DE2809966C2 - Feldeffekttransistorschaltung mit verbesserten Betriebseigenschaften - Google Patents

Feldeffekttransistorschaltung mit verbesserten Betriebseigenschaften

Info

Publication number
DE2809966C2
DE2809966C2 DE2809966A DE2809966A DE2809966C2 DE 2809966 C2 DE2809966 C2 DE 2809966C2 DE 2809966 A DE2809966 A DE 2809966A DE 2809966 A DE2809966 A DE 2809966A DE 2809966 C2 DE2809966 C2 DE 2809966C2
Authority
DE
Germany
Prior art keywords
field effect
effect transistor
substrate
voltage
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2809966A
Other languages
German (de)
English (en)
Other versions
DE2809966A1 (de
Inventor
Kenneth Kotecha Harish Narandas Manassas Va. Beilstein
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2809966A1 publication Critical patent/DE2809966A1/de
Application granted granted Critical
Publication of DE2809966C2 publication Critical patent/DE2809966C2/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/761—PN junctions
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03K—PULSE TECHNIQUE
    • H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
    • H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
    • H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
    • H03K19/094—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
    • H03K19/0944—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET
    • H03K19/09441—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET of the same canal type
    • H03K19/09443—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET of the same canal type using a combination of enhancement and depletion transistors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/84—Combinations of enhancement-mode IGFETs and depletion-mode IGFETs

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Computing Systems (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Logic Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electronic Switches (AREA)
DE2809966A 1977-03-15 1978-03-08 Feldeffekttransistorschaltung mit verbesserten Betriebseigenschaften Expired DE2809966C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/777,793 US4092548A (en) 1977-03-15 1977-03-15 Substrate bias modulation to improve mosfet circuit performance

Publications (2)

Publication Number Publication Date
DE2809966A1 DE2809966A1 (de) 1978-09-21
DE2809966C2 true DE2809966C2 (de) 1986-08-14

Family

ID=25111295

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2809966A Expired DE2809966C2 (de) 1977-03-15 1978-03-08 Feldeffekttransistorschaltung mit verbesserten Betriebseigenschaften

Country Status (6)

Country Link
US (1) US4092548A (enExample)
JP (1) JPS53114656A (enExample)
DE (1) DE2809966C2 (enExample)
FR (1) FR2384389A1 (enExample)
GB (1) GB1595143A (enExample)
IT (1) IT1109158B (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4345213A (en) * 1980-02-28 1982-08-17 Rca Corporation Differential-input amplifier circuitry with increased common-mode _voltage range
US4460835A (en) * 1980-05-13 1984-07-17 Tokyo Shibaura Denki Kabushiki Kaisha Semiconductor integrated circuit device with low power consumption in a standby mode using an on-chip substrate bias generator
US4307333A (en) * 1980-07-29 1981-12-22 Sperry Corporation Two way regulating circuit
JPS6199413A (ja) * 1984-10-19 1986-05-17 Mitsubishi Electric Corp 出力回路装置
JPS6383923U (enExample) * 1986-11-19 1988-06-01
EP0297276B1 (de) * 1987-06-10 1992-03-18 Siemens Aktiengesellschaft Generatorschaltung
US4775807A (en) * 1987-06-29 1988-10-04 International Business Machines Corp. Single ended receiver circuit with hysteresis
JPH0831791B2 (ja) * 1988-12-28 1996-03-27 三菱電機株式会社 半導体装置
JPH04287418A (ja) * 1991-03-18 1992-10-13 Fujitsu Ltd 半導体集積回路
JPH0496136U (enExample) * 1991-08-01 1992-08-20
US5543654A (en) * 1992-01-28 1996-08-06 Thunderbird Technologies, Inc. Contoured-tub fermi-threshold field effect transistor and method of forming same
JP3179350B2 (ja) * 1996-09-09 2001-06-25 日本電気株式会社 レベルシフト回路
JP4253052B2 (ja) * 1997-04-08 2009-04-08 株式会社東芝 半導体装置
WO2000004638A1 (en) * 1998-07-14 2000-01-27 Koninklijke Philips Electronics N.V. Cmos delay circuit using substrate biassing

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3506851A (en) * 1966-12-14 1970-04-14 North American Rockwell Field effect transistor driver using capacitor feedback
US3737673A (en) * 1970-04-27 1973-06-05 Tokyo Shibaura Electric Co Logic circuit using complementary type insulated gate field effect transistors
US3749936A (en) * 1971-08-19 1973-07-31 Texas Instruments Inc Fault protected output buffer
US3912948A (en) * 1971-08-30 1975-10-14 Nat Semiconductor Corp Mos bootstrap inverter circuit
US3775693A (en) * 1971-11-29 1973-11-27 Moskek Co Mosfet logic inverter for integrated circuits
JPS48101846A (enExample) * 1972-04-03 1973-12-21
US3911289A (en) * 1972-08-18 1975-10-07 Matsushita Electric Industrial Co Ltd MOS type semiconductor IC device
JPS50134553A (enExample) * 1974-04-10 1975-10-24
US3898477A (en) * 1974-06-03 1975-08-05 Motorola Inc Self ratioing input buffer circuit
DE2443219B2 (de) * 1974-09-10 1976-09-23 Logikschaltung in komplementaer- kanal-mis-technik
US4049978A (en) * 1976-01-26 1977-09-20 Western Digital Corporation MOS high current drive circuit
US4049980A (en) * 1976-04-26 1977-09-20 Hewlett-Packard Company IGFET threshold voltage compensator
US4072868A (en) * 1976-09-16 1978-02-07 International Business Machines Corporation FET inverter with isolated substrate load

Also Published As

Publication number Publication date
IT1109158B (it) 1985-12-16
JPS5716534B2 (enExample) 1982-04-06
JPS53114656A (en) 1978-10-06
IT7820147A0 (it) 1978-02-10
FR2384389A1 (fr) 1978-10-13
FR2384389B1 (enExample) 1980-08-29
GB1595143A (en) 1981-08-05
DE2809966A1 (de) 1978-09-21
US4092548A (en) 1978-05-30

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee