DE3172964D1 - Process of forming graded aperture masks - Google Patents
Process of forming graded aperture masksInfo
- Publication number
- DE3172964D1 DE3172964D1 DE8181103942T DE3172964T DE3172964D1 DE 3172964 D1 DE3172964 D1 DE 3172964D1 DE 8181103942 T DE8181103942 T DE 8181103942T DE 3172964 T DE3172964 T DE 3172964T DE 3172964 D1 DE3172964 D1 DE 3172964D1
- Authority
- DE
- Germany
- Prior art keywords
- aperture
- opening
- etchant resist
- over
- openings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 238000004513 sizing Methods 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/161,062 US4303466A (en) | 1980-06-19 | 1980-06-19 | Process of forming graded aperture masks |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3172964D1 true DE3172964D1 (en) | 1986-01-02 |
Family
ID=22579654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8181103942T Expired DE3172964D1 (en) | 1980-06-19 | 1981-05-22 | Process of forming graded aperture masks |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4303466A (cg-RX-API-DMAC7.html) |
| EP (1) | EP0042496B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JPS5730236A (cg-RX-API-DMAC7.html) |
| AT (1) | ATE16658T1 (cg-RX-API-DMAC7.html) |
| CA (1) | CA1136025A (cg-RX-API-DMAC7.html) |
| DE (1) | DE3172964D1 (cg-RX-API-DMAC7.html) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56139676A (en) * | 1980-04-02 | 1981-10-31 | Toshiba Corp | Method and apparatus for etching metal sheet |
| US4596629A (en) * | 1980-05-12 | 1986-06-24 | Bmc Industries, Inc. | Television picture tubes |
| US4353948A (en) * | 1980-05-12 | 1982-10-12 | Buckbee-Mears Company | Hole technology |
| JPS6070185A (ja) * | 1983-09-26 | 1985-04-20 | Toshiba Corp | シヤドウマスクの製造方法 |
| SU1461377A3 (ru) * | 1984-05-25 | 1989-02-23 | Рка Корпорейшн (Фирма) | Цветной кинескоп |
| US4743795A (en) * | 1984-07-13 | 1988-05-10 | Bmc Industries, Inc. | Multi-graded aperture masks |
| US4632726A (en) * | 1984-07-13 | 1986-12-30 | Bmc Industries, Inc. | Multi-graded aperture mask method |
| US4859549A (en) * | 1987-03-12 | 1989-08-22 | Sony Corporation | Method of forming a fluorescent screen for a color CRT |
| EP0476664B1 (en) * | 1990-09-20 | 1995-07-05 | Dainippon Screen Mfg. Co., Ltd. | Method of forming small through-holes in thin metal plate |
| JP3282347B2 (ja) * | 1993-09-07 | 2002-05-13 | ソニー株式会社 | エッチング法、色選別機構及びその作製方法、並びに、陰極線管 |
| US5484074A (en) * | 1994-05-03 | 1996-01-16 | Bmc Industries, Inc. | Method for manufacturing a shadow mask |
| JP3327246B2 (ja) * | 1999-03-25 | 2002-09-24 | 富士ゼロックス株式会社 | インクジェット記録ヘッド及びその製造方法 |
| DK2516421T3 (en) | 2009-12-23 | 2016-11-28 | Bayer Ip Gmbh | New process for the preparation of 4-aminobut-2-enoliden starting from 4-alkoxyfuran-2 (5H) -one or 4-arylalkoxyfuran-2- (5H) -one |
| CN112103403B (zh) * | 2016-02-16 | 2023-09-05 | Lg伊诺特有限公司 | 金属板、沉积用掩模及其制造方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3517921A (en) * | 1968-05-21 | 1970-06-30 | Pitney Bowes Inc | Combined copy paper pre-feed and timing mechanism for copying machines |
| US3652895A (en) * | 1969-05-23 | 1972-03-28 | Tokyo Shibaura Electric Co | Shadow-mask having graduated rectangular apertures |
| US3679500A (en) * | 1970-08-07 | 1972-07-25 | Dainippon Screen Mfg | Method for forming perforations in metal sheets by etching |
| US3663997A (en) * | 1970-09-30 | 1972-05-23 | Rca Corp | Method for making a kinescope comprising production and treatment of a temporary mask |
| JPS4828950A (cg-RX-API-DMAC7.html) * | 1971-08-21 | 1973-04-17 | ||
| JPS4838054A (cg-RX-API-DMAC7.html) * | 1971-09-16 | 1973-06-05 | ||
| US3788912A (en) * | 1971-11-10 | 1974-01-29 | Buckbee Mears Co | System suitable for controlling etching without the aid of an etchant resistant |
| US3909656A (en) * | 1974-05-02 | 1975-09-30 | Zenith Radio Corp | Layered, one-sided etched color selection electrode |
| JPS511511A (en) * | 1974-06-26 | 1976-01-08 | Matsushita Electric Industrial Co Ltd | Denkikogakukokao jusuru jiki |
| US3971682A (en) * | 1974-07-11 | 1976-07-27 | Buckbee-Mears Company | Etching process for accurately making small holes in thick materials |
| US3929532A (en) * | 1974-07-17 | 1975-12-30 | Rca Corp | Method for etching apertured work piece |
| US4126510A (en) * | 1977-10-06 | 1978-11-21 | Rca Corporation | Etching a succession of articles from a strip of sheet metal |
-
1980
- 1980-06-19 US US06/161,062 patent/US4303466A/en not_active Expired - Lifetime
-
1981
- 1981-05-05 CA CA000376899A patent/CA1136025A/en not_active Expired
- 1981-05-22 AT AT81103942T patent/ATE16658T1/de not_active IP Right Cessation
- 1981-05-22 EP EP81103942A patent/EP0042496B1/en not_active Expired
- 1981-05-22 DE DE8181103942T patent/DE3172964D1/de not_active Expired
- 1981-06-19 JP JP9517881A patent/JPS5730236A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| ATE16658T1 (de) | 1985-12-15 |
| EP0042496B1 (en) | 1985-11-21 |
| JPS6246940B2 (cg-RX-API-DMAC7.html) | 1987-10-05 |
| EP0042496A1 (en) | 1981-12-30 |
| US4303466A (en) | 1981-12-01 |
| JPS5730236A (en) | 1982-02-18 |
| CA1136025A (en) | 1982-11-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5730236A (en) | Method of forming plural holes at aperture mask | |
| JPS57200042A (en) | Exposure method for chemically machinable photosensitive glass | |
| JPS5255382A (en) | Method of forming resist pattern and method of making ion absorption mask used therefor | |
| JPS5646534A (en) | Manufacture of semiconductor device | |
| JPS5339075A (en) | Step and repeat exposure method of masks | |
| JPS57132008A (en) | Measuring method for pattern size | |
| JPS55128832A (en) | Method of making minute pattern | |
| JPS5722240A (en) | Photomask for proximity exposure | |
| JPS5676531A (en) | Manufacture of semiconductor device | |
| JPS5623746A (en) | Manufacture of semiconductor device | |
| JPS56100450A (en) | Manufacture of projected electrode of semiconductor device | |
| JPS5652754A (en) | Manufacture of mask for manufacturing semiconductor device | |
| JPS5756934A (en) | Manufacture of semiconductor element | |
| JPS5610930A (en) | Manufacture of semiconductor device | |
| JPS51142268A (en) | Method of making rectangular hole by etching | |
| JPS5459879A (en) | Selective etching method | |
| JPS57106034A (en) | Patterning method | |
| JPS5464550A (en) | Manufacture of master plate for synthetic resin lace | |
| JPS5769581A (en) | Magnetic bubble transfer circuit | |
| JPS57157250A (en) | Production for rugged substrate | |
| JPS5699342A (en) | Manufacture of photomask | |
| JPS52142680A (en) | Evaporation apparatus | |
| JPS52119079A (en) | Electron beam exposure | |
| JPS56137634A (en) | Pattern forming | |
| JPS6455826A (en) | Manufacture of semiconductor device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8380 | Miscellaneous part iii |
Free format text: DER PATENTINHABER LAUTET RICHTIG: BMC INDUSTRIES, INC., ST. PAUL, MINN. US |
|
| 8364 | No opposition during term of opposition |