DE2508618C2 - Lichtempfindliches Gemisch - Google Patents

Lichtempfindliches Gemisch

Info

Publication number
DE2508618C2
DE2508618C2 DE19752508618 DE2508618A DE2508618C2 DE 2508618 C2 DE2508618 C2 DE 2508618C2 DE 19752508618 DE19752508618 DE 19752508618 DE 2508618 A DE2508618 A DE 2508618A DE 2508618 C2 DE2508618 C2 DE 2508618C2
Authority
DE
Germany
Prior art keywords
solution
photosensitive
weight
copolymer
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19752508618
Other languages
German (de)
English (en)
Other versions
DE2508618A1 (de
Inventor
Nobuyuki Kita
Yasuhisa Odawara Kanagawa Narutomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE2508618A1 publication Critical patent/DE2508618A1/de
Application granted granted Critical
Publication of DE2508618C2 publication Critical patent/DE2508618C2/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE19752508618 1974-02-28 1975-02-27 Lichtempfindliches Gemisch Expired DE2508618C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2394074A JPS5534929B2 (US20030220297A1-20031127-C00033.png) 1974-02-28 1974-02-28

Publications (2)

Publication Number Publication Date
DE2508618A1 DE2508618A1 (de) 1975-09-04
DE2508618C2 true DE2508618C2 (de) 1984-01-26

Family

ID=12124516

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752508618 Expired DE2508618C2 (de) 1974-02-28 1975-02-27 Lichtempfindliches Gemisch

Country Status (5)

Country Link
JP (1) JPS5534929B2 (US20030220297A1-20031127-C00033.png)
CA (1) CA1060252A (US20030220297A1-20031127-C00033.png)
DE (1) DE2508618C2 (US20030220297A1-20031127-C00033.png)
FR (1) FR2262813B1 (US20030220297A1-20031127-C00033.png)
GB (1) GB1505739A (US20030220297A1-20031127-C00033.png)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
JPS5498613A (en) * 1978-01-09 1979-08-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5552054A (en) * 1978-10-11 1980-04-16 Konishiroku Photo Ind Co Ltd Developing solution composition
JPS564144A (en) * 1979-06-23 1981-01-17 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
CA1153611A (en) * 1980-04-30 1983-09-13 Minnesota Mining And Manufacturing Company Aqueous developable photosensitive composition and printing plate
JPS5964396A (ja) * 1982-10-05 1984-04-12 Fuji Photo Film Co Ltd 平版印刷版用版面保護剤
JPS60217356A (ja) * 1984-04-13 1985-10-30 Asahi Chem Ind Co Ltd 感光性組成物
JP2550346B2 (ja) * 1987-05-18 1996-11-06 光陽化学工業株式会社 平版製版用感光性組成物
FR2651337B1 (fr) * 1989-08-31 1991-12-06 Efi Composition photosensible a base de condensat diazouique pour plaques offset.
JPH03125151A (ja) * 1989-10-11 1991-05-28 Konica Corp 湿し水不要の感光性平版印刷版用現像液
JPH03148662A (ja) * 1989-11-03 1991-06-25 Konica Corp 湿し水不要の感光性平版印刷版用現像液
JPH03148663A (ja) * 1989-11-03 1991-06-25 Konica Corp 湿し水不要の感光性平版印刷版用現像液
DE4430680A1 (de) * 1994-08-29 1996-03-07 Hoechst Ag Lichtempfindliches Gemisch
JP2815332B2 (ja) * 1995-12-18 1998-10-27 旭化成工業株式会社 感光性組成物の製造方法
JP4458389B2 (ja) 2000-05-01 2010-04-28 コダック株式会社 感光性組成物および感光性平版印刷版
JP4410714B2 (ja) 2004-08-13 2010-02-03 富士フイルム株式会社 平版印刷版用支持体の製造方法
JP4499507B2 (ja) 2004-08-23 2010-07-07 コダック株式会社 平版印刷版原版
DE602006001142D1 (de) 2005-04-13 2008-06-26 Fujifilm Corp Verfahren zur Herstellung eines Flachdruckplattenträgers
JP5165197B2 (ja) * 2005-12-12 2013-03-21 岡本化学工業株式会社 平版印刷版用捨版およびその製造方法
EP2042338A3 (en) 2007-09-26 2010-03-10 Fujifilm Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
EP2042339B1 (en) 2007-09-26 2013-05-22 FUJIFILM Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009208140A (ja) 2008-03-06 2009-09-17 Fujifilm Corp 平版印刷版用アルミニウム合金板の製造方法、ならびに該製造方法により得られる平版印刷版用アルミニウム合金板および平版印刷版用支持体
JP2009234247A (ja) 2008-03-07 2009-10-15 Fujifilm Corp 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5288268B2 (ja) 2009-03-25 2013-09-11 富士フイルム株式会社 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5281130B2 (ja) 2011-07-05 2013-09-04 富士フイルム株式会社 平版印刷用湿し水組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2034654C2 (de) * 1970-07-13 1982-08-26 Hoechst Ag, 6000 Frankfurt Negativ arbeitende Kopierlösung und deren Verwendung zur Herstellung von Druckplatten
IT948621B (it) * 1971-02-19 1973-06-11 Howson Algraphy Ltd Procedimento per produrre lastre da stampa litografica e lastre cosi ottenute

Also Published As

Publication number Publication date
JPS5534929B2 (US20030220297A1-20031127-C00033.png) 1980-09-10
JPS50118802A (US20030220297A1-20031127-C00033.png) 1975-09-17
FR2262813A1 (US20030220297A1-20031127-C00033.png) 1975-09-26
FR2262813B1 (US20030220297A1-20031127-C00033.png) 1977-04-15
DE2508618A1 (de) 1975-09-04
GB1505739A (en) 1978-03-30
CA1060252A (en) 1979-08-14

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Legal Events

Date Code Title Description
OD Request for examination
8128 New person/name/address of the agent

Representative=s name: VON FUENER, A., DIPL.-CHEM. DR.RER.NAT. EBBINGHAUS

8125 Change of the main classification

Ipc: G03F 7/08

8126 Change of the secondary classification

Free format text: G03C 1/52 C08L 33/08

D2 Grant after examination
8364 No opposition during term of opposition