 자동 와이어 본딩 공정을 위한 통합 관리 시스템
JP2007209991A (ja) * 2006-02-07 2007-08-23 Toyota Auto Body Co Ltd 溶接打点の管理システム、プログラム、記録媒体
CN103456650B (zh) * 2007-03-13 2016-08-24 库利克和索夫工业公司 用于丝焊及相关半导体处理操作的眼点训练方法
CN101443151B (zh) * 2007-03-13 2014-03-12 库利克和索夫工业公司 用于丝焊及相关半导体处理操作的眼点训练方法
TW201125091A (en) * 2010-01-15 2011-07-16 de-bao Peng Method for detecting wiring location of wire rack.

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3598978A (en) * 1968-08-21 1971-08-10 Rca Corp Object-positioning system and method
US4253111A (en) * 1978-09-25 1981-02-24 Gca Corporation Apparatus for bonding leads to semiconductor chips
JPS5598842A (en) * 1978-09-28 1980-07-28 Toshiba Corp Position detection system
JPS55165643A (en) * 1979-06-12 1980-12-24 Fujitsu Ltd Device for bonding pellet
JPS56132505A (en) * 1980-03-24 1981-10-16 Hitachi Ltd Position detecting method
DE3175773D1 (en) * 1980-06-10 1987-02-05 Fujitsu Ltd Pattern position recognition apparatus
JPS5958586A (ja) * 1982-09-28 1984-04-04 Toshiba Mach Co Ltd マスクの検査方法および装置
JPS6021535A (ja) * 1983-06-30 1985-02-02 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 半導体装置を相互接続する方法
US4635208A (en) * 1985-01-18 1987-01-06 Hewlett-Packard Company Computer-aided design of systems
US4718019A (en) * 1985-06-28 1988-01-05 Control Data Corporation Election beam exposure system and an apparatus for carrying out a pattern unwinder

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19935422A1 (de) * 1999-07-28 2001-02-01 Daimler Chrysler Ag Verfahren zur Erzeugung einer Leitungsstruktur mit wenigstens einem Kabelbündel
US6879941B1 (en) 1999-07-28 2005-04-12 Daimlerchrysler, Ag Process for producing a conductor comprising at least one cable bundle

Also Published As

Publication number Publication date
EP0258869A3 (en) 1989-09-06
JPS6362241A (ja) 1988-03-18
EP0258869A2 (en) 1988-03-09
KR880004545A (ko) 1988-06-07
JPH0477462B2 (enExample) 1992-12-08
EP0258869B1 (en) 1994-05-18
DE3789838D1 (de) 1994-06-23
US4864514A (en) 1989-09-05
KR960002991B1 (ko) 1996-03-02

Similar Documents

Publication Publication Date Title
DE3789838T2 (de) Verfahren zum Verbinden eines Drahtes.
DE3587732T2 (de) Verfahren zum Vorbereiten von numerischen Steuerungsdaten für das Einsetzen von Bauelementen.
DE69103871T2 (de) Eichsystem für einen optischen sensor.
DE69130123T2 (de) Anzeigegerät und Verfahren zum Betreiben eines solchen Geräts
DE69226153T2 (de) System zur automatischen Herstellung der Bahn eines Handhabungskopfes
DE3588010T2 (de) Verfahren zur Verarbeitung von Bilddaten für Druckverfahren.
DE68907383T2 (de) Verfahren und Anordnung zur Umsetzung von Umrissdaten in Rasterdaten.
DE10053439A1 (de) Grafik-Beschleuniger mit Interpolationsfunktion
DE4014594A1 (de) Cad/cam-einrichtung
DE69523223T2 (de) Steuergerät
DE112016007220T5 (de) Kontaktplanprogrammbearbeitungsunterstützungsvorrichtung und Kontaktplanprogrammbearbeitungsverfahren
DE4212173A1 (de) Cad/cam-einrichtung mit hierarchischer datenstruktur
DE102019003928A1 (de) Positionsinformationsanzeigesystem
DE68921550T2 (de) Verfahren und Gerät zur Bildung eines Pattern-Layouts einer integrierten Halbleiterschaltung.
DE69428878T2 (de) Selbstbeschreibendes Datenverarbeitungssystem
DE3318127C2 (enExample)
DE19827017A1 (de) Digitales Fotografie-Bearbeitungssystem
DE69224718T2 (de) Klassifizierungsverfahren für Rechnerarchitekturen
DE112017006976T5 (de) Überlagerungspositionskorrektureinrichtung und überlagerungspositionskorrekturverfahren
DE69320744T2 (de) Sortierverarbeitungsgerät
DE102019207489A1 (de) System zur Anzeige virtueller Objekte
DE10205330A1 (de) Verfahren zur Korrektur optischer Nachbarschaftseffekte
DE3711148C2 (de) Auf einem Chip ausgebildeter integrierter Mikrocomputer und Verfahren zum Zusammenstellen der Topographie für die Herstellung eines solchen Mikrocomputers
DE102023121729A1 (de) Bildverarbeitungsverfahren und -vorrichtung und zugehörige vorrichtung
DE4102718C2 (de) Integrierte Schaltung und Verfahren zur Generierung eines Layouts einer integrierten Schaltung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)