JPS5552054A - Developing solution composition - Google Patents
Developing solution compositionInfo
- Publication number
- JPS5552054A JPS5552054A JP12416578A JP12416578A JPS5552054A JP S5552054 A JPS5552054 A JP S5552054A JP 12416578 A JP12416578 A JP 12416578A JP 12416578 A JP12416578 A JP 12416578A JP S5552054 A JPS5552054 A JP S5552054A
- Authority
- JP
- Japan
- Prior art keywords
- developing solution
- organic solvent
- water
- developing
- anionic surfactant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To enable a developing solution to develop a photosensitive material consisting mainly of a polymer having aromatic hydroxy groups and a photosensitive diazo compound with high developing ability without environmental pollution with a small amount of organic solvent, by using a developing solution consisting of an alkaline agent, an anionic surfactant, and water. CONSTITUTION:Organic solvent (a) dissolving or swelling the unexposed area of a photosensitive layer, such as ethyleneglycol phenyl ether and having a solubility in water below 3wt%, about 1-15wt%; an alkaline agent (b), such as sodium silicate, alkylamine, or ethyleneimine, about 0.05-4wt%; an anionic surfactant (c) such as sodium butylnaphthalenesulfonate or a condensate of this with formaldehyde, about 0.5-10wt%; and water (d) are incorporated to form a developing solution composition. This composition has high developing power, and yet, has a little amount of organic solvent, so there is little danger of causing environmental pollution and industrial hygiene problems.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12416578A JPS5552054A (en) | 1978-10-11 | 1978-10-11 | Developing solution composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12416578A JPS5552054A (en) | 1978-10-11 | 1978-10-11 | Developing solution composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5552054A true JPS5552054A (en) | 1980-04-16 |
JPS6336490B2 JPS6336490B2 (en) | 1988-07-20 |
Family
ID=14878546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12416578A Granted JPS5552054A (en) | 1978-10-11 | 1978-10-11 | Developing solution composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5552054A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134847A (en) * | 1979-04-06 | 1980-10-21 | Nec Corp | Manufacture of resist image |
JPS59142547A (en) * | 1983-02-02 | 1984-08-15 | Nippon Telegr & Teleph Corp <Ntt> | Agent for raising image sharpness added into developing solution dependent on dissolution speed difference and developing composition containing it |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2508618A1 (en) * | 1974-02-28 | 1975-09-04 | Fuji Photo Film Co Ltd | LIGHT SENSITIVE DIMENSIONS |
DE2744097A1 (en) * | 1976-10-01 | 1978-04-06 | Fuji Photo Film Co Ltd | PROCESS FOR DEVELOPING A LITHOGRAPHIC PRINTING PLATE |
-
1978
- 1978-10-11 JP JP12416578A patent/JPS5552054A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2508618A1 (en) * | 1974-02-28 | 1975-09-04 | Fuji Photo Film Co Ltd | LIGHT SENSITIVE DIMENSIONS |
JPS50118802A (en) * | 1974-02-28 | 1975-09-17 | ||
DE2744097A1 (en) * | 1976-10-01 | 1978-04-06 | Fuji Photo Film Co Ltd | PROCESS FOR DEVELOPING A LITHOGRAPHIC PRINTING PLATE |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55134847A (en) * | 1979-04-06 | 1980-10-21 | Nec Corp | Manufacture of resist image |
JPS59142547A (en) * | 1983-02-02 | 1984-08-15 | Nippon Telegr & Teleph Corp <Ntt> | Agent for raising image sharpness added into developing solution dependent on dissolution speed difference and developing composition containing it |
JPH0332783B2 (en) * | 1983-02-02 | 1991-05-14 | Nippon Denshin Denwa Kk |
Also Published As
Publication number | Publication date |
---|---|
JPS6336490B2 (en) | 1988-07-20 |
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