FR2584083B1 - Procede de formation d'un film accumule en un compose aliphatique fluore sur la surface d'un substrat - Google Patents
Procede de formation d'un film accumule en un compose aliphatique fluore sur la surface d'un substratInfo
- Publication number
- FR2584083B1 FR2584083B1 FR8609212A FR8609212A FR2584083B1 FR 2584083 B1 FR2584083 B1 FR 2584083B1 FR 8609212 A FR8609212 A FR 8609212A FR 8609212 A FR8609212 A FR 8609212A FR 2584083 B1 FR2584083 B1 FR 2584083B1
- Authority
- FR
- France
- Prior art keywords
- substrate
- forming
- aliphatic compound
- fluorinated aliphatic
- accumulated film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
- H01L21/0212—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC the material being fluoro carbon compounds, e.g.(CFx) n, (CHxFy) n or polytetrafluoroethylene
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
- B05D1/202—Langmuir Blodgett films (LB films)
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
- H01L21/02285—Langmuir-Blodgett techniques
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/312—Organic layers, e.g. photoresist
- H01L21/3128—Organic layers, e.g. photoresist by Langmuir-Blodgett techniques
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60137850A JPS62572A (ja) | 1985-06-26 | 1985-06-26 | フッ素系有機薄膜の製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2584083A1 FR2584083A1 (fr) | 1987-01-02 |
FR2584083B1 true FR2584083B1 (fr) | 1988-07-15 |
Family
ID=15208256
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8609212A Expired FR2584083B1 (fr) | 1985-06-26 | 1986-06-25 | Procede de formation d'un film accumule en un compose aliphatique fluore sur la surface d'un substrat |
Country Status (6)
Country | Link |
---|---|
US (1) | US4696838A (fr) |
JP (1) | JPS62572A (fr) |
DE (1) | DE3621474C1 (fr) |
FR (1) | FR2584083B1 (fr) |
GB (1) | GB2178339B (fr) |
IT (1) | IT1190344B (fr) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6261673A (ja) * | 1985-09-11 | 1987-03-18 | Kanegafuchi Chem Ind Co Ltd | 製膜方法 |
JPH0653249B2 (ja) * | 1987-01-28 | 1994-07-20 | 松下電器産業株式会社 | 表面の酸化防止方法 |
JPS63274467A (ja) * | 1987-04-30 | 1988-11-11 | Nec Corp | 高分子含弗素化合物保護膜の形成方法 |
US5264731A (en) * | 1987-06-25 | 1993-11-23 | Matsushita Electric Industrial Co., Ltd. | Method for fabricating semiconductor device |
DE3724364A1 (de) * | 1987-07-23 | 1989-02-02 | Hoechst Ag | Film aus mindestens einer monomolekularen schicht |
DE3731606A1 (de) * | 1987-09-19 | 1989-03-30 | Hoechst Ag | Film aus mindestens einer monomolekularen schicht |
JPH0696116B2 (ja) * | 1988-01-13 | 1994-11-30 | 鐘淵化学工業株式会社 | 絶縁超薄膜 |
US5330565A (en) * | 1988-07-14 | 1994-07-19 | Nippon Petrochemicals Company Limited | Active agent-containing printing ink |
US5033404A (en) * | 1988-10-26 | 1991-07-23 | Nima Technology Ltd. | Barrier mechanism for isolating drive chain from active chamber in Langmuir trough |
US5024873A (en) * | 1988-12-05 | 1991-06-18 | At&T Bell Laboratories | Composite films with Langmuir-Blodgett component |
DE3901003A1 (de) * | 1989-01-14 | 1990-07-19 | Hoechst Ag | Strahlenempfindlicher film aus mindestens einer monomolekularen schicht von fluorhaltigen amphiphilen |
US5120603A (en) * | 1989-06-22 | 1992-06-09 | Digital Equipment Corporation | Magneto-optic recording medium with oriented langmuir-blodgett protective layer |
US4962985A (en) * | 1989-10-02 | 1990-10-16 | At&T Bell Laboratories | Protective coatings for optical devices comprising Langmuir-Blodgett films |
EP0615147B1 (fr) * | 1992-01-16 | 1998-08-05 | Texas Instruments Incorporated | Dispositifs micromécanique à miroirs déformables (-DMD-) |
JP3160908B2 (ja) * | 1991-02-04 | 2001-04-25 | セイコーエプソン株式会社 | インクジェット記録ヘッド及びその製造方法 |
EP0508136B1 (fr) * | 1991-03-14 | 1998-06-03 | Matsushita Electric Industrial Co., Ltd. | Traitement de surface d'un matériau pour vêtement |
DE19731771A1 (de) * | 1997-07-24 | 1999-01-28 | Bultykhanova Natalia | Abdichtungsverfahren |
US5976633A (en) * | 1998-03-26 | 1999-11-02 | Lexmark International, Inc. | Dip coating through elevated ring |
WO2006049153A1 (fr) * | 2004-11-02 | 2006-05-11 | Asahi Glass Company, Limited | Film de fluorocarbone et procédé servant à produire celui-ci |
WO2006059697A1 (fr) * | 2004-12-03 | 2006-06-08 | Asahi Glass Company, Limited | Moulage de copolymère éthylène-tétrafluoroéthylène et procédé de production dudit moulage |
WO2008000680A1 (fr) * | 2006-06-27 | 2008-01-03 | Clariant International Ltd | Composes telomeriques fluores et polymeres contenant ceux-ci |
JP2011147890A (ja) * | 2010-01-22 | 2011-08-04 | Seiko Epson Corp | 薄膜形成方法及び機能性材料の製造方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4169904A (en) * | 1978-01-05 | 1979-10-02 | International Business Machines Corporation | Preparation of polymer monomolecular films |
US4276350A (en) * | 1979-08-13 | 1981-06-30 | Ppg Industries, Inc. | Fluorocarbon treatment for reducing the reactivity of a glass surface and product |
US4311764A (en) * | 1980-10-01 | 1982-01-19 | Ppg Industries, Inc. | Polyurethane surface treatment and resulting monomolecular layered article |
-
1985
- 1985-06-26 JP JP60137850A patent/JPS62572A/ja active Granted
-
1986
- 1986-06-10 IT IT20742/86A patent/IT1190344B/it active
- 1986-06-16 US US06/874,847 patent/US4696838A/en not_active Expired - Fee Related
- 1986-06-17 GB GB08614735A patent/GB2178339B/en not_active Expired
- 1986-06-25 FR FR8609212A patent/FR2584083B1/fr not_active Expired
- 1986-06-26 DE DE3621474A patent/DE3621474C1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
IT8620742A0 (it) | 1986-06-10 |
JPS62572A (ja) | 1987-01-06 |
DE3621474C1 (de) | 1987-02-19 |
US4696838A (en) | 1987-09-29 |
IT8620742A1 (it) | 1987-12-10 |
GB8614735D0 (en) | 1986-07-23 |
GB2178339A (en) | 1987-02-11 |
IT1190344B (it) | 1988-02-16 |
FR2584083A1 (fr) | 1987-01-02 |
GB2178339B (en) | 1988-09-21 |
JPH0242392B2 (fr) | 1990-09-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |