DE3621474C1 - Verfahren zur Ausbildung eines Filmaufbaus einer fluorierten,aliphatischen Verbindung auf einer festen Traegeroberflaeche - Google Patents

Verfahren zur Ausbildung eines Filmaufbaus einer fluorierten,aliphatischen Verbindung auf einer festen Traegeroberflaeche

Info

Publication number
DE3621474C1
DE3621474C1 DE3621474A DE3621474A DE3621474C1 DE 3621474 C1 DE3621474 C1 DE 3621474C1 DE 3621474 A DE3621474 A DE 3621474A DE 3621474 A DE3621474 A DE 3621474A DE 3621474 C1 DE3621474 C1 DE 3621474C1
Authority
DE
Germany
Prior art keywords
film
monomolecular
fluorinated
aliphatic compound
solid support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE3621474A
Other languages
German (de)
English (en)
Inventor
Seizo Miyata
Hidenari Nakahama
Takeshi Kasuga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Application granted granted Critical
Publication of DE3621474C1 publication Critical patent/DE3621474C1/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
    • H01L21/0212—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC the material being fluoro carbon compounds, e.g.(CFx) n, (CHxFy) n or polytetrafluoroethylene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
    • B05D1/202—Langmuir Blodgett films (LB films)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02285—Langmuir-Blodgett techniques

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Composite Materials (AREA)
  • Materials Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Insulating Bodies (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
DE3621474A 1985-06-26 1986-06-26 Verfahren zur Ausbildung eines Filmaufbaus einer fluorierten,aliphatischen Verbindung auf einer festen Traegeroberflaeche Expired DE3621474C1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60137850A JPS62572A (ja) 1985-06-26 1985-06-26 フッ素系有機薄膜の製造法

Publications (1)

Publication Number Publication Date
DE3621474C1 true DE3621474C1 (de) 1987-02-19

Family

ID=15208256

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3621474A Expired DE3621474C1 (de) 1985-06-26 1986-06-26 Verfahren zur Ausbildung eines Filmaufbaus einer fluorierten,aliphatischen Verbindung auf einer festen Traegeroberflaeche

Country Status (6)

Country Link
US (1) US4696838A (enExample)
JP (1) JPS62572A (enExample)
DE (1) DE3621474C1 (enExample)
FR (1) FR2584083B1 (enExample)
GB (1) GB2178339B (enExample)
IT (1) IT1190344B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19731771A1 (de) * 1997-07-24 1999-01-28 Bultykhanova Natalia Abdichtungsverfahren

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261673A (ja) * 1985-09-11 1987-03-18 Kanegafuchi Chem Ind Co Ltd 製膜方法
JPH0653249B2 (ja) * 1987-01-28 1994-07-20 松下電器産業株式会社 表面の酸化防止方法
JPS63274467A (ja) * 1987-04-30 1988-11-11 Nec Corp 高分子含弗素化合物保護膜の形成方法
US5264731A (en) * 1987-06-25 1993-11-23 Matsushita Electric Industrial Co., Ltd. Method for fabricating semiconductor device
DE3724364A1 (de) * 1987-07-23 1989-02-02 Hoechst Ag Film aus mindestens einer monomolekularen schicht
DE3731606A1 (de) * 1987-09-19 1989-03-30 Hoechst Ag Film aus mindestens einer monomolekularen schicht
JPH0696116B2 (ja) * 1988-01-13 1994-11-30 鐘淵化学工業株式会社 絶縁超薄膜
US5330565A (en) * 1988-07-14 1994-07-19 Nippon Petrochemicals Company Limited Active agent-containing printing ink
US5033404A (en) * 1988-10-26 1991-07-23 Nima Technology Ltd. Barrier mechanism for isolating drive chain from active chamber in Langmuir trough
US5024873A (en) * 1988-12-05 1991-06-18 At&T Bell Laboratories Composite films with Langmuir-Blodgett component
DE3901003A1 (de) * 1989-01-14 1990-07-19 Hoechst Ag Strahlenempfindlicher film aus mindestens einer monomolekularen schicht von fluorhaltigen amphiphilen
US5120603A (en) * 1989-06-22 1992-06-09 Digital Equipment Corporation Magneto-optic recording medium with oriented langmuir-blodgett protective layer
US4962985A (en) * 1989-10-02 1990-10-16 At&T Bell Laboratories Protective coatings for optical devices comprising Langmuir-Blodgett films
EP0615147B1 (en) * 1992-01-16 1998-08-05 Texas Instruments Incorporated Micromechanical deformable mirror device (DMD)
US5502470A (en) * 1991-02-04 1996-03-26 Seiko Epson Corporation Ink jet recording head and process for producing the same
DE69225743T2 (de) * 1991-03-14 1998-09-24 Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka Oberflächenbehandeltes Material für Bekleidung
US5976633A (en) * 1998-03-26 1999-11-02 Lexmark International, Inc. Dip coating through elevated ring
CA2586258A1 (en) * 2004-11-02 2006-05-11 Asahi Glass Company, Limited Fluorocarbon film and process for its production
WO2006059697A1 (ja) * 2004-12-03 2006-06-08 Asahi Glass Company, Limited エチレン－テトラフルオロエチレン系共重合体成形物およびその製造方法
WO2008000680A1 (en) * 2006-06-27 2008-01-03 Clariant International Ltd Fluorous telomeric compounds and polymers containing same
JP2011147890A (ja) * 2010-01-22 2011-08-04 Seiko Epson Corp 薄膜形成方法及び機能性材料の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169904A (en) * 1978-01-05 1979-10-02 International Business Machines Corporation Preparation of polymer monomolecular films
US4276350A (en) * 1979-08-13 1981-06-30 Ppg Industries, Inc. Fluorocarbon treatment for reducing the reactivity of a glass surface and product
US4311764A (en) * 1980-10-01 1982-01-19 Ppg Industries, Inc. Polyurethane surface treatment and resulting monomolecular layered article

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NICHTS-ERMITTELT *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19731771A1 (de) * 1997-07-24 1999-01-28 Bultykhanova Natalia Abdichtungsverfahren

Also Published As

Publication number Publication date
IT8620742A0 (it) 1986-06-10
IT8620742A1 (it) 1987-12-10
US4696838A (en) 1987-09-29
GB8614735D0 (en) 1986-07-23
JPH0242392B2 (enExample) 1990-09-21
FR2584083B1 (fr) 1988-07-15
JPS62572A (ja) 1987-01-06
IT1190344B (it) 1988-02-16
FR2584083A1 (fr) 1987-01-02
GB2178339B (en) 1988-09-21
GB2178339A (en) 1987-02-11

Similar Documents

Publication Publication Date Title
DE3621474C1 (de) Verfahren zur Ausbildung eines Filmaufbaus einer fluorierten,aliphatischen Verbindung auf einer festen Traegeroberflaeche
DE2842134C2 (enExample)
DE3009942C2 (de) Verfahren zum Beschichten von Substraten mit einem flüssigen Epoxymaterial
DE2904052A1 (de) Elektrochrome vorrichtung
DE69116717T2 (de) Kondensator und Verfahren zu seiner Herstellung
DE2605902A1 (de) Mit einem fluorharz beschichtete struktur und verfahren zu ihrer herstellung
DE2601861A1 (de) Verfahren zur herstellung eines kontaktdrahtes mit geringem uebergangswiderstand aus aluminium oder einer aluminiumlegierung
EP0308801B1 (de) Film aus mindestens einer monomolekularen Schicht
EP0300419B1 (de) Film aus mindestens einer monomolekularen Schicht
DE69115420T2 (de) Verfahren zum Schützen und Verfestigen von Steinmaterial
DE2722871A1 (de) Fluessigkristallzelle mit einer isolationsschicht auf siliciumoxidbasis
DE934848C (de) Elektrisch leitfaehige Gegenstaende aus Glas und Verfahren zu ihrer Herstellung
DE1596057B2 (de) Verfahren zur herstellung einer elektrode fuer brennstoffelemente
DE2641232C2 (de) Schichtaufbau und Verfahren zu seiner Herstellung
DE10206294A1 (de) Transparente Polythiophenschichten hoher Leitfähigkeit
DE10196442B4 (de) Elektronische Komponente mit einem dielektrischen Film aus wenigstens einem Bis(4-mercaptophenyl)-sulfidderivat
EP0246500B1 (de) Schichtelemente, Verfahren zu ihrer Herstellung sowie ihre Verwendung
DE2660200C3 (de) Verfahren zur Herstellung oleophober und hydrophober fluorierter Verbindungen
DE69118644T2 (de) Reversible Polymergele aus Fluorelastomeren
DE2914343C3 (de) Verfahren zum elektrochemischen Beschichten eines Metallsubstrats
DE2925370B2 (de) Verfahren zur Herstellung von kolloidalen Vanadiumpentoxidlösungen, die zur Erzeugung einer antistatischen Schicht auf hydrophoben Oberflächen verwendet werden
DE69216926T2 (de) Chemisch adsorbierter Film und Verfahren zu dessen Herstellung
DE69317618T2 (de) Herstellungsverfahren von Elektrolytkondensatoren mit einer leitfähigen Polymer-Kathodenschicht und niedrigem Leckstrom
DE69924095T2 (de) Optisch klare, dauerbeständige infrarot-fenster und herstellungsverfahren
EP0393551A2 (de) Verfahren zur Herstellung von gleichmässigen dünnen Schichten

Legal Events

Date Code Title Description
8100 Publication of patent without earlier publication of application
D1 Grant (no unexamined application published) patent law 81
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee