DE3483856D1 - Halbleiterlaser. - Google Patents
Halbleiterlaser.Info
- Publication number
- DE3483856D1 DE3483856D1 DE8484305129T DE3483856T DE3483856D1 DE 3483856 D1 DE3483856 D1 DE 3483856D1 DE 8484305129 T DE8484305129 T DE 8484305129T DE 3483856 T DE3483856 T DE 3483856T DE 3483856 D1 DE3483856 D1 DE 3483856D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor laser
- laser
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/20—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L29/201—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys
- H01L29/205—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only AIIIBV compounds including two or more compounds, e.g. alloys in different semiconductor regions, e.g. heterojunctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3201—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures incorporating bulkstrain effects, e.g. strain compensation, strain related to polarisation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58140756A JPS6031288A (ja) | 1983-07-29 | 1983-07-29 | 半導体レ−ザ素子 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3483856D1 true DE3483856D1 (de) | 1991-02-07 |
Family
ID=15276003
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8484305129T Expired - Lifetime DE3483856D1 (de) | 1983-07-29 | 1984-07-27 | Halbleiterlaser. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4637029A (de) |
EP (1) | EP0133036B1 (de) |
JP (1) | JPS6031288A (de) |
DE (1) | DE3483856D1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60192380A (ja) * | 1984-03-13 | 1985-09-30 | Mitsubishi Electric Corp | 半導体レ−ザ装置 |
JPH0770971B2 (ja) * | 1986-03-13 | 1995-07-31 | ソニー株式会社 | テレビ及びラジオ受信装置 |
JPH0398539U (de) * | 1990-01-29 | 1991-10-14 | ||
US5412679A (en) * | 1994-02-14 | 1995-05-02 | Eastman Kodak Company | Optical waveguide epitaxially grown on semiconductors for upconversion |
US6551857B2 (en) * | 1997-04-04 | 2003-04-22 | Elm Technology Corporation | Three dimensional structure integrated circuits |
US8933715B2 (en) | 2012-04-08 | 2015-01-13 | Elm Technology Corporation | Configurable vertical integration |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5637687A (en) * | 1979-09-04 | 1981-04-11 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
JPS58206184A (ja) * | 1982-05-25 | 1983-12-01 | Sharp Corp | 半導体レ−ザ素子及びその製造方法 |
JPS5917292A (ja) * | 1982-07-20 | 1984-01-28 | Sharp Corp | 半導体レ−ザ素子 |
-
1983
- 1983-07-29 JP JP58140756A patent/JPS6031288A/ja active Pending
-
1984
- 1984-07-24 US US06/633,990 patent/US4637029A/en not_active Expired - Lifetime
- 1984-07-27 EP EP84305129A patent/EP0133036B1/de not_active Expired - Lifetime
- 1984-07-27 DE DE8484305129T patent/DE3483856D1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6031288A (ja) | 1985-02-18 |
US4637029A (en) | 1987-01-13 |
EP0133036A2 (de) | 1985-02-13 |
EP0133036B1 (de) | 1990-12-27 |
EP0133036A3 (en) | 1986-03-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3482935D1 (de) | Halbleiterlaservorrichtung. | |
DE3584702D1 (de) | Halbleiterlaservorrichtung. | |
DE3584330D1 (de) | Halbleiterlaservorrichtung. | |
DE3751548T2 (de) | Halbleiterlaser. | |
DE3483769D1 (de) | Halbleiterdiode. | |
DE3587748T2 (de) | Halbleiterlaseranordnung. | |
DE3483450D1 (de) | Halbleiterlaser. | |
DE3873689T2 (de) | Halbleiterlaser. | |
DE3575501D1 (de) | Halbleiterlaser. | |
DE3579991D1 (de) | Halbleiterlaser. | |
DE3586934D1 (de) | Halbleiterlaser. | |
DE3778510D1 (de) | Halbleiterlaser. | |
DE3581557D1 (de) | Halbleiterlaser. | |
DE3579826D1 (de) | Halbleiterlaser. | |
DE3484817D1 (de) | Halbleiteranordnung. | |
NL190943C (nl) | Halfgeleiderlaser. | |
DE3575243D1 (de) | Halbleiterlaser. | |
DE3485537D1 (de) | Halbleiter-laservorrichtung. | |
DE3485698D1 (de) | Halbleiterlaser. | |
DE3587702T2 (de) | Halbleiterlaser. | |
DE3482297D1 (de) | Halbleiterlaser. | |
DE3581025D1 (de) | Halbleiterlaser-vielfachanordnung. | |
DE3583202D1 (de) | Halbleiterlaser. | |
DE3483856D1 (de) | Halbleiterlaser. | |
DE3480758D1 (de) | Halbleiterlaser. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8328 | Change in the person/name/address of the agent |
Free format text: PATENTANWAELTE MUELLER & HOFFMANN, 81667 MUENCHEN |