DE2612424A1 - Aufdampfquelle - Google Patents
AufdampfquelleInfo
- Publication number
- DE2612424A1 DE2612424A1 DE19762612424 DE2612424A DE2612424A1 DE 2612424 A1 DE2612424 A1 DE 2612424A1 DE 19762612424 DE19762612424 DE 19762612424 DE 2612424 A DE2612424 A DE 2612424A DE 2612424 A1 DE2612424 A1 DE 2612424A1
- Authority
- DE
- Germany
- Prior art keywords
- cover
- evaporation
- vapor deposition
- deposition source
- shaped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000001704 evaporation Methods 0.000 title claims description 41
- 230000008020 evaporation Effects 0.000 title claims description 41
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 239000000463 material Substances 0.000 claims abstract description 16
- 238000007740 vapor deposition Methods 0.000 claims description 23
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002085 irritant Substances 0.000 description 1
- 231100000021 irritant Toxicity 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH261776A CH593347A5 (enrdf_load_stackoverflow) | 1976-03-03 | 1976-03-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2612424A1 true DE2612424A1 (de) | 1977-09-08 |
Family
ID=4237784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19762612424 Withdrawn DE2612424A1 (de) | 1976-03-03 | 1976-03-24 | Aufdampfquelle |
Country Status (2)
| Country | Link |
|---|---|
| CH (1) | CH593347A5 (enrdf_load_stackoverflow) |
| DE (1) | DE2612424A1 (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0499124A3 (en) * | 1991-02-14 | 1995-01-04 | 4P Verpackungen Ronsberg Gmbh | Line evaporator |
| WO2000028103A3 (en) * | 1998-11-12 | 2000-08-31 | Flex Products Inc | Vapor source having linear aperture and coating process |
| EP1433873A2 (en) | 2002-07-23 | 2004-06-30 | Samsung NEC Mobile Display Co. Ltd. | Heating crucible and deposition apparatus using the same |
| EP1496133A1 (en) * | 2003-07-04 | 2005-01-12 | Agfa-Gevaert | Assembly for crucible used for evaporation of raw materials. |
| US7070658B2 (en) | 2003-07-04 | 2006-07-04 | Agfa-Gevaert | Vapor deposition apparatus |
| WO2010133426A1 (de) * | 2009-04-29 | 2010-11-25 | THEVA DüNNSCHICHTTECHNIK GMBH | Verfahren und vorrichtung zur hochratenbeschichtung durch hochdruckverdampfen |
-
1976
- 1976-03-03 CH CH261776A patent/CH593347A5/xx not_active IP Right Cessation
- 1976-03-24 DE DE19762612424 patent/DE2612424A1/de not_active Withdrawn
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0499124A3 (en) * | 1991-02-14 | 1995-01-04 | 4P Verpackungen Ronsberg Gmbh | Line evaporator |
| WO2000028103A3 (en) * | 1998-11-12 | 2000-08-31 | Flex Products Inc | Vapor source having linear aperture and coating process |
| US6202591B1 (en) | 1998-11-12 | 2001-03-20 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
| US6367414B2 (en) | 1998-11-12 | 2002-04-09 | Flex Products, Inc. | Linear aperture deposition apparatus and coating process |
| EP1433873A2 (en) | 2002-07-23 | 2004-06-30 | Samsung NEC Mobile Display Co. Ltd. | Heating crucible and deposition apparatus using the same |
| EP1433873A3 (en) * | 2002-07-23 | 2004-07-07 | Samsung NEC Mobile Display Co. Ltd. | Heating crucible and deposition apparatus using the same |
| US8025733B2 (en) | 2002-07-23 | 2011-09-27 | Samsung Mobile Display Co., Ltd. | Heating crucible and deposition apparatus using the same |
| EP1496133A1 (en) * | 2003-07-04 | 2005-01-12 | Agfa-Gevaert | Assembly for crucible used for evaporation of raw materials. |
| US7070658B2 (en) | 2003-07-04 | 2006-07-04 | Agfa-Gevaert | Vapor deposition apparatus |
| WO2010133426A1 (de) * | 2009-04-29 | 2010-11-25 | THEVA DüNNSCHICHTTECHNIK GMBH | Verfahren und vorrichtung zur hochratenbeschichtung durch hochdruckverdampfen |
Also Published As
| Publication number | Publication date |
|---|---|
| CH593347A5 (enrdf_load_stackoverflow) | 1977-11-30 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |