DE2730725C2 - - Google Patents

Info

Publication number
DE2730725C2
DE2730725C2 DE2730725A DE2730725A DE2730725C2 DE 2730725 C2 DE2730725 C2 DE 2730725C2 DE 2730725 A DE2730725 A DE 2730725A DE 2730725 A DE2730725 A DE 2730725A DE 2730725 C2 DE2730725 C2 DE 2730725C2
Authority
DE
Germany
Prior art keywords
composition according
curable
masking composition
integer
aromatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE2730725A
Other languages
German (de)
English (en)
Other versions
DE2730725A1 (de
Inventor
James Vincent Elnora N.Y. Us Crivello
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE2730725A1 publication Critical patent/DE2730725A1/de
Application granted granted Critical
Publication of DE2730725C2 publication Critical patent/DE2730725C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
DE19772730725 1976-07-09 1977-07-07 Haertbare zusammensetzung und ihre verwendung Granted DE2730725A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
US73242176A 1976-10-14 1976-10-14

Publications (2)

Publication Number Publication Date
DE2730725A1 DE2730725A1 (de) 1978-01-12
DE2730725C2 true DE2730725C2 (nl) 1990-08-16

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19772730725 Granted DE2730725A1 (de) 1976-07-09 1977-07-07 Haertbare zusammensetzung und ihre verwendung

Country Status (8)

Country Link
JP (1) JPS6035930B2 (nl)
AU (1) AU517415B2 (nl)
BR (1) BR7704527A (nl)
DE (1) DE2730725A1 (nl)
FR (1) FR2357931A1 (nl)
GB (1) GB1554389A (nl)
MX (2) MX159499A (nl)
NL (1) NL183948C (nl)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
EP0153904B1 (de) * 1984-02-10 1988-09-14 Ciba-Geigy Ag Verfahren zur Herstellung einer Schutzschicht oder einer Reliefabbildung
ES2396118T3 (es) * 2002-02-01 2013-02-19 Saint-Gobain Glass France S.A. Capa barrera hecha de una resina curable que contiene un poliol polimérico
CN102576812B (zh) 2009-10-01 2016-03-16 日立化成株式会社 有机电子用材料、有机电子元件、有机电致发光元件以及使用其的显示元件、照明装置、显示装置
WO2011132702A1 (ja) 2010-04-22 2011-10-27 日立化成工業株式会社 有機エレクトロニクス材料、重合開始剤及び熱重合開始剤、インク組成物、有機薄膜及びその製造方法、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、照明装置、表示素子、並びに表示装置
EP2966942A4 (en) 2013-03-08 2016-12-07 Hitachi Chemical Co Ltd TREATMENT SOLUTION CONTAINING ION COMPOUND, ORGANIC ELECTRONIC ELEMENT, AND METHOD FOR MANUFACTURING ORGANIC ELECTRONIC ELEMENT

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
NL83160C (nl) * 1952-08-19
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1512982A (en) * 1974-05-02 1978-06-01 Gen Electric Salts
GB1516351A (en) * 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
GB1516512A (en) * 1974-05-02 1978-07-05 Gen Electric Chalcogenium salts
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Also Published As

Publication number Publication date
GB1554389A (en) 1979-10-17
NL183948B (nl) 1988-10-03
NL7707609A (nl) 1978-01-11
BR7704527A (pt) 1978-04-25
FR2357931B1 (nl) 1983-11-25
MX145409A (es) 1982-02-04
JPS6035930B2 (ja) 1985-08-17
NL183948C (nl) 1989-03-01
FR2357931A1 (fr) 1978-02-03
AU517415B2 (en) 1981-07-30
DE2730725A1 (de) 1978-01-12
AU2553177A (en) 1978-11-30
JPS5322597A (en) 1978-03-02
MX159499A (es) 1989-06-20

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8328 Change in the person/name/address of the agent

Free format text: SIEB, R., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 6947 LAUDENBACH

8339 Ceased/non-payment of the annual fee