DE3687220D1 - Verfahren und vorrichtung zur detektion von musterfehlern. - Google Patents
Verfahren und vorrichtung zur detektion von musterfehlern.Info
- Publication number
- DE3687220D1 DE3687220D1 DE8686117339T DE3687220T DE3687220D1 DE 3687220 D1 DE3687220 D1 DE 3687220D1 DE 8686117339 T DE8686117339 T DE 8686117339T DE 3687220 T DE3687220 T DE 3687220T DE 3687220 D1 DE3687220 D1 DE 3687220D1
- Authority
- DE
- Germany
- Prior art keywords
- detecting pattern
- pattern errors
- errors
- detecting
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V10/00—Arrangements for image or video recognition or understanding
- G06V10/70—Arrangements for image or video recognition or understanding using pattern recognition or machine learning
- G06V10/74—Image or video pattern matching; Proximity measures in feature spaces
- G06V10/75—Organisation of the matching processes, e.g. simultaneous or sequential comparisons of image or video features; Coarse-fine approaches, e.g. multi-scale approaches; using context analysis; Selection of dictionaries
- G06V10/751—Comparing pixel values or logical combinations thereof, or feature values having positional relevance, e.g. template matching
- G06V10/7515—Shifting the patterns to accommodate for positional errors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30141—Printed circuit board [PCB]
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Artificial Intelligence (AREA)
- Medical Informatics (AREA)
- Pathology (AREA)
- Biochemistry (AREA)
- Quality & Reliability (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Computing Systems (AREA)
- Databases & Information Systems (AREA)
- Evolutionary Computation (AREA)
- Immunology (AREA)
- Software Systems (AREA)
- Multimedia (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Image Processing (AREA)
- Closed-Circuit Television Systems (AREA)
- Image Analysis (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60281558A JPH0621769B2 (ja) | 1985-12-13 | 1985-12-13 | パタ−ン欠陥検出方法およびその装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3687220D1 true DE3687220D1 (de) | 1993-01-14 |
DE3687220T2 DE3687220T2 (de) | 1993-07-01 |
Family
ID=17640856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8686117339T Expired - Fee Related DE3687220T2 (de) | 1985-12-13 | 1986-12-12 | Verfahren und vorrichtung zur detektion von musterfehlern. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4803734A (de) |
EP (1) | EP0225651B1 (de) |
JP (1) | JPH0621769B2 (de) |
KR (1) | KR910007789B1 (de) |
DE (1) | DE3687220T2 (de) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0658216B2 (ja) * | 1986-01-13 | 1994-08-03 | 株式会社日立製作所 | パタ−ン欠陥判定装置 |
JP2539856B2 (ja) * | 1987-10-15 | 1996-10-02 | 株式会社ヒューテック | 印刷パタ―ン周期長のずれ検知方法 |
US5073952A (en) * | 1988-09-07 | 1991-12-17 | Sigmax Kabushiki Kaisha | Pattern recognition device |
FR2647574B1 (fr) * | 1989-05-12 | 1991-09-06 | Automatisme Robotique Applique | Procedes et dispositifs pour effectuer des controles de fabrication visuels d'une serie de pieces identiques |
JP2833137B2 (ja) * | 1990-04-05 | 1998-12-09 | 松下電器産業株式会社 | パターンマッチング方法 |
US5258855A (en) * | 1991-03-20 | 1993-11-02 | System X, L. P. | Information processing methodology |
US6683697B1 (en) | 1991-03-20 | 2004-01-27 | Millenium L.P. | Information processing methodology |
EP0603833B1 (de) * | 1992-12-22 | 1999-06-30 | Konica Corporation | Farbbildverarbeitungsgerät zur Glättung eines Bildes |
US5305392A (en) * | 1993-01-11 | 1994-04-19 | Philip Morris Incorporated | High speed, high resolution web inspection system |
US5852685A (en) * | 1993-07-26 | 1998-12-22 | Cognitronics Imaging Systems, Inc. | Enhanced batched character image processing |
US5608816A (en) * | 1993-12-24 | 1997-03-04 | Matsushita Electric Industrial Co., Ltd. | Apparatus for inspecting a wiring pattern according to a micro-inspection and a macro-inspection performed in parallel |
JPH08204096A (ja) * | 1995-01-30 | 1996-08-09 | Nec Corp | 半導体装置のリード外観検査方法および検査装置 |
JP3982646B2 (ja) * | 1997-04-28 | 2007-09-26 | 財団法人くまもとテクノ産業財団 | 画像識別装置および方法および画像識別装置を備えた画像検出識別装置ならびに画像識別用プログラムを記録した媒体 |
US6529621B1 (en) * | 1998-12-17 | 2003-03-04 | Kla-Tencor | Mechanisms for making and inspecting reticles |
JP3593302B2 (ja) * | 1999-06-15 | 2004-11-24 | 株式会社ミツトヨ | 画像測定装置及び方法 |
JP4653339B2 (ja) * | 2001-05-31 | 2011-03-16 | 大和製罐株式会社 | 画像マッチング処理方法 |
JP4653340B2 (ja) * | 2001-05-31 | 2011-03-16 | 大和製罐株式会社 | 3板式ccdカメラを用いた缶外観検査装置 |
JP2002358509A (ja) * | 2001-06-01 | 2002-12-13 | Dainippon Screen Mfg Co Ltd | 穴検査装置 |
JP3904419B2 (ja) * | 2001-09-13 | 2007-04-11 | 株式会社日立製作所 | 検査装置および検査システム |
JP2003100826A (ja) * | 2001-09-26 | 2003-04-04 | Hitachi Ltd | 検査データ解析プログラムと検査装置と検査システム |
US20030086596A1 (en) * | 2001-11-07 | 2003-05-08 | Medical Metrics, Inc. | Method, computer software, and system for tracking, stabilizing, and reporting motion between vertebrae |
AU2003244854A1 (en) * | 2002-07-09 | 2004-01-23 | Anglo-European College Of Chiropractic Ltd | Method for imaging the relative motion of skeletal segments |
US7423280B2 (en) * | 2004-08-09 | 2008-09-09 | Quad/Tech, Inc. | Web inspection module including contact image sensors |
US7699021B2 (en) * | 2004-12-22 | 2010-04-20 | Sokudo Co., Ltd. | Cluster tool substrate throughput optimization |
US7819079B2 (en) * | 2004-12-22 | 2010-10-26 | Applied Materials, Inc. | Cartesian cluster tool configuration for lithography type processes |
US20060182535A1 (en) * | 2004-12-22 | 2006-08-17 | Mike Rice | Cartesian robot design |
US7255747B2 (en) * | 2004-12-22 | 2007-08-14 | Sokudo Co., Ltd. | Coat/develop module with independent stations |
US7651306B2 (en) * | 2004-12-22 | 2010-01-26 | Applied Materials, Inc. | Cartesian robot cluster tool architecture |
US7798764B2 (en) | 2005-12-22 | 2010-09-21 | Applied Materials, Inc. | Substrate processing sequence in a cartesian robot cluster tool |
US20060241813A1 (en) * | 2005-04-22 | 2006-10-26 | Applied Materials, Inc. | Optimized cluster tool transfer process and collision avoidance design |
US8676293B2 (en) * | 2006-04-13 | 2014-03-18 | Aecc Enterprises Ltd. | Devices, systems and methods for measuring and evaluating the motion and function of joint structures and associated muscles, determining suitability for orthopedic intervention, and evaluating efficacy of orthopedic intervention |
US7792336B2 (en) * | 2006-08-16 | 2010-09-07 | International Business Machines Corporation | Signature capture aesthetic/temporal qualification failure detection |
US20090099481A1 (en) | 2007-10-10 | 2009-04-16 | Adam Deitz | Devices, Systems and Methods for Measuring and Evaluating the Motion and Function of Joints and Associated Muscles |
WO2011038236A2 (en) | 2009-09-25 | 2011-03-31 | Ortho Kinematics, Inc. | Systems and devices for an integrated imaging system with real-time feedback loops and methods therefor |
EP3150113A1 (de) | 2010-12-13 | 2017-04-05 | Ortho Kinematics, Inc. | Verfahren, systeme und vorrichtungen zur berichterstattung über klinische daten und für chirurgische navigation |
JP6350204B2 (ja) * | 2014-10-21 | 2018-07-04 | 株式会社ニューフレアテクノロジー | 描画データ検証方法、プログラム、及びマルチ荷電粒子ビーム描画装置 |
US9430457B2 (en) * | 2014-12-24 | 2016-08-30 | Xerox Corporation | Ambiguity reduction for image alignment applications |
US20160354161A1 (en) | 2015-06-05 | 2016-12-08 | Ortho Kinematics, Inc. | Methods for data processing for intra-operative navigation systems |
WO2017141611A1 (ja) | 2016-02-19 | 2017-08-24 | 株式会社Screenホールディングス | 欠陥検出装置、欠陥検出方法およびプログラム |
JP6732518B2 (ja) * | 2016-04-27 | 2020-07-29 | キヤノン株式会社 | 画像処理装置および画像処理方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5313840A (en) * | 1976-07-23 | 1978-02-07 | Hitachi Ltd | Analogy calculator |
DE3380997D1 (de) * | 1982-08-31 | 1990-01-25 | Dainippon Printing Co Ltd | Verfahren zur bilduntersuchung. |
JPH0625657B2 (ja) * | 1983-06-16 | 1994-04-06 | 大日本印刷株式会社 | 印刷物の絵柄検査方法および装置 |
JPS59157505A (ja) * | 1983-02-28 | 1984-09-06 | Hitachi Ltd | パタ−ン検査装置 |
DE3476916D1 (en) * | 1983-04-28 | 1989-04-06 | Hitachi Ltd | Method of detecting pattern defect and its apparatus |
US4579455A (en) * | 1983-05-09 | 1986-04-01 | Kla Instruments Corporation | Photomask inspection apparatus and method with improved defect detection |
JPS601505A (ja) * | 1983-06-20 | 1985-01-07 | Hitachi Ltd | パタ−ン検査装置 |
US4641350A (en) * | 1984-05-17 | 1987-02-03 | Bunn Robert F | Fingerprint identification system |
US4648053A (en) * | 1984-10-30 | 1987-03-03 | Kollmorgen Technologies, Corp. | High speed optical inspection system |
US4805123B1 (en) * | 1986-07-14 | 1998-10-13 | Kla Instr Corp | Automatic photomask and reticle inspection method and apparatus including improved defect detector and alignment sub-systems |
-
1985
- 1985-12-13 JP JP60281558A patent/JPH0621769B2/ja not_active Expired - Lifetime
-
1986
- 1986-10-02 KR KR1019860008284A patent/KR910007789B1/ko not_active IP Right Cessation
- 1986-12-10 US US06/940,272 patent/US4803734A/en not_active Expired - Lifetime
- 1986-12-12 EP EP86117339A patent/EP0225651B1/de not_active Expired - Lifetime
- 1986-12-12 DE DE8686117339T patent/DE3687220T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR910007789B1 (ko) | 1991-10-02 |
JPH0621769B2 (ja) | 1994-03-23 |
EP0225651A3 (en) | 1990-01-10 |
DE3687220T2 (de) | 1993-07-01 |
JPS62140009A (ja) | 1987-06-23 |
EP0225651A2 (de) | 1987-06-16 |
KR870006621A (ko) | 1987-07-13 |
US4803734A (en) | 1989-02-07 |
EP0225651B1 (de) | 1992-12-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |