DE3507072C2 - Elektrode für die elektrolytische Erzeugung von Sauerstoff und Verfahren zu ihrer Herstellung - Google Patents
Elektrode für die elektrolytische Erzeugung von Sauerstoff und Verfahren zu ihrer HerstellungInfo
- Publication number
- DE3507072C2 DE3507072C2 DE3507072A DE3507072A DE3507072C2 DE 3507072 C2 DE3507072 C2 DE 3507072C2 DE 3507072 A DE3507072 A DE 3507072A DE 3507072 A DE3507072 A DE 3507072A DE 3507072 C2 DE3507072 C2 DE 3507072C2
- Authority
- DE
- Germany
- Prior art keywords
- electrode
- oxide
- metal
- coating
- titanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims abstract description 25
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 239000001301 oxygen Substances 0.000 title claims abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 title claims abstract description 19
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 53
- 229910052751 metal Inorganic materials 0.000 claims abstract description 48
- 239000002184 metal Substances 0.000 claims abstract description 48
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 239000010936 titanium Substances 0.000 claims abstract description 37
- 239000011248 coating agent Substances 0.000 claims abstract description 34
- 238000000576 coating method Methods 0.000 claims abstract description 34
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 24
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 23
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000013543 active substance Substances 0.000 claims abstract description 16
- 229910052718 tin Inorganic materials 0.000 claims abstract description 14
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 12
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 12
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 12
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 12
- 229910052716 thallium Inorganic materials 0.000 claims abstract description 12
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 10
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 9
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 8
- 239000010941 cobalt Substances 0.000 claims abstract description 8
- 239000000203 mixture Substances 0.000 claims description 27
- 150000002739 metals Chemical class 0.000 claims description 11
- 239000010955 niobium Substances 0.000 claims description 10
- 229910052742 iron Inorganic materials 0.000 claims description 9
- 229910052758 niobium Inorganic materials 0.000 claims description 9
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 9
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 9
- 150000003839 salts Chemical class 0.000 claims description 8
- 229910052715 tantalum Inorganic materials 0.000 claims description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 7
- 239000000956 alloy Substances 0.000 claims description 7
- 239000004411 aluminium Substances 0.000 claims description 6
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 6
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000005868 electrolysis reaction Methods 0.000 abstract description 22
- 239000010410 layer Substances 0.000 description 35
- 239000000126 substance Substances 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 9
- 229910044991 metal oxide Inorganic materials 0.000 description 9
- 229910006404 SnO 2 Inorganic materials 0.000 description 8
- 229910010413 TiO 2 Inorganic materials 0.000 description 8
- 150000004706 metal oxides Chemical class 0.000 description 8
- 238000002161 passivation Methods 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 230000007797 corrosion Effects 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000011229 interlayer Substances 0.000 description 5
- -1 platinum group metals Chemical class 0.000 description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000003792 electrolyte Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical compound [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910010977 Ti—Pd Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- OKDDRJHDLHFWGT-UHFFFAOYSA-N [Ir+]=O.[O-2].[Ti+4].[Ru+]=O.[O-2].[O-2] Chemical compound [Ir+]=O.[O-2].[Ti+4].[Ru+]=O.[O-2].[O-2] OKDDRJHDLHFWGT-UHFFFAOYSA-N 0.000 description 1
- ZSBZBFTZJNOILL-UHFFFAOYSA-N [Ir]=O.[Ru]=O Chemical compound [Ir]=O.[Ru]=O ZSBZBFTZJNOILL-UHFFFAOYSA-N 0.000 description 1
- PUFIZHPPRJVXJC-UHFFFAOYSA-N [O-2].[Ta+5].[Ir+]=O.[O-2].[O-2] Chemical compound [O-2].[Ta+5].[Ir+]=O.[O-2].[O-2] PUFIZHPPRJVXJC-UHFFFAOYSA-N 0.000 description 1
- IPSHZHIQLLXVGT-UHFFFAOYSA-N [O-2].[Ta+5].[Ru+]=O.[Ir+]=O Chemical compound [O-2].[Ta+5].[Ru+]=O.[Ir+]=O IPSHZHIQLLXVGT-UHFFFAOYSA-N 0.000 description 1
- PFYPSSPANKKGGA-UHFFFAOYSA-N [O-2].[Ti+4].[Ir+]=O Chemical compound [O-2].[Ti+4].[Ir+]=O PFYPSSPANKKGGA-UHFFFAOYSA-N 0.000 description 1
- XBSYFVAKXHOPQK-UHFFFAOYSA-N [O-2].[Ti+4].[Ru+]=O Chemical compound [O-2].[Ti+4].[Ru+]=O XBSYFVAKXHOPQK-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 238000006056 electrooxidation reaction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 239000013535 sea water Substances 0.000 description 1
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- DANYXEHCMQHDNX-UHFFFAOYSA-K trichloroiridium Chemical compound Cl[Ir](Cl)Cl DANYXEHCMQHDNX-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/02—Electrodes; Connections thereof
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
- C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
- C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
- C25B11/061—Metal or alloy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M4/00—Electrodes
- H01M4/02—Electrodes composed of, or comprising, active material
- H01M4/64—Carriers or collectors
- H01M4/66—Selection of materials
- H01M4/661—Metal or alloys, e.g. alloy coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59038734A JPS60184691A (ja) | 1984-03-02 | 1984-03-02 | 耐久性を有する電極及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3507072A1 DE3507072A1 (de) | 1985-09-12 |
| DE3507072C2 true DE3507072C2 (de) | 1987-03-12 |
Family
ID=12533551
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE3507072A Expired DE3507072C2 (de) | 1984-03-02 | 1985-02-28 | Elektrode für die elektrolytische Erzeugung von Sauerstoff und Verfahren zu ihrer Herstellung |
Country Status (13)
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0243302B1 (en) * | 1986-04-17 | 1992-01-22 | Eltech Systems Corporation | An electrode with a platinum metal catalyst in surface film and its use |
| JPS62274087A (ja) * | 1986-05-22 | 1987-11-28 | Permelec Electrode Ltd | 耐久性を有する電解用電極及びその製造方法 |
| JPS62284095A (ja) * | 1986-06-02 | 1987-12-09 | Permelec Electrode Ltd | 耐久性を有する電解用電極及びその製造方法 |
| US5156726A (en) * | 1987-03-24 | 1992-10-20 | Tdk Corporation | Oxygen-generating electrode and method for the preparation thereof |
| DE3930671A1 (de) * | 1989-09-14 | 1991-03-28 | Basf Ag | Metall-metalloxidelektrode zur bestimmung von chlor |
| JP2885913B2 (ja) * | 1990-09-04 | 1999-04-26 | ペルメレック電極株式会社 | クロムめっき用陽極およびその製造方法 |
| KR100196094B1 (ko) | 1992-03-11 | 1999-06-15 | 사토 히로시 | 산소발생전극 |
| KR20030095012A (ko) * | 2002-06-11 | 2003-12-18 | 이수테크 주식회사 | 전해조 전극 및 그를 제조하기 위한 제조방법 |
| DE102004001863A1 (de) * | 2004-01-13 | 2005-08-11 | Siemens Ag | Verfahren und Vorrichtung zur Bearbeitung eines Sprachsignals |
| US20090022997A1 (en) * | 2004-01-23 | 2009-01-22 | Russo David A | Transparent Conductive Oxide Films Having Enhanced Electron Concentration/Mobility, and Method of Making Same |
| KR100930790B1 (ko) * | 2009-02-18 | 2009-12-09 | 황부성 | 수소산소 발생용 전극판 및 그를 제조하기 위한 제조방법 |
| US8282812B2 (en) | 2009-02-24 | 2012-10-09 | John Christopher Burtch | Apparatus for producing hydrogen from salt water by electrolysis |
| KR101257921B1 (ko) * | 2011-06-29 | 2013-04-24 | 고희찬 | 전해조용 수소 발생용 전극 및 이의 제조방법 |
| WO2013122693A1 (en) * | 2012-02-14 | 2013-08-22 | Wisconsin Alumni Research Foundation | Electrocatalysts having mixed metal oxides |
| ES2944935T3 (es) | 2012-02-23 | 2023-06-27 | Treadstone Tech Inc | Superficie de metal resistente a la corrosión y eléctricamente conductora |
| JP7094110B2 (ja) * | 2015-06-23 | 2022-07-01 | インドゥストリエ・デ・ノラ・ソチエタ・ペル・アツィオーニ | 電解過程のための電極 |
| CN107604388B (zh) * | 2017-09-11 | 2023-08-08 | 昆明理工恒达科技股份有限公司 | 复合阳极材料及其制备方法、阳极板及其制备方法 |
| IT201900009753A1 (it) * | 2019-06-21 | 2020-12-21 | Fondazione St Italiano Tecnologia | STABLE HYDROGEN EVOLUTION ELECTROCATALYST BASED ON 3D METAL NANOSTRUCTURES ON A Ti SUBSTRATE |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1327760A (en) * | 1969-12-22 | 1973-08-22 | Imp Metal Ind Kynoch Ltd | Electrodes |
| US3775284A (en) * | 1970-03-23 | 1973-11-27 | J Bennett | Non-passivating barrier layer electrodes |
| US3711385A (en) * | 1970-09-25 | 1973-01-16 | Chemnor Corp | Electrode having platinum metal oxide coating thereon,and method of use thereof |
| US3882002A (en) * | 1974-08-02 | 1975-05-06 | Hooker Chemicals Plastics Corp | Anode for electrolytic processes |
| JPS5178787A (en) * | 1974-12-28 | 1976-07-08 | Tdk Electronics Co Ltd | Denkaiyodenkyoku |
| JPS5268076A (en) * | 1975-12-03 | 1977-06-06 | Tdk Corp | Electrode for electrolysis |
| JPS5826383B2 (ja) * | 1978-08-25 | 1983-06-02 | 大阪瓦斯株式会社 | コ−クス炉廃ガスの脱硝方法 |
| JPS5544514A (en) * | 1978-09-22 | 1980-03-28 | Permelec Electrode Ltd | Electrode for electrolysis and production thereof |
| US4267025A (en) * | 1979-11-26 | 1981-05-12 | Diamond Shamrock Technologies, S.A. | Electrodes for electrolytic processes, especially perchlorate production |
| US4331528A (en) * | 1980-10-06 | 1982-05-25 | Diamond Shamrock Corporation | Coated metal electrode with improved barrier layer |
| JPS6017834B2 (ja) * | 1981-03-11 | 1985-05-07 | 昭和電工株式会社 | 不溶性電極をそなえた電気化学的装置 |
| JPS6022074B2 (ja) * | 1982-08-26 | 1985-05-30 | ペルメレツク電極株式会社 | 耐久性を有する電解用電極及びその製造方法 |
| JPS6022075B2 (ja) * | 1983-01-31 | 1985-05-30 | ペルメレック電極株式会社 | 耐久性を有する電解用電極及びその製造方法 |
-
1984
- 1984-03-02 JP JP59038734A patent/JPS60184691A/ja active Granted
-
1985
- 1985-02-25 CA CA000475043A patent/CA1259053A/en not_active Expired
- 1985-02-27 GB GB08504994A patent/GB2155954B/en not_active Expired
- 1985-02-28 IT IT47747/85A patent/IT1181758B/it active
- 1985-02-28 NL NLAANVRAGE8500559,A patent/NL187695C/xx not_active IP Right Cessation
- 1985-02-28 DE DE3507072A patent/DE3507072C2/de not_active Expired
- 1985-03-01 AU AU39410/85A patent/AU566539B2/en not_active Ceased
- 1985-03-01 FR FR8503066A patent/FR2560611B1/fr not_active Expired
- 1985-03-01 SE SE8501026A patent/SE457004B/sv not_active IP Right Cessation
- 1985-03-02 KR KR1019850001329A patent/KR890003164B1/ko not_active IP Right Cessation
- 1985-03-04 US US06/708,000 patent/US4581117A/en not_active Expired - Lifetime
-
1987
- 1987-09-02 MY MYPI87001518A patent/MY101997A/en unknown
-
1988
- 1988-04-13 SG SG255/88A patent/SG25588G/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| SE457004B (sv) | 1988-11-21 |
| MY101997A (en) | 1992-02-29 |
| CA1259053A (en) | 1989-09-05 |
| SE8501026L (sv) | 1985-10-14 |
| GB8504994D0 (en) | 1985-03-27 |
| DE3507072A1 (de) | 1985-09-12 |
| IT8547747A0 (it) | 1985-02-28 |
| NL187695B (nl) | 1991-07-16 |
| AU566539B2 (en) | 1987-10-22 |
| SG25588G (en) | 1988-07-15 |
| FR2560611A1 (fr) | 1985-09-06 |
| GB2155954B (en) | 1987-09-16 |
| JPS6320313B2 (US08118993-20120221-C00002.png) | 1988-04-27 |
| NL8500559A (nl) | 1985-10-01 |
| SE8501026D0 (sv) | 1985-03-01 |
| JPS60184691A (ja) | 1985-09-20 |
| AU3941085A (en) | 1985-09-05 |
| IT1181758B (it) | 1987-09-30 |
| US4581117A (en) | 1986-04-08 |
| NL187695C (nl) | 1991-12-16 |
| KR850006552A (ko) | 1985-10-14 |
| GB2155954A (en) | 1985-10-02 |
| IT8547747A1 (it) | 1986-08-28 |
| KR890003164B1 (ko) | 1989-08-25 |
| FR2560611B1 (fr) | 1987-07-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |