FR2651337B1 - Composition photosensible a base de condensat diazouique pour plaques offset. - Google Patents

Composition photosensible a base de condensat diazouique pour plaques offset.

Info

Publication number
FR2651337B1
FR2651337B1 FR8911454A FR8911454A FR2651337B1 FR 2651337 B1 FR2651337 B1 FR 2651337B1 FR 8911454 A FR8911454 A FR 8911454A FR 8911454 A FR8911454 A FR 8911454A FR 2651337 B1 FR2651337 B1 FR 2651337B1
Authority
FR
France
Prior art keywords
diazouic
condensate
photosensitive composition
composition based
offset plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8911454A
Other languages
English (en)
Other versions
FR2651337A1 (fr
Inventor
Balandier Michel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EFI
Original Assignee
EFI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EFI filed Critical EFI
Priority to FR8911454A priority Critical patent/FR2651337B1/fr
Publication of FR2651337A1 publication Critical patent/FR2651337A1/fr
Application granted granted Critical
Publication of FR2651337B1 publication Critical patent/FR2651337B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
FR8911454A 1989-08-31 1989-08-31 Composition photosensible a base de condensat diazouique pour plaques offset. Expired - Fee Related FR2651337B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR8911454A FR2651337B1 (fr) 1989-08-31 1989-08-31 Composition photosensible a base de condensat diazouique pour plaques offset.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8911454A FR2651337B1 (fr) 1989-08-31 1989-08-31 Composition photosensible a base de condensat diazouique pour plaques offset.

Publications (2)

Publication Number Publication Date
FR2651337A1 FR2651337A1 (fr) 1991-03-01
FR2651337B1 true FR2651337B1 (fr) 1991-12-06

Family

ID=9385045

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8911454A Expired - Fee Related FR2651337B1 (fr) 1989-08-31 1989-08-31 Composition photosensible a base de condensat diazouique pour plaques offset.

Country Status (1)

Country Link
FR (1) FR2651337B1 (fr)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534929B2 (fr) * 1974-02-28 1980-09-10
JPS60186837A (ja) * 1984-03-07 1985-09-24 Somar Corp 感光性組成物
DE3425328A1 (de) * 1984-07-10 1986-01-16 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches aufzeichnungsmaterial

Also Published As

Publication number Publication date
FR2651337A1 (fr) 1991-03-01

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Legal Events

Date Code Title Description
ST Notification of lapse