DE3708147A1 - Von einer lichtventilvorrichtung gebrauch machender photoplotter und verfahren zum belichten von graphischen darstellungen - Google Patents

Von einer lichtventilvorrichtung gebrauch machender photoplotter und verfahren zum belichten von graphischen darstellungen

Info

Publication number
DE3708147A1
DE3708147A1 DE19873708147 DE3708147A DE3708147A1 DE 3708147 A1 DE3708147 A1 DE 3708147A1 DE 19873708147 DE19873708147 DE 19873708147 DE 3708147 A DE3708147 A DE 3708147A DE 3708147 A1 DE3708147 A1 DE 3708147A1
Authority
DE
Germany
Prior art keywords
light
sub
areas
sheet
valve device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19873708147
Other languages
German (de)
English (en)
Other versions
DE3708147C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Heinz Joseph Gerber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gerber Scientific Inc
Original Assignee
Gerber Scientific Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gerber Scientific Inc filed Critical Gerber Scientific Inc
Publication of DE3708147A1 publication Critical patent/DE3708147A1/de
Application granted granted Critical
Publication of DE3708147C2 publication Critical patent/DE3708147C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D9/00—Recording measured values
    • G01D9/42—Recording indications of measuring instruments by photographic means, e.g. of counters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Projection-Type Copiers In General (AREA)
  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Facsimile Heads (AREA)
DE19873708147 1986-03-14 1987-03-13 Von einer lichtventilvorrichtung gebrauch machender photoplotter und verfahren zum belichten von graphischen darstellungen Granted DE3708147A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/840,416 US4675702A (en) 1986-03-14 1986-03-14 Photoplotter using a light valve device and process for exposing graphics

Publications (2)

Publication Number Publication Date
DE3708147A1 true DE3708147A1 (de) 1987-09-24
DE3708147C2 DE3708147C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-02-14

Family

ID=25282322

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19873708147 Granted DE3708147A1 (de) 1986-03-14 1987-03-13 Von einer lichtventilvorrichtung gebrauch machender photoplotter und verfahren zum belichten von graphischen darstellungen

Country Status (5)

Country Link
US (1) US4675702A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS62249165A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3708147A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2595833B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2187855B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3813398A1 (de) * 1988-04-21 1989-11-02 Heidelberger Druckmasch Ag Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte
DE4009282C1 (en) * 1990-03-22 1991-01-31 Gerhard Kurz Hard copy maker for output data using paper or film - has mechanical-electric interface for printing unit and photocopying unit with structured plane light source and imaging system
EP0845710A1 (de) * 1996-11-29 1998-06-03 Schablonentechnik Kufstein Aktiengesellschaft Verfahren und Vorrichtung zur Herstellung einer Druckschablone
DE10012017A1 (de) * 2000-03-11 2001-09-13 Basysprint Gmbh Sys Druckind Belichtungsvorrichtung und Verfahren zur Kompensation von optischen Fehlern
WO2007096094A3 (de) * 2006-02-22 2007-10-18 Kleo Maschb Ag Belichtungsanlage

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH061312B2 (ja) * 1986-02-20 1994-01-05 富士写真フイルム株式会社 液晶駆動制御装置
GB8802025D0 (en) * 1988-01-29 1988-02-24 Minnesota Mining & Mfg Imaging method & apparatus
US4910396A (en) * 1988-10-21 1990-03-20 Grove Charles H Optical shutter switching matrix
US5023652A (en) * 1989-07-11 1991-06-11 Purro Norina M Method and apparatus for photographic printing
JP2893778B2 (ja) * 1990-01-17 1999-05-24 キヤノン株式会社 露光装置
JPH03253184A (ja) * 1990-03-02 1991-11-12 Kowa Co 画像記録装置
US5296891A (en) * 1990-05-02 1994-03-22 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Illumination device
US5157538A (en) * 1990-06-29 1992-10-20 The United States Of America As Represented By The Secretary Of The Air Force Silicon spatial light modulator
US5317338A (en) * 1991-10-29 1994-05-31 International Business Machines Corporation Visual measurement technique and test pattern for aperture offsets in photoplotters
DE59105477D1 (de) * 1991-10-30 1995-06-14 Fraunhofer Ges Forschung Belichtungsvorrichtung.
DE59105407D1 (de) * 1991-10-30 1995-06-08 Fraunhofer Ges Forschung Belichtungsvorrichtung.
FR2686723B1 (fr) * 1992-01-24 1997-01-17 Matra Defense Dispositif de restitution d'image memorisee.
JP2616660B2 (ja) * 1993-06-21 1997-06-04 日本電気株式会社 厚膜配線パターンの露光装置および厚膜の成形方法
US5765062A (en) * 1994-04-19 1998-06-09 Keepsake, Inc. Reusable fun photography double exposure camera
JPH09292657A (ja) * 1996-02-27 1997-11-11 Fuji Photo Film Co Ltd 画像露光装置並びにミラーアレイデバイスおよび液晶パネル
EP0914626A4 (en) * 1996-07-25 2002-02-20 Anvik Corp MASKLESS AND DISCONTINUOUS LITHOGRAPHIC SYSTEM INCLUDING A LIGHT SPACE MODULATOR
GB2315700A (en) * 1996-07-27 1998-02-11 Rupert Charles David Young Use of dynamic masks for object manufacture
PL183950B1 (pl) * 1996-12-23 2002-08-30 New System Srl Układ przenoszenia digitalizowanych obrazów
RU2178907C2 (ru) * 1996-12-23 2002-01-27 Нью Систем С.Р.Л. Система для переноса преобразованных в цифровую форму изображений на чувствительную основу
GB2323933B (en) * 1997-04-02 2001-09-19 Ian Douglas Eustace Image maker
DE19716240C2 (de) * 1997-04-18 2003-12-04 Mivatec Gmbh Fotoplott-Verfahren und Anordnung zur Aufzeichnung eines computergespeicherten Rasterbildes auf einen ebenen lichtempfindlichen Aufzeichnungsträger
US6459444B1 (en) * 1997-09-10 2002-10-01 Fuji Photo Film Co., Ltd. Line-sequential recording method and apparatus thereof using stationary recording material
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
WO2000026702A1 (fr) * 1998-11-04 2000-05-11 Xiaojing Shao Dispositif d'enregistrement pour reseau de diffraction et procede d'enregistrement d'image tridimensionnelle ou bidimensionnelle
WO2001018494A1 (en) * 1999-09-03 2001-03-15 Cortron Corporation Digital imaging system utilizing modulated broadband light
JP2003509701A (ja) * 1999-09-17 2003-03-11 バイオアレイ・ソリューションズ・エルエルシー プログラム可能な照射パターン生産のためのシステム及び方法
JP2001188354A (ja) * 1999-12-28 2001-07-10 Asahi Kasei Corp 感光性樹脂凸版の製造方法、及びその製造装置
US6700598B1 (en) 2000-04-25 2004-03-02 Cortron Corporation Digital imaging system employing non-coherent light source
TW556043B (en) * 2001-11-30 2003-10-01 Asml Netherlands Bv Imaging apparatus, device manufacturing method and device manufactured by said method
US6766740B1 (en) * 2002-02-21 2004-07-27 Precision Rubber Plate Co., Inc. Apparatus and method using a UV light collimator to expose a photopolymer plate
KR100640999B1 (ko) * 2003-12-29 2006-11-02 엘지.필립스 엘시디 주식회사 액정표시장치를 이용한 출판인쇄장치 및 액정표시장치를 이용한 앤쇄용 필름 제작방법
JP4621618B2 (ja) * 2006-03-28 2011-01-26 株式会社東芝 図形描画装置、図形描画方法、およびプログラム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3695154A (en) * 1970-09-15 1972-10-03 Gerber Scientific Instr Co Variable aperture photoexposure device
DE2812206A1 (de) * 1978-03-20 1979-10-04 Philips Patentverwaltung Optischer drucker

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3689932A (en) * 1970-05-25 1972-09-05 Gerber Scientific Instr Co Scanning device for exposing a photosensitive surface
DE2322473A1 (de) * 1973-05-04 1974-11-21 Philips Patentverwaltung Faksimile-geraet zum schreiben und lesen von mechanisch bewegten vorlagen
DE2343600C3 (de) * 1973-08-29 1978-04-06 Ilja Michailowitsch Glaskow Mikrophoto-Setzgerät zur Herstellung von Musterstrukturen
US4110762A (en) * 1974-05-10 1978-08-29 Commissariat A L'energie Atomique Drawing machines especially for integrated circuit masks
US4050814A (en) * 1974-12-24 1977-09-27 Rockwell International Corporation Programmable light control matrix device
US4225224A (en) * 1979-03-13 1980-09-30 The United States Of America As Represented By The Secretary Of The Army Process and apparatus for laser illumination of printing plates
US4312004A (en) * 1979-05-07 1982-01-19 Bell & Howell Company Methods and apparatus for recording electric signals
JPS564286A (en) * 1979-06-25 1981-01-17 Canon Inc Photoelectric converter
US4378568A (en) * 1981-01-29 1983-03-29 Eastman Kodak Company Light valve imaging apparatus and method for providing gray scale
GB2136142B (en) * 1983-03-03 1987-01-21 Marconi Co Ltd Apparatus for forming an image on a photo-sensitive member
GB8318835D0 (en) * 1983-07-12 1983-08-10 Crosfield Electronics Ltd Half-tone image reproducing

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3695154A (en) * 1970-09-15 1972-10-03 Gerber Scientific Instr Co Variable aperture photoexposure device
DE2812206A1 (de) * 1978-03-20 1979-10-04 Philips Patentverwaltung Optischer drucker

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3813398A1 (de) * 1988-04-21 1989-11-02 Heidelberger Druckmasch Ag Verfahren und einrichtung zur erzeugung eines latenten bildes auf einer lichtempfindlichen beschichtung einer offset-druckplatte
DE4009282C1 (en) * 1990-03-22 1991-01-31 Gerhard Kurz Hard copy maker for output data using paper or film - has mechanical-electric interface for printing unit and photocopying unit with structured plane light source and imaging system
EP0845710A1 (de) * 1996-11-29 1998-06-03 Schablonentechnik Kufstein Aktiengesellschaft Verfahren und Vorrichtung zur Herstellung einer Druckschablone
DE10012017A1 (de) * 2000-03-11 2001-09-13 Basysprint Gmbh Sys Druckind Belichtungsvorrichtung und Verfahren zur Kompensation von optischen Fehlern
WO2007096094A3 (de) * 2006-02-22 2007-10-18 Kleo Maschb Ag Belichtungsanlage
US8248581B2 (en) 2006-02-22 2012-08-21 Kleo Ag Exposure system

Also Published As

Publication number Publication date
DE3708147C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-02-14
GB2187855A (en) 1987-09-16
JPS62249165A (ja) 1987-10-30
GB8702559D0 (en) 1987-03-11
US4675702A (en) 1987-06-23
GB2187855B (en) 1990-03-14
FR2595833B1 (fr) 1993-09-17
FR2595833A1 (fr) 1987-09-18
JPH0139094B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-08-18

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: SCHAUMBURG, K., DIPL.-ING. THOENES, D., DIPL.-PHYS. DR.RER.NAT. ENGLAENDER, K., DIPL.-ING., PAT.-ANWAELTE, 8000 MUENCHEN

8339 Ceased/non-payment of the annual fee