JPS5730236A - Method of forming plural holes at aperture mask - Google Patents
Method of forming plural holes at aperture maskInfo
- Publication number
- JPS5730236A JPS5730236A JP9517881A JP9517881A JPS5730236A JP S5730236 A JPS5730236 A JP S5730236A JP 9517881 A JP9517881 A JP 9517881A JP 9517881 A JP9517881 A JP 9517881A JP S5730236 A JPS5730236 A JP S5730236A
- Authority
- JP
- Japan
- Prior art keywords
- aperture mask
- aperture
- opening
- etchant resist
- over
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000005530 etching Methods 0.000 abstract 2
- 238000004513 sizing Methods 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
- H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- ing And Chemical Polishing (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/161,062 US4303466A (en) | 1980-06-19 | 1980-06-19 | Process of forming graded aperture masks |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5730236A true JPS5730236A (en) | 1982-02-18 |
JPS6246940B2 JPS6246940B2 (ja) | 1987-10-05 |
Family
ID=22579654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9517881A Granted JPS5730236A (en) | 1980-06-19 | 1981-06-19 | Method of forming plural holes at aperture mask |
Country Status (6)
Country | Link |
---|---|
US (1) | US4303466A (ja) |
EP (1) | EP0042496B1 (ja) |
JP (1) | JPS5730236A (ja) |
AT (1) | ATE16658T1 (ja) |
CA (1) | CA1136025A (ja) |
DE (1) | DE3172964D1 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56139676A (en) * | 1980-04-02 | 1981-10-31 | Toshiba Corp | Method and apparatus for etching metal sheet |
US4353948A (en) * | 1980-05-12 | 1982-10-12 | Buckbee-Mears Company | Hole technology |
US4596629A (en) * | 1980-05-12 | 1986-06-24 | Bmc Industries, Inc. | Television picture tubes |
JPS6070185A (ja) * | 1983-09-26 | 1985-04-20 | Toshiba Corp | シヤドウマスクの製造方法 |
SU1461377A3 (ru) * | 1984-05-25 | 1989-02-23 | Рка Корпорейшн (Фирма) | Цветной кинескоп |
US4743795A (en) * | 1984-07-13 | 1988-05-10 | Bmc Industries, Inc. | Multi-graded aperture masks |
US4632726A (en) * | 1984-07-13 | 1986-12-30 | Bmc Industries, Inc. | Multi-graded aperture mask method |
US4859549A (en) * | 1987-03-12 | 1989-08-22 | Sony Corporation | Method of forming a fluorescent screen for a color CRT |
EP0476664B1 (en) * | 1990-09-20 | 1995-07-05 | Dainippon Screen Mfg. Co., Ltd. | Method of forming small through-holes in thin metal plate |
JP3282347B2 (ja) * | 1993-09-07 | 2002-05-13 | ソニー株式会社 | エッチング法、色選別機構及びその作製方法、並びに、陰極線管 |
US5484074A (en) * | 1994-05-03 | 1996-01-16 | Bmc Industries, Inc. | Method for manufacturing a shadow mask |
JP3327246B2 (ja) * | 1999-03-25 | 2002-09-24 | 富士ゼロックス株式会社 | インクジェット記録ヘッド及びその製造方法 |
ES2602028T3 (es) | 2009-12-23 | 2017-02-17 | Bayer Intellectual Property Gmbh | Nuevo procedimiento para la preparación de 4-aminobut-2-enólidos partiendo de 4-alcoxifuran-2(5H)-ona o 4-arilalcoxifuran-2-(5H)-ona |
CN112103403B (zh) * | 2016-02-16 | 2023-09-05 | Lg伊诺特有限公司 | 金属板、沉积用掩模及其制造方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4828950A (ja) * | 1971-08-21 | 1973-04-17 | ||
JPS4838054A (ja) * | 1971-09-16 | 1973-06-05 | ||
JPS511511A (en) * | 1974-06-26 | 1976-01-08 | Matsushita Electric Ind Co Ltd | Denkikogakukokao jusuru jiki |
JPS5460853A (en) * | 1977-10-06 | 1979-05-16 | Rca Corp | Method of etching continuous articles from band metal plate |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3517921A (en) * | 1968-05-21 | 1970-06-30 | Pitney Bowes Inc | Combined copy paper pre-feed and timing mechanism for copying machines |
US3652895A (en) * | 1969-05-23 | 1972-03-28 | Tokyo Shibaura Electric Co | Shadow-mask having graduated rectangular apertures |
US3679500A (en) * | 1970-08-07 | 1972-07-25 | Dainippon Screen Mfg | Method for forming perforations in metal sheets by etching |
US3725065A (en) * | 1970-09-30 | 1973-04-03 | Rca Corp | Method for making a kinescope comprising a color selection mask with temporary corridors |
US3788912A (en) * | 1971-11-10 | 1974-01-29 | Buckbee Mears Co | System suitable for controlling etching without the aid of an etchant resistant |
US3909656A (en) * | 1974-05-02 | 1975-09-30 | Zenith Radio Corp | Layered, one-sided etched color selection electrode |
US3971682A (en) * | 1974-07-11 | 1976-07-27 | Buckbee-Mears Company | Etching process for accurately making small holes in thick materials |
US3929532A (en) * | 1974-07-17 | 1975-12-30 | Rca Corp | Method for etching apertured work piece |
-
1980
- 1980-06-19 US US06/161,062 patent/US4303466A/en not_active Expired - Lifetime
-
1981
- 1981-05-05 CA CA000376899A patent/CA1136025A/en not_active Expired
- 1981-05-22 DE DE8181103942T patent/DE3172964D1/de not_active Expired
- 1981-05-22 EP EP81103942A patent/EP0042496B1/en not_active Expired
- 1981-05-22 AT AT81103942T patent/ATE16658T1/de not_active IP Right Cessation
- 1981-06-19 JP JP9517881A patent/JPS5730236A/ja active Granted
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4828950A (ja) * | 1971-08-21 | 1973-04-17 | ||
JPS4838054A (ja) * | 1971-09-16 | 1973-06-05 | ||
JPS511511A (en) * | 1974-06-26 | 1976-01-08 | Matsushita Electric Ind Co Ltd | Denkikogakukokao jusuru jiki |
JPS5460853A (en) * | 1977-10-06 | 1979-05-16 | Rca Corp | Method of etching continuous articles from band metal plate |
Also Published As
Publication number | Publication date |
---|---|
EP0042496A1 (en) | 1981-12-30 |
ATE16658T1 (de) | 1985-12-15 |
JPS6246940B2 (ja) | 1987-10-05 |
DE3172964D1 (en) | 1986-01-02 |
CA1136025A (en) | 1982-11-23 |
EP0042496B1 (en) | 1985-11-21 |
US4303466A (en) | 1981-12-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5730236A (en) | Method of forming plural holes at aperture mask | |
JPS57200042A (en) | Exposure method for chemically machinable photosensitive glass | |
EP0400791A3 (en) | Electronic device manufacture involving a pattern delineation step | |
ES465428A1 (es) | Procedimiento para el ataque quimico de precision de un ma- terial fotosensible. | |
GB1512825A (en) | Method for producing an apertured work piece | |
JPS57106128A (en) | Forming method for pattern | |
JPS56137632A (en) | Pattern forming | |
JPS5651582A (en) | Gas etching method | |
JPS57132008A (en) | Measuring method for pattern size | |
JPS5676531A (en) | Manufacture of semiconductor device | |
JPS55128832A (en) | Method of making minute pattern | |
JPS5722240A (en) | Photomask for proximity exposure | |
JPS56137630A (en) | Pattern forming | |
JPS5654039A (en) | Forming method for fine pattern | |
JPS56167329A (en) | Piling joint setting mark to be used in fine processing exposure technology | |
DE3264019D1 (en) | Process for forming a patterned mask using a positive electron beam resist | |
JPS5652754A (en) | Manufacture of mask for manufacturing semiconductor device | |
JPS5610930A (en) | Manufacture of semiconductor device | |
JPS53147465A (en) | Forming method of patterns for lift-off | |
JPS5315075A (en) | Forming method of etching mask in photoetching process | |
JPS5459879A (en) | Selective etching method | |
JPS52130288A (en) | Patterning method | |
JPS57153435A (en) | Manufacture of semiconductor device | |
JPS5756934A (en) | Manufacture of semiconductor element | |
JPS56111226A (en) | Formation of fine pattern |