DE3632995C2 - - Google Patents
Info
- Publication number
- DE3632995C2 DE3632995C2 DE3632995A DE3632995A DE3632995C2 DE 3632995 C2 DE3632995 C2 DE 3632995C2 DE 3632995 A DE3632995 A DE 3632995A DE 3632995 A DE3632995 A DE 3632995A DE 3632995 C2 DE3632995 C2 DE 3632995C2
- Authority
- DE
- Germany
- Prior art keywords
- gas
- laser
- compounds
- alkaline
- alkaline compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 192
- 150000001875 compounds Chemical class 0.000 claims description 57
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 45
- 239000010457 zeolite Substances 0.000 claims description 44
- 229910021536 Zeolite Inorganic materials 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 38
- 229910052736 halogen Inorganic materials 0.000 claims description 37
- 150000002367 halogens Chemical class 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 36
- 239000002184 metal Substances 0.000 claims description 36
- 238000001179 sorption measurement Methods 0.000 claims description 24
- 239000012535 impurity Substances 0.000 claims description 22
- 238000009835 boiling Methods 0.000 claims description 21
- 239000007787 solid Substances 0.000 claims description 18
- 230000001590 oxidative effect Effects 0.000 claims description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- 230000002378 acidificating effect Effects 0.000 claims description 12
- 150000004820 halides Chemical class 0.000 claims description 11
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 8
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 7
- 238000009833 condensation Methods 0.000 claims description 6
- 230000005494 condensation Effects 0.000 claims description 6
- 229910052742 iron Inorganic materials 0.000 claims description 6
- 150000002739 metals Chemical class 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 150000002736 metal compounds Chemical class 0.000 claims description 5
- 229910052750 molybdenum Inorganic materials 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- 239000000395 magnesium oxide Substances 0.000 claims description 4
- 229910052748 manganese Inorganic materials 0.000 claims description 4
- 229910001507 metal halide Inorganic materials 0.000 claims description 4
- 150000005309 metal halides Chemical class 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 229910052714 tellurium Inorganic materials 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 229910052720 vanadium Inorganic materials 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 229910052726 zirconium Inorganic materials 0.000 claims description 4
- 150000001339 alkali metal compounds Chemical class 0.000 claims description 3
- 150000001341 alkaline earth metal compounds Chemical class 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 238000011084 recovery Methods 0.000 claims 1
- 238000004140 cleaning Methods 0.000 description 37
- 238000006243 chemical reaction Methods 0.000 description 33
- 229910052756 noble gas Inorganic materials 0.000 description 27
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 26
- 239000000463 material Substances 0.000 description 19
- 238000011282 treatment Methods 0.000 description 16
- 239000000356 contaminant Substances 0.000 description 15
- 238000002474 experimental method Methods 0.000 description 11
- 229910052743 krypton Inorganic materials 0.000 description 11
- 150000002222 fluorine compounds Chemical class 0.000 description 10
- 229910052734 helium Inorganic materials 0.000 description 10
- 229910052754 neon Inorganic materials 0.000 description 9
- 229910052724 xenon Inorganic materials 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 239000002808 molecular sieve Substances 0.000 description 8
- 239000011575 calcium Substances 0.000 description 7
- 229910052731 fluorine Inorganic materials 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
- 239000003463 adsorbent Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 239000003085 diluting agent Substances 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 150000002835 noble gases Chemical class 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 238000000746 purification Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 4
- 229910052791 calcium Inorganic materials 0.000 description 4
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical compound F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 4
- 230000003247 decreasing effect Effects 0.000 description 4
- 238000003795 desorption Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000003203 everyday effect Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000008188 pellet Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- -1 F 2 Chemical class 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 239000007800 oxidant agent Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 230000000274 adsorptive effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000007872 degassing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 239000003701 inert diluent Substances 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- SZUVGFMDDVSKSI-WIFOCOSTSA-N (1s,2s,3s,5r)-1-(carboxymethyl)-3,5-bis[(4-phenoxyphenyl)methyl-propylcarbamoyl]cyclopentane-1,2-dicarboxylic acid Chemical compound O=C([C@@H]1[C@@H]([C@](CC(O)=O)([C@H](C(=O)N(CCC)CC=2C=CC(OC=3C=CC=CC=3)=CC=2)C1)C(O)=O)C(O)=O)N(CCC)CC(C=C1)=CC=C1OC1=CC=CC=C1 SZUVGFMDDVSKSI-WIFOCOSTSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229940043430 calcium compound Drugs 0.000 description 1
- 150000001674 calcium compounds Chemical class 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229940126543 compound 14 Drugs 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000008246 gaseous mixture Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- PMTRSEDNJGMXLN-UHFFFAOYSA-N titanium zirconium Chemical compound [Ti].[Zr] PMTRSEDNJGMXLN-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
- Treating Waste Gases (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60213691A JPS6274430A (ja) | 1985-09-28 | 1985-09-28 | 希ガスハライドエキシマ−レ−ザ−ガスの精製法 |
| JP61122206A JPH0624605B2 (ja) | 1986-05-29 | 1986-05-29 | 希ガスハライドエキシマ−レ−ザ−ガスの精製法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3632995A1 DE3632995A1 (de) | 1987-04-02 |
| DE3632995C2 true DE3632995C2 (enExample) | 1988-08-04 |
Family
ID=26459373
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19863632995 Granted DE3632995A1 (de) | 1985-09-28 | 1986-09-29 | Verfahren zur reinigung von gasen fuer edelgashalogenidexcimerenlaser |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4740982A (enExample) |
| CA (1) | CA1298959C (enExample) |
| DE (1) | DE3632995A1 (enExample) |
| FR (1) | FR2587914B1 (enExample) |
| GB (1) | GB2182484B (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4132218A1 (de) * | 1991-09-27 | 1993-04-01 | Leybold Ag | Verfahren und vorrichtung zur reinigung und rueckfuehrung von gasen |
| DE19528784C1 (de) * | 1995-08-04 | 1996-08-29 | Inst Neuwertwirtschaft Gmbh | Verfahren zur Reinigung von Inertgasen mittels Sorbenzien |
Families Citing this family (54)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4977571A (en) * | 1988-03-29 | 1990-12-11 | Candela Laser Corporation | Dye laser solution circulation system |
| IT1229210B (it) * | 1988-03-31 | 1991-07-25 | Central Glass Co Ltd | Metodo e dispositivo per analizzare gas contenenti fluoro. |
| JPH0756905B2 (ja) * | 1988-10-04 | 1995-06-14 | 富士電機株式会社 | エキシマレーザ装置 |
| JPH02112292A (ja) * | 1988-10-20 | 1990-04-24 | Mitsubishi Electric Corp | ハロゲンガスレーザのガス制御装置 |
| JPH0760914B2 (ja) * | 1989-01-30 | 1995-06-28 | セントラル硝子株式会社 | エキシマーレーザーガスの精製法並びにその装置 |
| DE4002185C2 (de) * | 1990-01-25 | 1994-01-13 | Lambda Physik Forschung | Vorrichtung zum Reinigen von Lasergas |
| JPH06177B2 (ja) * | 1990-02-05 | 1994-01-05 | 株式会社荏原総合研究所 | Ｃ１ｆ▲下３▼を含有する排ガスの処理方法 |
| DE4009850C1 (enExample) * | 1990-03-27 | 1991-11-07 | Lambda Physik Gesellschaft Zur Herstellung Von Lasern Mbh, 3400 Goettingen, De | |
| EP0527986B1 (en) * | 1991-03-06 | 1994-07-20 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | A method for extending the gas lifetime of excimer lasers |
| US5073896A (en) * | 1991-04-18 | 1991-12-17 | Lumonics Inc. | Purification of laser gases |
| DE4335079C1 (de) * | 1993-10-14 | 1995-01-19 | Lambda Physik Gmbh | Elektroden in einer Fluor enthaltenden Entladungseinheit eines gepulsten Gasentladungslasers |
| US5676914A (en) * | 1994-04-26 | 1997-10-14 | Competitive Technologies, Inc. | Method for the destruction of methylene iodide |
| US5696785A (en) * | 1994-10-11 | 1997-12-09 | Corning Incorporated | Impurity getters in laser enclosures |
| DE4441199B4 (de) * | 1994-11-18 | 2006-03-16 | Lambda Physik Ag | Vorrichtung und Verfahren zum Reinigen von in eine Laserkammer einzuleitenden Gasen |
| US5646954A (en) * | 1996-02-12 | 1997-07-08 | Cymer, Inc. | Maintenance strategy control system and monitoring method for gas discharge lasers |
| US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
| US5982795A (en) * | 1997-12-22 | 1999-11-09 | Cymer, Inc. | Excimer laser having power supply with fine digital regulation |
| US6330261B1 (en) | 1997-07-18 | 2001-12-11 | Cymer, Inc. | Reliable, modular, production quality narrow-band high rep rate ArF excimer laser |
| FR2770694B1 (fr) * | 1997-11-03 | 1999-12-17 | Commissariat Energie Atomique | Dispositif de laser a gaz et a moyens de purification de gaz integres |
| JP3725781B2 (ja) * | 1997-12-15 | 2005-12-14 | サイマー， インコーポレイテッド | 高パルス速度パルス電源システム |
| US6240117B1 (en) | 1998-01-30 | 2001-05-29 | Cymer, Inc. | Fluorine control system with fluorine monitor |
| US5978406A (en) * | 1998-01-30 | 1999-11-02 | Cymer, Inc. | Fluorine control system for excimer lasers |
| US6490307B1 (en) | 1999-03-17 | 2002-12-03 | Lambda Physik Ag | Method and procedure to automatically stabilize excimer laser output parameters |
| US6285701B1 (en) | 1998-08-06 | 2001-09-04 | Lambda Physik Ag | Laser resonator for improving narrow band emission of an excimer laser |
| US6212214B1 (en) | 1998-10-05 | 2001-04-03 | Lambda Physik Ag | Performance control system and method for gas discharge lasers |
| US6526085B2 (en) * | 1998-10-05 | 2003-02-25 | Lambda Physik Ag | Performance control system and method for gas discharge lasers |
| US6060031A (en) * | 1998-07-27 | 2000-05-09 | Trw Inc. | Method for neutralizing acid gases from laser exhaust |
| DE19942455A1 (de) | 1998-10-05 | 2000-04-06 | Lambda Physik Gmbh | Leistungssteuersystem und -verfahren für Gasentladungslaser |
| US6965624B2 (en) * | 1999-03-17 | 2005-11-15 | Lambda Physik Ag | Laser gas replenishment method |
| US6389052B2 (en) | 1999-03-17 | 2002-05-14 | Lambda Physik Ag | Laser gas replenishment method |
| US6700915B2 (en) | 1999-03-12 | 2004-03-02 | Lambda Physik Ag | Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections |
| US6727731B1 (en) | 1999-03-12 | 2004-04-27 | Lambda Physik Ag | Energy control for an excimer or molecular fluorine laser |
| US6243406B1 (en) | 1999-03-12 | 2001-06-05 | Peter Heist | Gas performance control system for gas discharge lasers |
| US6714577B1 (en) | 1999-03-17 | 2004-03-30 | Lambda Physik Ag | Energy stabilized gas discharge laser |
| US6603789B1 (en) | 2000-07-05 | 2003-08-05 | Lambda Physik Ag | Narrow band excimer or molecular fluorine laser with improved beam parameters |
| US6721345B2 (en) | 2000-07-14 | 2004-04-13 | Lambda Physik Ag | Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers |
| US6801561B2 (en) | 2000-09-25 | 2004-10-05 | Lambda Physik Ag | Laser system and method for spectral narrowing through wavefront correction |
| US6768765B1 (en) * | 2001-06-07 | 2004-07-27 | Lambda Physik Ag | High power excimer or molecular fluorine laser system |
| JP2003021619A (ja) * | 2001-07-05 | 2003-01-24 | Canon Inc | 蛍石及びその分析法、製造法、光学特性評価法 |
| FR2830209B1 (fr) * | 2001-09-28 | 2004-01-16 | Hutchinson | Procede de fabrication d'un dispositif antivibratoire pour automobile comportant un insert metallique destine a etre adherise avec un elastomere |
| KR20020096026A (ko) * | 2002-10-16 | 2002-12-28 | 장성진 | 고순도의 염기성／불활성 가스 제조를 위한 정제방법 및장치 |
| US7074378B2 (en) * | 2004-01-23 | 2006-07-11 | Air Products And Chemicals, Inc. | Process for the purification of NF3 |
| RU2295811C2 (ru) * | 2004-11-09 | 2007-03-20 | Институт оптики атмосферы Сибирское Отделение Российской Академии Наук | Способ поддержания и регулирования концентрации галогеноводорода в газоразрядной трубке лазера и газоразрядная трубка лазера на парах галогенидов металлов |
| DE102007062047A1 (de) | 2007-12-21 | 2009-07-16 | Osram Opto Semiconductors Gmbh | Kompaktgehäuse |
| FR2933817B1 (fr) * | 2008-07-08 | 2010-09-03 | Sagem Defense Securite | Laser comportant un purificateur, centrale inertielle et procede de fabrication correspondants |
| JP4891969B2 (ja) * | 2008-10-03 | 2012-03-07 | 株式会社荏原製作所 | 不純物を除去する不純物除去装置およびその運転方法 |
| US8089998B2 (en) * | 2009-05-26 | 2012-01-03 | High Q Technologies Gmbh | Ultra-short pulse laser system and method for producing femtosecond or picosecond pulses |
| EP2256879B1 (de) * | 2009-05-26 | 2013-10-02 | High Q Laser GmbH | Ultrakurzpulslasersystem und Verfahren zur Erzeugung von Femto- oder Pikosekundenpulsen |
| US20130034118A1 (en) * | 2011-08-04 | 2013-02-07 | Coherent Gmbh | Gas purifier for an excimer laser |
| WO2015075840A1 (ja) | 2013-11-25 | 2015-05-28 | ギガフォトン株式会社 | ガス精製システム及びレーザ装置 |
| CN104953444B (zh) * | 2015-07-03 | 2018-05-01 | 中国科学院光电研究院 | 一种用于准分子激光器的气体循环系统 |
| US9478934B1 (en) * | 2015-07-24 | 2016-10-25 | Lightmachinery Inc. | Excimer gas purification |
| JP6175471B2 (ja) * | 2015-10-30 | 2017-08-02 | 日本エア・リキード株式会社 | ネオン回収精製システムおよびネオン回収精製方法 |
| JP6457013B2 (ja) * | 2017-05-17 | 2019-01-23 | 日本エア・リキード株式会社 | ガスリサイクル機能を有するエキシマレーザ発振装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3806583A (en) * | 1971-03-15 | 1974-04-23 | Babcock & Wilcox Co | Recovery of radioactive noble gases from gaseous effluents |
| DE2422574A1 (de) * | 1974-05-09 | 1975-11-20 | Collo Gmbh | Schuettstoff-filtermaterial, insbesondere zur entfernung unangenehmer gerueche aus der luft, sowie verfahren zu seiner herstellung |
| US4031484A (en) * | 1975-11-11 | 1977-06-21 | United Technologies Corporation | Portable chemical laser with gas recirculation |
| US4674099A (en) * | 1984-05-01 | 1987-06-16 | Turner Robert E | Recycling of gases for an excimer laser |
| US4629611A (en) * | 1985-04-29 | 1986-12-16 | International Business Machines Corporation | Gas purifier for rare-gas fluoride lasers |
-
1986
- 1986-09-19 CA CA000518663A patent/CA1298959C/en not_active Expired - Fee Related
- 1986-09-22 US US06/909,702 patent/US4740982A/en not_active Expired - Lifetime
- 1986-09-22 GB GB8622799A patent/GB2182484B/en not_active Expired
- 1986-09-26 FR FR868613476A patent/FR2587914B1/fr not_active Expired - Fee Related
- 1986-09-29 DE DE19863632995 patent/DE3632995A1/de active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4132218A1 (de) * | 1991-09-27 | 1993-04-01 | Leybold Ag | Verfahren und vorrichtung zur reinigung und rueckfuehrung von gasen |
| DE19528784C1 (de) * | 1995-08-04 | 1996-08-29 | Inst Neuwertwirtschaft Gmbh | Verfahren zur Reinigung von Inertgasen mittels Sorbenzien |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3632995A1 (de) | 1987-04-02 |
| CA1298959C (en) | 1992-04-21 |
| FR2587914A1 (fr) | 1987-04-03 |
| US4740982A (en) | 1988-04-26 |
| FR2587914B1 (fr) | 1991-05-10 |
| GB8622799D0 (en) | 1986-10-29 |
| GB2182484B (en) | 1989-09-06 |
| GB2182484A (en) | 1987-05-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3632995C2 (enExample) | ||
| DE68926732T2 (de) | Verfahren zur Reinigung von gasförmigem Stickstofftrifluorid | |
| DE60203551T3 (de) | Herstellung von hochreinem Sauerstoff durch Druckwechseladsorption | |
| DE69526042T2 (de) | Entfernung von Kohlendioxid aus Gasströmen | |
| DE4002642C2 (enExample) | ||
| DE2854060C2 (enExample) | ||
| DE60221619T2 (de) | Verfahren zur Reinigung von Synthesegas | |
| DE3853359T2 (de) | Verfahren zur trennung und wiedergewinnung von karbonsäuregas aus einem gasgemisch durch absorption. | |
| DE69128739T2 (de) | Verfahren und Einrichtung zur Herstellung von ultrareinem Stickstoff | |
| DE2457842C2 (de) | Verfahren zur Reinigung von Argon von Sauerstoff | |
| EP3873659B1 (de) | Verfahren zur entfernung von polyfluorierten organischen verbindungen aus wasser mittels eines adsorbens und dessen regenerierung | |
| DE69018625T2 (de) | Verfahren zum aufkonzentrieren von chlorgas. | |
| DE69110038T2 (de) | Regenerierung von zeolithen, eingesetzt zur reinigung von 1,1,1,2-tetrafluorethan. | |
| EP0863375A1 (de) | Verfahren zur Krypton- und Xenon-entfernung von fluor- und/oder chlorhaltigen Verunreinigungen | |
| DE3841114A1 (de) | Verfahren zur herstellung eines adsorptionsmittels zur abtrennung und gewinnung von co | |
| DE2200210B2 (de) | Verfahren zur entfernung von stickstoffoxiden aus gasgemischen | |
| DE69200250T2 (de) | Verfahren zur verlängerung der gaslebensdauer von excimer-lasern. | |
| DE69720772T2 (de) | Verfahren zur gewinnung von schwefelhexafluorid | |
| DE2557560C3 (de) | Verfahren zum gleichzeitigen Entfernen von Stickstoffoxiden und Schwefeldioxid aus Rauchgasen | |
| EP0075663B1 (de) | Verfahren und Vorrichtung zur Herstellung von hochreinem Stickstoff | |
| DE69409423T2 (de) | Verfahren zur Reinigung von Schadgas | |
| DE2619972A1 (de) | Verfahren zur entfernung geringer konzentrationen oxidierbarer organischer verunreinigungen aus einem sauerstoffhaltigen inerten gas | |
| DE69703141T2 (de) | Entfernung von O2 und/oder CO aus einem inerten Gas durch Adsorption an porösem Metalloxid | |
| DE69213342T2 (de) | Verfahren und Apparat zur industriellen Herstellung von Chlor | |
| DE60009186T2 (de) | Verfahren und Vorrichtung zur Reinigung und Kryogen-Trennung von Luft ohne Vorkühlung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |