FR2584083B1 - Procede de formation d'un film accumule en un compose aliphatique fluore sur la surface d'un substrat - Google Patents

Procede de formation d'un film accumule en un compose aliphatique fluore sur la surface d'un substrat

Info

Publication number
FR2584083B1
FR2584083B1 FR8609212A FR8609212A FR2584083B1 FR 2584083 B1 FR2584083 B1 FR 2584083B1 FR 8609212 A FR8609212 A FR 8609212A FR 8609212 A FR8609212 A FR 8609212A FR 2584083 B1 FR2584083 B1 FR 2584083B1
Authority
FR
France
Prior art keywords
substrate
forming
aliphatic compound
fluorinated aliphatic
accumulated film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8609212A
Other languages
English (en)
French (fr)
Other versions
FR2584083A1 (fr
Inventor
Seizo Miyata
Hidenari Nakahama
Takeshi Kasuga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Publication of FR2584083A1 publication Critical patent/FR2584083A1/fr
Application granted granted Critical
Publication of FR2584083B1 publication Critical patent/FR2584083B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/68—Organic materials, e.g. photoresists
    • H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC
    • H10P14/687—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC the materials being fluorocarbon compounds, e.g. (CHxFy) n or polytetrafluoroethylene
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
    • B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
    • B05D1/202—Langmuir Blodgett films (LB films)
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H10P14/6344—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating using Langmuir-Blodgett techniques

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Paints Or Removers (AREA)
  • Insulating Bodies (AREA)
FR8609212A 1985-06-26 1986-06-25 Procede de formation d'un film accumule en un compose aliphatique fluore sur la surface d'un substrat Expired FR2584083B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60137850A JPS62572A (ja) 1985-06-26 1985-06-26 フッ素系有機薄膜の製造法

Publications (2)

Publication Number Publication Date
FR2584083A1 FR2584083A1 (fr) 1987-01-02
FR2584083B1 true FR2584083B1 (fr) 1988-07-15

Family

ID=15208256

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8609212A Expired FR2584083B1 (fr) 1985-06-26 1986-06-25 Procede de formation d'un film accumule en un compose aliphatique fluore sur la surface d'un substrat

Country Status (6)

Country Link
US (1) US4696838A (enExample)
JP (1) JPS62572A (enExample)
DE (1) DE3621474C1 (enExample)
FR (1) FR2584083B1 (enExample)
GB (1) GB2178339B (enExample)
IT (1) IT1190344B (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6261673A (ja) * 1985-09-11 1987-03-18 Kanegafuchi Chem Ind Co Ltd 製膜方法
JPH0653249B2 (ja) * 1987-01-28 1994-07-20 松下電器産業株式会社 表面の酸化防止方法
JPS63274467A (ja) * 1987-04-30 1988-11-11 Nec Corp 高分子含弗素化合物保護膜の形成方法
US5264731A (en) * 1987-06-25 1993-11-23 Matsushita Electric Industrial Co., Ltd. Method for fabricating semiconductor device
DE3724364A1 (de) * 1987-07-23 1989-02-02 Hoechst Ag Film aus mindestens einer monomolekularen schicht
DE3731606A1 (de) * 1987-09-19 1989-03-30 Hoechst Ag Film aus mindestens einer monomolekularen schicht
JPH0696116B2 (ja) * 1988-01-13 1994-11-30 鐘淵化学工業株式会社 絶縁超薄膜
US5330565A (en) * 1988-07-14 1994-07-19 Nippon Petrochemicals Company Limited Active agent-containing printing ink
US5033404A (en) * 1988-10-26 1991-07-23 Nima Technology Ltd. Barrier mechanism for isolating drive chain from active chamber in Langmuir trough
US5024873A (en) * 1988-12-05 1991-06-18 At&T Bell Laboratories Composite films with Langmuir-Blodgett component
DE3901003A1 (de) * 1989-01-14 1990-07-19 Hoechst Ag Strahlenempfindlicher film aus mindestens einer monomolekularen schicht von fluorhaltigen amphiphilen
US5120603A (en) * 1989-06-22 1992-06-09 Digital Equipment Corporation Magneto-optic recording medium with oriented langmuir-blodgett protective layer
US4962985A (en) * 1989-10-02 1990-10-16 At&T Bell Laboratories Protective coatings for optical devices comprising Langmuir-Blodgett films
EP0615147B1 (en) * 1992-01-16 1998-08-05 Texas Instruments Incorporated Micromechanical deformable mirror device (DMD)
DE69227659T2 (de) * 1991-02-04 1999-06-17 Seiko Epson Corp., Tokio/Tokyo Farbstrahldruckkopf und herstellungsverfahren
EP0508136B1 (en) * 1991-03-14 1998-06-03 Matsushita Electric Industrial Co., Ltd. Surface-treated apparel material
DE19731771A1 (de) * 1997-07-24 1999-01-28 Bultykhanova Natalia Abdichtungsverfahren
US5976633A (en) * 1998-03-26 1999-11-02 Lexmark International, Inc. Dip coating through elevated ring
CA2586258A1 (en) * 2004-11-02 2006-05-11 Asahi Glass Company, Limited Fluorocarbon film and process for its production
DE602005015618D1 (de) * 2004-12-03 2009-09-03 Asahi Glass Co Ltd Ethylen-tetrafluorethylen-copolymer-formkörper und herstellungsverfahren dafür
WO2008000680A1 (en) * 2006-06-27 2008-01-03 Clariant International Ltd Fluorous telomeric compounds and polymers containing same
JP2011147890A (ja) * 2010-01-22 2011-08-04 Seiko Epson Corp 薄膜形成方法及び機能性材料の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169904A (en) * 1978-01-05 1979-10-02 International Business Machines Corporation Preparation of polymer monomolecular films
US4276350A (en) * 1979-08-13 1981-06-30 Ppg Industries, Inc. Fluorocarbon treatment for reducing the reactivity of a glass surface and product
US4311764A (en) * 1980-10-01 1982-01-19 Ppg Industries, Inc. Polyurethane surface treatment and resulting monomolecular layered article

Also Published As

Publication number Publication date
FR2584083A1 (fr) 1987-01-02
IT8620742A1 (it) 1987-12-10
IT8620742A0 (it) 1986-06-10
DE3621474C1 (de) 1987-02-19
IT1190344B (it) 1988-02-16
GB8614735D0 (en) 1986-07-23
JPH0242392B2 (enExample) 1990-09-21
GB2178339A (en) 1987-02-11
US4696838A (en) 1987-09-29
JPS62572A (ja) 1987-01-06
GB2178339B (en) 1988-09-21

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Legal Events

Date Code Title Description
ST Notification of lapse