JPS5546753A - Pattern formation method using photosensitive chalcogenide layer - Google Patents

Pattern formation method using photosensitive chalcogenide layer

Info

Publication number
JPS5546753A
JPS5546753A JP9615079A JP9615079A JPS5546753A JP S5546753 A JPS5546753 A JP S5546753A JP 9615079 A JP9615079 A JP 9615079A JP 9615079 A JP9615079 A JP 9615079A JP S5546753 A JPS5546753 A JP S5546753A
Authority
JP
Japan
Prior art keywords
layer
region
silver
chalcogenide layer
formation method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9615079A
Other languages
Japanese (ja)
Other versions
JPS5723255B2 (en
Inventor
Akira Yoshikawa
Haruo Nagai
Osamu Ochi
Kazuko Nakano
Yoshihiko Mizushima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9615079A priority Critical patent/JPS5546753A/en
Publication of JPS5546753A publication Critical patent/JPS5546753A/en
Publication of JPS5723255B2 publication Critical patent/JPS5723255B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems

Landscapes

  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To form a high precision pattern by subjecting to specified photoetching a photosensitive chalcogenide layer obtained by laminating a silver layer on a specified amorphous chalcogenide layer. CONSTITUTION:Amorphous chalcogenide layer 22 of thickness below 4000Angstrom consisting of 75-95mol% Se and 5-25mol% Ge is formed by sputtering under a low pressure inert gas atmosphere on plate-formed body 33 made by forming layer 32, for example, of silicon oxide on substrate 31, for example, of silicon, and further on layer 22 silver layer 23 of thickness below 100Angstrom is formed. Then, layer 23 is exposed through optical mask 25 to light to form region 22' doped with silver in layer 22, and the nonexposed areas of layer 23 and layer 22 are etched off, leaving region 22'. After layer 32 is etched using region 22' as a mask, region 22' is removed, and thus, a desired pattern is obtained from layer 32 on substrate 31.
JP9615079A 1979-07-30 1979-07-30 Pattern formation method using photosensitive chalcogenide layer Granted JPS5546753A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9615079A JPS5546753A (en) 1979-07-30 1979-07-30 Pattern formation method using photosensitive chalcogenide layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9615079A JPS5546753A (en) 1979-07-30 1979-07-30 Pattern formation method using photosensitive chalcogenide layer

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP51066879A Division JPS5934295B2 (en) 1976-06-08 1976-06-08 Photosensitive material for pattern formation having a photosensitive chalcogenide layer and method for producing the same; optical mask for pattern formation using the photosensitive chalcogenide layer and pattern forming method

Publications (2)

Publication Number Publication Date
JPS5546753A true JPS5546753A (en) 1980-04-02
JPS5723255B2 JPS5723255B2 (en) 1982-05-18

Family

ID=14157341

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9615079A Granted JPS5546753A (en) 1979-07-30 1979-07-30 Pattern formation method using photosensitive chalcogenide layer

Country Status (1)

Country Link
JP (1) JPS5546753A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04348783A (en) * 1991-05-28 1992-12-03 Kayaba Ind Co Ltd Oscillating mechanism

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4910018A (en) * 1972-05-23 1974-01-29

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4910018A (en) * 1972-05-23 1974-01-29

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04348783A (en) * 1991-05-28 1992-12-03 Kayaba Ind Co Ltd Oscillating mechanism

Also Published As

Publication number Publication date
JPS5723255B2 (en) 1982-05-18

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