FR2375628A1 - Procede de fabrication de pieces de precision a partir de materiau photosensible - Google Patents

Procede de fabrication de pieces de precision a partir de materiau photosensible

Info

Publication number
FR2375628A1
FR2375628A1 FR7735655A FR7735655A FR2375628A1 FR 2375628 A1 FR2375628 A1 FR 2375628A1 FR 7735655 A FR7735655 A FR 7735655A FR 7735655 A FR7735655 A FR 7735655A FR 2375628 A1 FR2375628 A1 FR 2375628A1
Authority
FR
France
Prior art keywords
photosensitive material
precision parts
manufacturing
mask
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7735655A
Other languages
English (en)
Other versions
FR2375628B1 (fr
Inventor
Carlton E Olsen
Leroy J Serpa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2375628A1 publication Critical patent/FR2375628A1/fr
Application granted granted Critical
Publication of FR2375628B1 publication Critical patent/FR2375628B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/07—Ink jet characterised by jet control
    • B41J2/075—Ink jet characterised by jet control for many-valued deflection
    • B41J2/08—Ink jet characterised by jet control for many-valued deflection charge-control type
    • B41J2/085—Charge means, e.g. electrodes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Surface Treatment Of Glass (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

Procédé de fabrication de pièces de précision à partir d'un substrat comportant un matériau photosensible. Pour entailler de manière précise le substrat 20 en utilisant les méthodes de masquage, exposition et attaque chimique, l'invention propose d'utiliser tout d'abord un masque 28 de dimensions réduites par rapport à celles de l'entaille réelle à réaliser, puis un second masque de dimensions plus exactes. Electrodes de charges pour imprimante à jet d'encre.
FR7735655A 1976-12-27 1977-11-18 Procede de fabrication de pieces de precision a partir de materiau photosensible Granted FR2375628A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/754,463 US4092166A (en) 1976-12-27 1976-12-27 Double exposure and double etch technique for producing precision parts from crystallizable photosensitive glass

Publications (2)

Publication Number Publication Date
FR2375628A1 true FR2375628A1 (fr) 1978-07-21
FR2375628B1 FR2375628B1 (fr) 1980-08-22

Family

ID=25034904

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7735655A Granted FR2375628A1 (fr) 1976-12-27 1977-11-18 Procede de fabrication de pieces de precision a partir de materiau photosensible

Country Status (10)

Country Link
US (1) US4092166A (fr)
JP (1) JPS606503B2 (fr)
CA (1) CA1097974A (fr)
CH (1) CH620662A5 (fr)
DE (1) DE2752378A1 (fr)
ES (1) ES465428A1 (fr)
FR (1) FR2375628A1 (fr)
GB (1) GB1589538A (fr)
IT (1) IT1113820B (fr)
NL (1) NL7712540A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0340448A2 (fr) * 1988-04-30 1989-11-08 AEG Olympia Office GmbH Procédé pour la fabrication d'une plaque de fond avec incrustation obtenue par gravure pour tête pour imprimante par jet d'encre

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4417251A (en) * 1980-03-06 1983-11-22 Canon Kabushiki Kaisha Ink jet head
US4407934A (en) * 1981-12-04 1983-10-04 Burroughs Corporation Method of making an assembly of electrodes
DE3601632A1 (de) * 1986-01-21 1987-07-23 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen von extraktionsgittern fuer ionenquellen und durch das verfahren hergestellte extraktionsgitter
JPS62194305U (fr) * 1986-05-30 1987-12-10
DE4111783C1 (fr) * 1991-04-11 1992-05-27 Ant Nachrichtentechnik Gmbh, 7150 Backnang, De
US5314522A (en) * 1991-11-19 1994-05-24 Seikosha Co., Ltd. Method of processing photosensitive glass with a pulsed laser to form grooves
JP2873412B2 (ja) * 1991-11-19 1999-03-24 セイコープレシジョン株式会社 感光性ガラスの加工方法
DE4225799A1 (de) * 1992-07-31 1994-02-03 Francotyp Postalia Gmbh Tintenstrahldruckkopf und Verfahren zu seiner Herstellung
US5825382A (en) * 1992-07-31 1998-10-20 Francotyp-Postalia Ag & Co. Edge-shooter ink jet print head and method for its manufacture
EP1876443A3 (fr) 1998-09-17 2008-03-12 Advion BioSciences, Inc. Electronébulisation microfabriquée en monolithique intégré et système chromatographique liquide et procédé
US6633031B1 (en) 1999-03-02 2003-10-14 Advion Biosciences, Inc. Integrated monolithic microfabricated dispensing nozzle and liquid chromatography-electrospray system and method
ATE538490T1 (de) 1999-12-30 2012-01-15 Advion Biosystems Inc Mehrfach-elektrospray-einrichtung, systeme und verfahren
WO2001053819A1 (fr) 2000-01-18 2001-07-26 Advion Biosciences, Inc. Milieu de separation, systeme a buses d'electronebulisation multiples et procede associe
US20050130075A1 (en) * 2003-12-12 2005-06-16 Mohammed Shaarawi Method for making fluid emitter orifice

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3473927A (en) * 1965-12-14 1969-10-21 Corning Glass Works Double negative exposure method for photosensitively opacifiable glass
US3519522A (en) * 1966-12-21 1970-07-07 Corning Glass Works Strengthening of photosensitive glass articles
US3843394A (en) * 1971-10-11 1974-10-22 Canon Kk Photosensitive member
JPS5236817B2 (fr) * 1973-07-27 1977-09-19
JPS5421096B2 (fr) * 1974-01-09 1979-07-27
JPS51135913A (en) * 1975-05-21 1976-11-25 Nippon Telegraph & Telephone Membrane for photoetching

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0340448A2 (fr) * 1988-04-30 1989-11-08 AEG Olympia Office GmbH Procédé pour la fabrication d'une plaque de fond avec incrustation obtenue par gravure pour tête pour imprimante par jet d'encre
EP0340448A3 (fr) * 1988-04-30 1991-09-11 AEG Olympia Office GmbH Procédé pour la fabrication d'une plaque de fond avec incrustation obtenue par gravure pour tête pour imprimante par jet d'encre

Also Published As

Publication number Publication date
GB1589538A (en) 1981-05-13
IT1113820B (it) 1986-01-27
ES465428A1 (es) 1978-09-16
CA1097974A (fr) 1981-03-24
DE2752378C2 (fr) 1987-12-03
US4092166A (en) 1978-05-30
CH620662A5 (fr) 1980-12-15
NL7712540A (nl) 1978-06-29
JPS606503B2 (ja) 1985-02-19
JPS5382412A (en) 1978-07-20
FR2375628B1 (fr) 1980-08-22
DE2752378A1 (de) 1978-06-29

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Legal Events

Date Code Title Description
ST Notification of lapse