ES465428A1 - Procedimiento para el ataque quimico de precision de un ma- terial fotosensible. - Google Patents

Procedimiento para el ataque quimico de precision de un ma- terial fotosensible.

Info

Publication number
ES465428A1
ES465428A1 ES465428A ES465428A ES465428A1 ES 465428 A1 ES465428 A1 ES 465428A1 ES 465428 A ES465428 A ES 465428A ES 465428 A ES465428 A ES 465428A ES 465428 A1 ES465428 A1 ES 465428A1
Authority
ES
Spain
Prior art keywords
double
precision parts
crystallizable
producing
etch technique
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES465428A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of ES465428A1 publication Critical patent/ES465428A1/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/07—Ink jet characterised by jet control
    • B41J2/075—Ink jet characterised by jet control for many-valued deflection
    • B41J2/08—Ink jet characterised by jet control for many-valued deflection charge-control type
    • B41J2/085—Charge means, e.g. electrodes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Surface Treatment Of Glass (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

Procedimiento para el ataque químico de precisión de un material fotosensiblecaracterizado porque las operaciones de exposición utilizan una fuente de radiación consistente en una lámpara de mercurio/xenónporque dicho material fotosensible consiste en un vidrio fotosensible y la operación de tratamiento térmico consiste en calentar el material de sustrato a una temperatura de unos 592ºCdurante 30 minutos.La operación a) se utiliza una primera máscara que define aberturas con un tamaño inferior al normal sobre dicho sustratoy porque la operación d) utiliza una segunda máscara que define las aberturas sobre el sustrato en las dimensiones finales deseadas. La segunda máscara defineademáspor lo menos una trayectoria para un conductor que ha de ser conectado a la capa conductora que se depositará más tarde dentro de dichas aberturas. Procedimiento para el ataque químico de precisión de un material fotosensible.
ES465428A 1976-12-27 1977-12-26 Procedimiento para el ataque quimico de precision de un ma- terial fotosensible. Expired ES465428A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/754,463 US4092166A (en) 1976-12-27 1976-12-27 Double exposure and double etch technique for producing precision parts from crystallizable photosensitive glass

Publications (1)

Publication Number Publication Date
ES465428A1 true ES465428A1 (es) 1978-09-16

Family

ID=25034904

Family Applications (1)

Application Number Title Priority Date Filing Date
ES465428A Expired ES465428A1 (es) 1976-12-27 1977-12-26 Procedimiento para el ataque quimico de precision de un ma- terial fotosensible.

Country Status (10)

Country Link
US (1) US4092166A (es)
JP (1) JPS606503B2 (es)
CA (1) CA1097974A (es)
CH (1) CH620662A5 (es)
DE (1) DE2752378A1 (es)
ES (1) ES465428A1 (es)
FR (1) FR2375628A1 (es)
GB (1) GB1589538A (es)
IT (1) IT1113820B (es)
NL (1) NL7712540A (es)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4417251A (en) * 1980-03-06 1983-11-22 Canon Kabushiki Kaisha Ink jet head
US4407934A (en) * 1981-12-04 1983-10-04 Burroughs Corporation Method of making an assembly of electrodes
DE3601632A1 (de) * 1986-01-21 1987-07-23 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen von extraktionsgittern fuer ionenquellen und durch das verfahren hergestellte extraktionsgitter
JPS62194305U (es) * 1986-05-30 1987-12-10
DE3814720A1 (de) * 1988-04-30 1989-11-09 Olympia Aeg Verfahren zur herstellung einer grundplatte mit durch aetzen hergestellte einarbeitungen fuer einen tintendruckkopf
DE4111783C1 (es) * 1991-04-11 1992-05-27 Ant Nachrichtentechnik Gmbh, 7150 Backnang, De
US5314522A (en) * 1991-11-19 1994-05-24 Seikosha Co., Ltd. Method of processing photosensitive glass with a pulsed laser to form grooves
JP2873412B2 (ja) * 1991-11-19 1999-03-24 セイコープレシジョン株式会社 感光性ガラスの加工方法
US5825382A (en) * 1992-07-31 1998-10-20 Francotyp-Postalia Ag & Co. Edge-shooter ink jet print head and method for its manufacture
DE4225799A1 (de) * 1992-07-31 1994-02-03 Francotyp Postalia Gmbh Tintenstrahldruckkopf und Verfahren zu seiner Herstellung
JP4274399B2 (ja) 1998-09-17 2009-06-03 アドヴィオン バイオシステムズ インコーポレイテッド 一体化モノリシックマイクロ加工したエレクトロスプレーと液体クロマトグラフィーのシステムおよび方法
US6633031B1 (en) 1999-03-02 2003-10-14 Advion Biosciences, Inc. Integrated monolithic microfabricated dispensing nozzle and liquid chromatography-electrospray system and method
ATE538490T1 (de) 1999-12-30 2012-01-15 Advion Biosystems Inc Mehrfach-elektrospray-einrichtung, systeme und verfahren
AU2001229633A1 (en) * 2000-01-18 2001-07-31 Advion Biosciences, Inc. Separation media, multiple electrospray nozzle system and method
US20050130075A1 (en) * 2003-12-12 2005-06-16 Mohammed Shaarawi Method for making fluid emitter orifice

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3473927A (en) * 1965-12-14 1969-10-21 Corning Glass Works Double negative exposure method for photosensitively opacifiable glass
US3519522A (en) * 1966-12-21 1970-07-07 Corning Glass Works Strengthening of photosensitive glass articles
US3843394A (en) * 1971-10-11 1974-10-22 Canon Kk Photosensitive member
JPS5236817B2 (es) * 1973-07-27 1977-09-19
JPS5421096B2 (es) * 1974-01-09 1979-07-27
JPS51135913A (en) * 1975-05-21 1976-11-25 Nippon Telegraph & Telephone Membrane for photoetching

Also Published As

Publication number Publication date
DE2752378A1 (de) 1978-06-29
GB1589538A (en) 1981-05-13
CH620662A5 (es) 1980-12-15
JPS606503B2 (ja) 1985-02-19
FR2375628B1 (es) 1980-08-22
DE2752378C2 (es) 1987-12-03
IT1113820B (it) 1986-01-27
JPS5382412A (en) 1978-07-20
US4092166A (en) 1978-05-30
NL7712540A (nl) 1978-06-29
FR2375628A1 (fr) 1978-07-21
CA1097974A (en) 1981-03-24

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Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 19991221