DE2527096C3 - Verfahren zum Abscheiden von metallischem Kupfer auf einer katalytisch aktivierten Oberfläche - Google Patents
Verfahren zum Abscheiden von metallischem Kupfer auf einer katalytisch aktivierten OberflächeInfo
- Publication number
- DE2527096C3 DE2527096C3 DE2527096A DE2527096A DE2527096C3 DE 2527096 C3 DE2527096 C3 DE 2527096C3 DE 2527096 A DE2527096 A DE 2527096A DE 2527096 A DE2527096 A DE 2527096A DE 2527096 C3 DE2527096 C3 DE 2527096C3
- Authority
- DE
- Germany
- Prior art keywords
- copper
- acid
- ions
- solution
- aqueous solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010949 copper Substances 0.000 title claims description 45
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 43
- 229910052802 copper Inorganic materials 0.000 title claims description 42
- 238000000034 method Methods 0.000 title claims description 28
- 238000000151 deposition Methods 0.000 title description 11
- -1 copper (I) ions Chemical class 0.000 claims description 22
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 19
- 150000007513 acids Chemical class 0.000 claims description 16
- 239000007864 aqueous solution Substances 0.000 claims description 15
- 150000002500 ions Chemical class 0.000 claims description 15
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 claims description 14
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 14
- 239000003795 chemical substances by application Substances 0.000 claims description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 12
- 230000009467 reduction Effects 0.000 claims description 12
- 230000003213 activating effect Effects 0.000 claims description 11
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 10
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 8
- VGYYSIDKAKXZEE-UHFFFAOYSA-L hydroxylammonium sulfate Chemical compound O[NH3+].O[NH3+].[O-]S([O-])(=O)=O VGYYSIDKAKXZEE-UHFFFAOYSA-L 0.000 claims description 7
- 229910000378 hydroxylammonium sulfate Inorganic materials 0.000 claims description 7
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 6
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 5
- NAOLWIGVYRIGTP-UHFFFAOYSA-N 1,3,5-trihydroxyanthracene-9,10-dione Chemical compound C1=CC(O)=C2C(=O)C3=CC(O)=CC(O)=C3C(=O)C2=C1 NAOLWIGVYRIGTP-UHFFFAOYSA-N 0.000 claims description 4
- GBHCABUWWQUMAJ-UHFFFAOYSA-N 2-hydrazinoethanol Chemical compound NNCCO GBHCABUWWQUMAJ-UHFFFAOYSA-N 0.000 claims description 4
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 claims description 4
- 239000004310 lactic acid Substances 0.000 claims description 4
- 235000014655 lactic acid Nutrition 0.000 claims description 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 3
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 150000001412 amines Chemical class 0.000 claims description 3
- 235000015165 citric acid Nutrition 0.000 claims description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 3
- 239000001384 succinic acid Substances 0.000 claims description 3
- 239000011975 tartaric acid Substances 0.000 claims description 3
- 235000002906 tartaric acid Nutrition 0.000 claims description 3
- ULUZGMIUTMRARO-UHFFFAOYSA-N (carbamoylamino)urea Chemical compound NC(=O)NNC(N)=O ULUZGMIUTMRARO-UHFFFAOYSA-N 0.000 claims description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims description 2
- IOMZCWUHFGMSEJ-UHFFFAOYSA-N 4-(azaniumylamino)benzenesulfonate Chemical compound NNC1=CC=C(S(O)(=O)=O)C=C1 IOMZCWUHFGMSEJ-UHFFFAOYSA-N 0.000 claims description 2
- 150000003973 alkyl amines Chemical class 0.000 claims description 2
- 239000013522 chelant Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 229910017464 nitrogen compound Inorganic materials 0.000 claims description 2
- HKOOXMFOFWEVGF-UHFFFAOYSA-N phenylhydrazine Chemical compound NNC1=CC=CC=C1 HKOOXMFOFWEVGF-UHFFFAOYSA-N 0.000 claims description 2
- 235000011044 succinic acid Nutrition 0.000 claims description 2
- OTXHZHQQWQTQMW-UHFFFAOYSA-N (diaminomethylideneamino)azanium;hydrogen carbonate Chemical compound OC([O-])=O.N[NH2+]C(N)=N OTXHZHQQWQTQMW-UHFFFAOYSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 58
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 12
- 239000003638 chemical reducing agent Substances 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 238000007323 disproportionation reaction Methods 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000007921 spray Substances 0.000 description 8
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 6
- 229910021529 ammonia Inorganic materials 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 5
- 235000011114 ammonium hydroxide Nutrition 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 239000010802 sludge Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- BERDEBHAJNAUOM-UHFFFAOYSA-N copper(i) oxide Chemical compound [Cu]O[Cu] BERDEBHAJNAUOM-UHFFFAOYSA-N 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- IUTCEZPPWBHGIX-UHFFFAOYSA-N tin(2+) Chemical class [Sn+2] IUTCEZPPWBHGIX-UHFFFAOYSA-N 0.000 description 3
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 239000011260 aqueous acid Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 150000002429 hydrazines Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- HAMNKKUPIHEESI-UHFFFAOYSA-N aminoguanidine Chemical compound NNC(N)=N HAMNKKUPIHEESI-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 229910000366 copper(II) sulfate Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- WJMJNUHFVAOMEL-UHFFFAOYSA-L tetraazanium copper trisulfate Chemical compound [NH4+].[NH4+].[NH4+].[NH4+].[Cu++].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O WJMJNUHFVAOMEL-UHFFFAOYSA-L 0.000 description 1
- NDJGQNJPALSQEN-UHFFFAOYSA-N trioxido-1kappa(2)O,2kappaO-dinitrate(N--N)(2-) Chemical compound [O-]N([O-])N=O NDJGQNJPALSQEN-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US48133274A | 1974-06-20 | 1974-06-20 | |
| US05/521,338 US3963842A (en) | 1974-06-20 | 1974-11-06 | Deposition of copper |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2527096A1 DE2527096A1 (de) | 1976-01-08 |
| DE2527096B2 DE2527096B2 (de) | 1978-07-13 |
| DE2527096C3 true DE2527096C3 (de) | 1984-09-20 |
Family
ID=27046920
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2527096A Expired DE2527096C3 (de) | 1974-06-20 | 1975-06-18 | Verfahren zum Abscheiden von metallischem Kupfer auf einer katalytisch aktivierten Oberfläche |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US3963842A (en, 2012) |
| JP (1) | JPS5116235A (en, 2012) |
| AR (1) | AR213613A1 (en, 2012) |
| AU (1) | AU497522B2 (en, 2012) |
| BR (1) | BR7503834A (en, 2012) |
| CA (1) | CA1060284A (en, 2012) |
| CH (1) | CH613474A5 (en, 2012) |
| DE (1) | DE2527096C3 (en, 2012) |
| FR (1) | FR2275566A1 (en, 2012) |
| GB (1) | GB1518301A (en, 2012) |
| HK (1) | HK25482A (en, 2012) |
| IE (1) | IE41295B1 (en, 2012) |
| IN (1) | IN143978B (en, 2012) |
| IT (1) | IT1040660B (en, 2012) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3148280A1 (de) * | 1981-12-05 | 1983-06-09 | Bayer Ag, 5090 Leverkusen | Verfahren zur aktivierung von substratoberflaechen fuer die stromlose metallisierung |
| JPS58134458U (ja) * | 1982-03-03 | 1983-09-09 | 佐藤 忠吉 | 水質管理装置 |
| GB2206128B (en) * | 1987-06-23 | 1991-11-20 | Glaverbel | Copper mirrors and method of manufacturing same |
| US5419926A (en) | 1993-11-22 | 1995-05-30 | Lilly London, Inc. | Ammonia-free deposition of copper by disproportionation |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB152835A (en) * | 1919-09-05 | 1920-10-28 | John David Smith | Improvements in the deposition of copper on non-conducting surfaces |
| US2783193A (en) * | 1952-09-17 | 1957-02-26 | Motorola Inc | Electroplating method |
| US2900274A (en) * | 1953-12-16 | 1959-08-18 | Owens Corning Fiberglass Corp | Method of providing glass filaments with a coating of silver |
| US2759845A (en) * | 1954-10-25 | 1956-08-21 | Metropolitan Mirror And Glass | Processes of precipitating copper from copper sulfate solutions and precipitating media for so doing |
| US2922737A (en) * | 1956-05-08 | 1960-01-26 | Moudry Zdenek Vaclav | Methods for producing colloidal oligodynamic metal compositions |
| US2977244A (en) * | 1958-02-01 | 1961-03-28 | Pilkington Brothers Ltd | Method of depositing metallic copper |
| FR1225702A (fr) * | 1958-02-01 | 1960-07-04 | Pilkington Brothers Ltd | Procédé pour le dépôt de cuivre métallique |
| US2967112A (en) * | 1958-03-11 | 1961-01-03 | Pilkington Brothers Ltd | Method and apparatus for applying metal-depositing solutions |
| GB859448A (en) * | 1958-03-11 | 1961-01-25 | Pilkington Brothers Ltd | Improvements in or relating to metallising |
| US2963383A (en) * | 1959-05-14 | 1960-12-06 | Kay Chemicals Inc | Spray silvering procedures |
| US3093509A (en) * | 1959-09-28 | 1963-06-11 | Wein Samuel | Process for making copper films |
| US3403035A (en) * | 1964-06-24 | 1968-09-24 | Process Res Company | Process for stabilizing autocatalytic metal plating solutions |
| US3615732A (en) * | 1968-08-13 | 1971-10-26 | Shipley Co | Electroless copper plating |
| US3645749A (en) * | 1970-06-04 | 1972-02-29 | Kollmorgen Corp | Electroless plating baths with improved deposition rates |
-
1974
- 1974-11-06 US US05/521,338 patent/US3963842A/en not_active Expired - Lifetime
-
1975
- 1975-06-12 AR AR259176A patent/AR213613A1/es active
- 1975-06-16 IN IN1178/CAL/1975A patent/IN143978B/en unknown
- 1975-06-16 IE IE1348/75A patent/IE41295B1/xx unknown
- 1975-06-17 AU AU82151/75A patent/AU497522B2/en not_active Expired
- 1975-06-18 CH CH794375A patent/CH613474A5/xx not_active IP Right Cessation
- 1975-06-18 BR BR4930/75D patent/BR7503834A/pt unknown
- 1975-06-18 FR FR7519150A patent/FR2275566A1/fr active Granted
- 1975-06-18 DE DE2527096A patent/DE2527096C3/de not_active Expired
- 1975-06-19 JP JP50075018A patent/JPS5116235A/ja active Granted
- 1975-06-19 IT IT50132/75A patent/IT1040660B/it active
- 1975-06-19 CA CA229,724A patent/CA1060284A/en not_active Expired
- 1975-06-20 GB GB26243/75A patent/GB1518301A/en not_active Expired
-
1982
- 1982-06-10 HK HK254/82A patent/HK25482A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| BR7503834A (pt) | 1976-07-06 |
| FR2275566B1 (en, 2012) | 1980-12-12 |
| US3963842A (en) | 1976-06-15 |
| CA1060284A (en) | 1979-08-14 |
| FR2275566A1 (fr) | 1976-01-16 |
| IE41295B1 (en) | 1979-12-05 |
| IE41295L (en) | 1975-12-20 |
| US3963842B1 (en, 2012) | 1988-08-23 |
| DE2527096A1 (de) | 1976-01-08 |
| AU8215175A (en) | 1976-12-23 |
| IT1040660B (it) | 1979-12-20 |
| JPS5631353B2 (en, 2012) | 1981-07-21 |
| DE2527096B2 (de) | 1978-07-13 |
| AU497522B2 (en) | 1978-12-14 |
| AR213613A1 (es) | 1979-02-28 |
| GB1518301A (en) | 1978-07-19 |
| IN143978B (en, 2012) | 1978-03-04 |
| JPS5116235A (en) | 1976-02-09 |
| CH613474A5 (en, 2012) | 1979-09-28 |
| HK25482A (en) | 1982-06-18 |
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