ATE16658T1 - Verfahren zur herstellung abgestufter lochmasken. - Google Patents

Verfahren zur herstellung abgestufter lochmasken.

Info

Publication number
ATE16658T1
ATE16658T1 AT81103942T AT81103942T ATE16658T1 AT E16658 T1 ATE16658 T1 AT E16658T1 AT 81103942 T AT81103942 T AT 81103942T AT 81103942 T AT81103942 T AT 81103942T AT E16658 T1 ATE16658 T1 AT E16658T1
Authority
AT
Austria
Prior art keywords
aperture
opening
etchant resist
over
openings
Prior art date
Application number
AT81103942T
Other languages
English (en)
Inventor
Roland Thoms
Original Assignee
Buckbee Mears Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Buckbee Mears Co filed Critical Buckbee Mears Co
Application granted granted Critical
Publication of ATE16658T1 publication Critical patent/ATE16658T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrodes For Cathode-Ray Tubes (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
AT81103942T 1980-06-19 1981-05-22 Verfahren zur herstellung abgestufter lochmasken. ATE16658T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/161,062 US4303466A (en) 1980-06-19 1980-06-19 Process of forming graded aperture masks
EP81103942A EP0042496B1 (de) 1980-06-19 1981-05-22 Verfahren zur Herstellung abgestufter Lochmasken

Publications (1)

Publication Number Publication Date
ATE16658T1 true ATE16658T1 (de) 1985-12-15

Family

ID=22579654

Family Applications (1)

Application Number Title Priority Date Filing Date
AT81103942T ATE16658T1 (de) 1980-06-19 1981-05-22 Verfahren zur herstellung abgestufter lochmasken.

Country Status (6)

Country Link
US (1) US4303466A (de)
EP (1) EP0042496B1 (de)
JP (1) JPS5730236A (de)
AT (1) ATE16658T1 (de)
CA (1) CA1136025A (de)
DE (1) DE3172964D1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56139676A (en) * 1980-04-02 1981-10-31 Toshiba Corp Method and apparatus for etching metal sheet
US4596629A (en) * 1980-05-12 1986-06-24 Bmc Industries, Inc. Television picture tubes
US4353948A (en) * 1980-05-12 1982-10-12 Buckbee-Mears Company Hole technology
JPS6070185A (ja) * 1983-09-26 1985-04-20 Toshiba Corp シヤドウマスクの製造方法
SU1461377A3 (ru) * 1984-05-25 1989-02-23 Рка Корпорейшн (Фирма) Цветной кинескоп
US4743795A (en) * 1984-07-13 1988-05-10 Bmc Industries, Inc. Multi-graded aperture masks
US4632726A (en) * 1984-07-13 1986-12-30 Bmc Industries, Inc. Multi-graded aperture mask method
US4859549A (en) * 1987-03-12 1989-08-22 Sony Corporation Method of forming a fluorescent screen for a color CRT
DE69111002T2 (de) * 1990-09-20 1995-11-02 Dainippon Screen Mfg Verfahren zur Herstellung von kleinen Durchgangslöchern in dünne Metallplatten.
JP3282347B2 (ja) * 1993-09-07 2002-05-13 ソニー株式会社 エッチング法、色選別機構及びその作製方法、並びに、陰極線管
US5484074A (en) * 1994-05-03 1996-01-16 Bmc Industries, Inc. Method for manufacturing a shadow mask
JP3327246B2 (ja) * 1999-03-25 2002-09-24 富士ゼロックス株式会社 インクジェット記録ヘッド及びその製造方法
KR101721222B1 (ko) 2009-12-23 2017-03-29 바이엘 인텔렉쳐 프로퍼티 게엠베하 4-알콕시푸란-2(5ｈ)-온 또는 4-아릴알콕시푸란-2(5ｈ)-온으로부터 4-아미노부트-2-에놀라이드의 신규 제조방법
CN108701776B (zh) * 2016-02-16 2020-09-22 Lg伊诺特有限公司 金属板、沉积用掩模及其制造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3517921A (en) * 1968-05-21 1970-06-30 Pitney Bowes Inc Combined copy paper pre-feed and timing mechanism for copying machines
US3652895A (en) * 1969-05-23 1972-03-28 Tokyo Shibaura Electric Co Shadow-mask having graduated rectangular apertures
US3679500A (en) * 1970-08-07 1972-07-25 Dainippon Screen Mfg Method for forming perforations in metal sheets by etching
US3663997A (en) * 1970-09-30 1972-05-23 Rca Corp Method for making a kinescope comprising production and treatment of a temporary mask
JPS4828950A (de) * 1971-08-21 1973-04-17
JPS4838054A (de) * 1971-09-16 1973-06-05
US3788912A (en) * 1971-11-10 1974-01-29 Buckbee Mears Co System suitable for controlling etching without the aid of an etchant resistant
US3909656A (en) * 1974-05-02 1975-09-30 Zenith Radio Corp Layered, one-sided etched color selection electrode
JPS511511A (en) * 1974-06-26 1976-01-08 Matsushita Electric Ind Co Ltd Denkikogakukokao jusuru jiki
US3971682A (en) * 1974-07-11 1976-07-27 Buckbee-Mears Company Etching process for accurately making small holes in thick materials
US3929532A (en) * 1974-07-17 1975-12-30 Rca Corp Method for etching apertured work piece
US4126510A (en) * 1977-10-06 1978-11-21 Rca Corporation Etching a succession of articles from a strip of sheet metal

Also Published As

Publication number Publication date
EP0042496B1 (de) 1985-11-21
DE3172964D1 (en) 1986-01-02
EP0042496A1 (de) 1981-12-30
CA1136025A (en) 1982-11-23
US4303466A (en) 1981-12-01
JPS6246940B2 (de) 1987-10-05
JPS5730236A (en) 1982-02-18

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties