DE3441621C2 - - Google Patents

Info

Publication number
DE3441621C2
DE3441621C2 DE3441621A DE3441621A DE3441621C2 DE 3441621 C2 DE3441621 C2 DE 3441621C2 DE 3441621 A DE3441621 A DE 3441621A DE 3441621 A DE3441621 A DE 3441621A DE 3441621 C2 DE3441621 C2 DE 3441621C2
Authority
DE
Germany
Prior art keywords
measuring
signal
devices
adjustment
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3441621A
Other languages
German (de)
English (en)
Other versions
DE3441621A1 (de
Inventor
Mitsugu Yokohama Kanagawa Jp Yamamura
Minoru Kawasaki Kanagawa Jp Yomoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP58212490A external-priority patent/JPS60105231A/ja
Priority claimed from JP58215979A external-priority patent/JPS60108913A/ja
Priority claimed from JP58215981A external-priority patent/JPS60109226A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3441621A1 publication Critical patent/DE3441621A1/de
Application granted granted Critical
Publication of DE3441621C2 publication Critical patent/DE3441621C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19843441621 1983-11-14 1984-11-14 Ausfluchtvorrichtung Granted DE3441621A1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP58212490A JPS60105231A (ja) 1983-11-14 1983-11-14 自動焦点合わせ装置
JP58215979A JPS60108913A (ja) 1983-11-18 1983-11-18 電歪素子制御装置
JP58215981A JPS60109226A (ja) 1983-11-18 1983-11-18 平面位置合わせ装置

Publications (2)

Publication Number Publication Date
DE3441621A1 DE3441621A1 (de) 1985-05-23
DE3441621C2 true DE3441621C2 (enExample) 1990-10-18

Family

ID=27329371

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843441621 Granted DE3441621A1 (de) 1983-11-14 1984-11-14 Ausfluchtvorrichtung

Country Status (3)

Country Link
US (1) US4600282A (enExample)
DE (1) DE3441621A1 (enExample)
GB (1) GB2151045B (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4937618A (en) * 1984-10-18 1990-06-26 Canon Kabushiki Kaisha Alignment and exposure apparatus and method for manufacture of integrated circuits
JPS61183928A (ja) * 1985-02-12 1986-08-16 Nippon Kogaku Kk <Nikon> 投影光学装置
US4714331A (en) * 1985-03-25 1987-12-22 Canon Kabushiki Kaisha Method and apparatus for automatic focusing
US5114223A (en) * 1985-07-15 1992-05-19 Canon Kabushiki Kaisha Exposure method and apparatus
US4863252A (en) * 1988-02-11 1989-09-05 Tracor Northern, Inc. Objective lens positioning system for confocal tandem scanning reflected light microscope
JPH0652707B2 (ja) * 1988-10-11 1994-07-06 キヤノン株式会社 面位置検出方法
US6469779B2 (en) 1997-02-07 2002-10-22 Arcturus Engineering, Inc. Laser capture microdissection method and apparatus
US6495195B2 (en) * 1997-02-14 2002-12-17 Arcturus Engineering, Inc. Broadband absorbing film for laser capture microdissection
US5985085A (en) * 1997-10-01 1999-11-16 Arcturus Engineering, Inc. Method of manufacturing consumable for laser capture microdissection
US7075640B2 (en) 1997-10-01 2006-07-11 Arcturus Bioscience, Inc. Consumable for laser capture microdissection
US7473401B1 (en) 1997-12-04 2009-01-06 Mds Analytical Technologies (Us) Inc. Fluidic extraction of microdissected samples
AU4812600A (en) 1999-04-29 2000-11-17 Arcturus Engineering, Inc. Processing technology for lcm samples
WO2001033190A2 (en) * 1999-11-04 2001-05-10 Arcturus Engineering, Inc. Automated laser capture microdissection
US8722357B2 (en) * 2001-11-05 2014-05-13 Life Technologies Corporation Automated microdissection instrument
US10156501B2 (en) 2001-11-05 2018-12-18 Life Technologies Corporation Automated microdissection instrument for determining a location of a laser beam projection on a worksurface area
JP3794629B2 (ja) * 2002-03-08 2006-07-05 株式会社モリテックス 導波路型光部材とファイバアレイの調芯機構
GB2413009A (en) * 2004-03-25 2005-10-12 Yip * Liu Wai Microfabrication apparatus
JP4391883B2 (ja) * 2004-05-19 2009-12-24 住友重機械工業株式会社 移動体位置制御装置及びこの制御装置を用いたステージ装置
CA2580025A1 (en) 2004-09-09 2006-03-23 Molecular Devices Corporation Laser microdissection apparatus and method
DE102005062081A1 (de) * 2005-12-22 2007-07-05 Carl Zeiss Smt Ag Projektionsobjektiv mit dezentraler Steuerung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision
GB2063524B (en) * 1978-10-20 1982-12-22 Hitachi Ltd Method of positioning a wafer in a projection aligner
NL7901721A (nl) * 1979-03-05 1980-09-09 Philips Nv Regelsysteem.
GB2037455B (en) * 1979-09-27 1983-03-23 Singer Co Pathlength controller for a ring lasr gyroscope
US4344160A (en) * 1980-05-02 1982-08-10 The Perkin-Elmer Corporation Automatic wafer focusing and flattening system
JPS57192929A (en) * 1981-05-25 1982-11-27 Hitachi Ltd Projector provided with automatic focusing function
JPS5885338U (ja) * 1981-12-07 1983-06-09 株式会社日立製作所 自動焦点装置
US4615621A (en) * 1982-04-02 1986-10-07 Eaton Corporation Auto-focus alignment and measurement system and method

Also Published As

Publication number Publication date
GB8428609D0 (en) 1984-12-19
DE3441621A1 (de) 1985-05-23
GB2151045A (en) 1985-07-10
US4600282A (en) 1986-07-15
GB2151045B (en) 1987-01-21

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8125 Change of the main classification

Ipc: G03F 7/207

D2 Grant after examination
8364 No opposition during term of opposition