DE3789838D1 - Verfahren zum Verbinden eines Drahtes. - Google Patents

Verfahren zum Verbinden eines Drahtes.

Info

Publication number
DE3789838D1
DE3789838D1 DE3789838T DE3789838T DE3789838D1 DE 3789838 D1 DE3789838 D1 DE 3789838D1 DE 3789838 T DE3789838 T DE 3789838T DE 3789838 T DE3789838 T DE 3789838T DE 3789838 D1 DE3789838 D1 DE 3789838D1
Authority
DE
Germany
Prior art keywords
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3789838T
Other languages
English (en)
Other versions
DE3789838T2 (de
Inventor
Kazuyuki Yamanaka
Mitsusada Shibasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3789838D1 publication Critical patent/DE3789838D1/de
Publication of DE3789838T2 publication Critical patent/DE3789838T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67144Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/60Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8512Aligning
    • H01L2224/85148Aligning involving movement of a part of the bonding apparatus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01039Yttrium [Y]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01066Dysprosium [Dy]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/0107Ytterbium [Yb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Wire Bonding (AREA)
DE3789838T 1986-09-02 1987-09-01 Verfahren zum Verbinden eines Drahtes. Expired - Lifetime DE3789838T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61206553A JPS6362241A (ja) 1986-09-02 1986-09-02 ワイヤボンデイング方法

Publications (2)

Publication Number Publication Date
DE3789838D1 true DE3789838D1 (de) 1994-06-23
DE3789838T2 DE3789838T2 (de) 1994-09-22

Family

ID=16525294

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3789838T Expired - Lifetime DE3789838T2 (de) 1986-09-02 1987-09-01 Verfahren zum Verbinden eines Drahtes.

Country Status (5)

Country Link
US (1) US4864514A (de)
EP (1) EP0258869B1 (de)
JP (1) JPS6362241A (de)
KR (1) KR960002991B1 (de)
DE (1) DE3789838T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2701991B2 (ja) * 1990-12-21 1998-01-21 ローム株式会社 ワイヤボンダ
DE4324870A1 (de) * 1993-07-23 1995-02-09 Weidmueller Interface Einrichtung mit Selbstauskunft und Verfahren zu deren Herstellung
US5465217A (en) * 1993-08-16 1995-11-07 Motorola, Inc. Method for automatic tab artwork building
DE4423007A1 (de) * 1994-06-30 1996-01-11 Siemens Ag Verfahren zur Erzeugung eines Prüfprogrammes
EP0694858A2 (de) * 1994-07-29 1996-01-31 Hewlett-Packard Company Verfahren und Gerät zum rechnergestützten Entwurf von RF-modularen Hybridschaltungen verschiedener Grösse
JP3320226B2 (ja) * 1994-11-30 2002-09-03 富士通株式会社 配線cad装置
US5608638A (en) * 1995-02-06 1997-03-04 Advanced Micro Devices Device and method for automation of a build sheet to manufacture a packaged integrated circuit
JP3049540B2 (ja) * 1995-12-05 2000-06-05 株式会社新川 被覆ワイヤのワイヤボンディング方法
JP3218382B2 (ja) * 1995-12-05 2001-10-15 株式会社新川 被覆ワイヤのワイヤボンディング方法
US6077757A (en) * 1997-05-15 2000-06-20 Nec Corporation Method of forming chip semiconductor devices
US6256549B1 (en) 1998-05-13 2001-07-03 Cirrus Logic, Inc. Integrated manufacturing solutions
US6357036B1 (en) * 1998-10-02 2002-03-12 Cirrus Logic, Inc. Computerized method and apparatus for designing wire bond diagrams and locating bond pads for a semiconductor device
US6289492B1 (en) * 1998-12-18 2001-09-11 Cognex Corporation Methods and apparatuses for defining a region on an elongated object
DE19935422A1 (de) 1999-07-28 2001-02-01 Daimler Chrysler Ag Verfahren zur Erzeugung einer Leitungsstruktur mit wenigstens einem Kabelbündel
KR100442697B1 (ko) * 2002-03-11 2004-08-02 삼성전자주식회사 자동 와이어 본딩 공정을 위한 통합 관리 시스템
JP2007209991A (ja) * 2006-02-07 2007-08-23 Toyota Auto Body Co Ltd 溶接打点の管理システム、プログラム、記録媒体
CN103456650B (zh) * 2007-03-13 2016-08-24 库利克和索夫工业公司 用于丝焊及相关半导体处理操作的眼点训练方法
WO2008111977A1 (en) * 2007-03-13 2008-09-18 Kulicke And Soffa Industries, Inc. Method of teaching eyepoints for wire bonding and related semiconductor processing operations
TW201125091A (en) * 2010-01-15 2011-07-16 de-bao Peng Method for detecting wiring location of wire rack.

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3598978A (en) * 1968-08-21 1971-08-10 Rca Corp Object-positioning system and method
US4253111A (en) * 1978-09-25 1981-02-24 Gca Corporation Apparatus for bonding leads to semiconductor chips
JPS5598842A (en) * 1978-09-28 1980-07-28 Toshiba Corp Position detection system
JPS55165643A (en) * 1979-06-12 1980-12-24 Fujitsu Ltd Device for bonding pellet
JPS56132505A (en) * 1980-03-24 1981-10-16 Hitachi Ltd Position detecting method
EP0041870B1 (de) * 1980-06-10 1986-12-30 Fujitsu Limited Vorrichtung für die Erkennung der Lage eines Motives
JPS5958586A (ja) * 1982-09-28 1984-04-04 Toshiba Mach Co Ltd マスクの検査方法および装置
JPS6021535A (ja) * 1983-06-30 1985-02-02 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 半導体装置を相互接続する方法
US4635208A (en) * 1985-01-18 1987-01-06 Hewlett-Packard Company Computer-aided design of systems
US4718019A (en) * 1985-06-28 1988-01-05 Control Data Corporation Election beam exposure system and an apparatus for carrying out a pattern unwinder

Also Published As

Publication number Publication date
DE3789838T2 (de) 1994-09-22
JPH0477462B2 (de) 1992-12-08
EP0258869A3 (en) 1989-09-06
KR960002991B1 (ko) 1996-03-02
JPS6362241A (ja) 1988-03-18
KR880004545A (ko) 1988-06-07
US4864514A (en) 1989-09-05
EP0258869B1 (de) 1994-05-18
EP0258869A2 (de) 1988-03-09

Similar Documents

Publication Publication Date Title
DE3789838D1 (de) Verfahren zum Verbinden eines Drahtes.
DE3583934D1 (de) Verfahren zum herstellen einer halbleiterverbundanordnung.
DE3767962D1 (de) Verfahren zum ausbilden eines brueckenkontaktes.
DE3765078D1 (de) Verfahren zum anfertigen eines fundaments.
DE68911621D1 (de) Verfahren zum Herstellen einer Einrichtung.
DE3685970D1 (de) Verfahren zum herstellen eines halbleiterbauelements.
DE3680281D1 (de) Verfahren zum verbinden von silikonbeschichtetem gewebe.
DE3778716D1 (de) Verfahren zum positionieren eines wandlerkopfes.
DE3686600D1 (de) Verfahren zum herstellen einer harzumhuellten halbleiteranordnung.
DE69005104D1 (de) Verfahren zum löten ohne flussmittel.
DE68905001D1 (de) Verfahren zum flussmittelfreien loeten.
DE3876744D1 (de) Verfahren zum aufbringen von konversionsueberzuegen.
DE3685475D1 (de) Verfahren zum loeten ohne flussmittel in einer silanatmosphaere.
DE3778639D1 (de) Verfahren zum stapelverbinden von draehten.
DE3888129D1 (de) Verfahren zum Verbinden einer Elektrode.
DE3765596D1 (de) Verfahren zum sprengplattieren.
DE3863326D1 (de) Verfahren zum anfahren eines vergasers.
DE3775665D1 (de) Verfahren zum filtrieren planktonhaltigen wassers.
DE3671324D1 (de) Verfahren zum herstellen einer halbleiteranordnung.
ATA333086A (de) Verfahren zum abbau von polysacchariden
DE3777149D1 (de) Verfahren zum vermehren von pflanzensetzlingen.
DE3684202D1 (de) Verfahren zum herstellen einer passivierungsschicht.
DE3877601D1 (de) Verfahren zum herstellen eines supraleitenden drahtes.
DE3667781D1 (de) Verfahren zum verbinden von keramischen gegenstaenden.
DE3483424D1 (de) Verfahren zum verseilen von profildraehten.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)