DE2436160C3 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE2436160C3
DE2436160C3 DE2436160A DE2436160A DE2436160C3 DE 2436160 C3 DE2436160 C3 DE 2436160C3 DE 2436160 A DE2436160 A DE 2436160A DE 2436160 A DE2436160 A DE 2436160A DE 2436160 C3 DE2436160 C3 DE 2436160C3
Authority
DE
Germany
Prior art keywords
detectors
sample
electron beam
ring
scanning electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2436160A
Other languages
German (de)
English (en)
Other versions
DE2436160B2 (de
DE2436160A1 (de
Inventor
Yasushi Akishima Tokio Kokubo (Japan)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8466273A external-priority patent/JPS5329472B2/ja
Priority claimed from JP48141620A external-priority patent/JPS5093078A/ja
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Publication of DE2436160A1 publication Critical patent/DE2436160A1/de
Publication of DE2436160B2 publication Critical patent/DE2436160B2/de
Application granted granted Critical
Publication of DE2436160C3 publication Critical patent/DE2436160C3/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/2447—Imaging plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE2436160A 1973-07-27 1974-07-26 Rasterelektronenmikroskop Expired DE2436160C3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8466273A JPS5329472B2 (enrdf_load_stackoverflow) 1973-07-27 1973-07-27
JP48141620A JPS5093078A (enrdf_load_stackoverflow) 1973-12-17 1973-12-17

Publications (3)

Publication Number Publication Date
DE2436160A1 DE2436160A1 (de) 1975-02-20
DE2436160B2 DE2436160B2 (de) 1978-03-23
DE2436160C3 true DE2436160C3 (de) 1978-11-23

Family

ID=26425657

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2436160A Expired DE2436160C3 (de) 1973-07-27 1974-07-26 Rasterelektronenmikroskop

Country Status (3)

Country Link
US (1) US4068123A (enrdf_load_stackoverflow)
DE (1) DE2436160C3 (enrdf_load_stackoverflow)
FR (1) FR2220871B1 (enrdf_load_stackoverflow)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2297452A1 (fr) * 1975-01-08 1976-08-06 Commissariat Energie Atomique Dispositif de controle de balayage d'une cible par un faisceau de particules
DE2652273C2 (de) * 1976-11-12 1978-11-02 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur bildlichen Darstellung eines Beugungsbildes bei einem Durchstrahlungs-Raster-Korpuskularstrahlmikroskop
NL7804037A (nl) * 1978-04-17 1979-10-19 Philips Nv Elektronenmikroskoop met ongedifferentieerde fase- beeldvorming.
FR2441182A1 (fr) * 1978-11-07 1980-06-06 Thomson Csf Dispositif de visualisation de la repartition de la densite du courant au sein d'un faisceau de particules chargees
US4439680A (en) * 1980-06-26 1984-03-27 Regents Of The University Of Minnesota Color-coded mapping system and method for identifying elements in a specimen
JPS5780649A (en) * 1980-11-10 1982-05-20 Hitachi Ltd Electron ray energy analyzer
JPS58152354A (ja) * 1982-03-05 1983-09-09 Hitachi Ltd 電子顕微鏡の軸調整装置
US4514629A (en) * 1982-07-07 1985-04-30 National Research Development Corporation Scanning transmission electron microscopes
DE3602366A1 (de) * 1986-01-27 1987-07-30 Siemens Ag Verfahren und anordnung zum nachweis der auf einer probe von einem primaeren korpuskularstrahl ausgeloesten sekundaerkorpuskeln
US4897545A (en) * 1987-05-21 1990-01-30 Electroscan Corporation Electron detector for use in a gaseous environment
JPS6482445A (en) * 1987-09-25 1989-03-28 Hitachi Ltd Charged particle detector
JPH07105209B2 (ja) * 1988-04-28 1995-11-13 株式会社日立製作所 電子顕微鏡
JP2602287B2 (ja) * 1988-07-01 1997-04-23 株式会社日立製作所 Ｘ線マスクの欠陥検査方法及びその装置
JPH0233843A (ja) * 1988-07-25 1990-02-05 Hitachi Ltd 走査電子顕微鏡
US5093573A (en) * 1990-06-04 1992-03-03 Nobuo Mikoshiba Reflection electron diffractometer and method for observing microscopic surface structure
JP3287858B2 (ja) * 1991-05-15 2002-06-04 株式会社日立製作所 電子顕微鏡装置及び電子顕微方法
US5866905A (en) * 1991-05-15 1999-02-02 Hitachi, Ltd. Electron microscope
US5384463A (en) * 1991-06-10 1995-01-24 Fujisu Limited Pattern inspection apparatus and electron beam apparatus
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
EP0518633B1 (en) * 1991-06-10 1997-11-12 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5212383A (en) * 1991-07-29 1993-05-18 David Scharf Color synthesizing scanning electron microscope
DE10156275B4 (de) * 2001-11-16 2006-08-03 Leo Elektronenmikroskopie Gmbh Detektoranordnung und Detektionsverfahren
GB2393571B (en) * 2002-09-26 2007-03-21 Leo Electron Microscopy Ltd Improvements in and relating to the control of instruments
US7872236B2 (en) * 2007-01-30 2011-01-18 Hermes Microvision, Inc. Charged particle detection devices
ITBO20070409A1 (it) * 2007-06-11 2008-12-12 C N R Consiglio Naz Delle Ri C Dispositivo rivelatore per microscopio elettronico.
US7960697B2 (en) * 2008-10-23 2011-06-14 Hermes-Microvision, Inc. Electron beam apparatus
US7919760B2 (en) * 2008-12-09 2011-04-05 Hermes-Microvision, Inc. Operation stage for wafer edge inspection and review
US8094924B2 (en) * 2008-12-15 2012-01-10 Hermes-Microvision, Inc. E-beam defect review system
US20140027632A1 (en) * 2012-07-26 2014-01-30 Gatan, Inc. System and method for measuring angular luminescence in a charged particle microscope
US9177758B2 (en) * 2013-03-25 2015-11-03 Hermes Microvision Inc. Charged particle beam apparatus
US9190241B2 (en) 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
JP7431136B2 (ja) * 2020-10-09 2024-02-14 株式会社日立ハイテク 荷電粒子線装置、及び制御方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3473023A (en) * 1967-02-01 1969-10-14 Rupert Bloch Process for a linear analysis of surfaces of structurally heterogeneous metallic or non-metallic substances
DE1639280C3 (de) * 1967-03-30 1974-01-31 Takeo Kawasaki Kanagawa Ichinokawa (Japan) Elektronenmikroskop mit einer magnetischen Zylinderlinse zur Energieanalyse der Elektronen
NL7100609A (enrdf_load_stackoverflow) * 1970-02-07 1971-08-10
US3626184A (en) * 1970-03-05 1971-12-07 Atomic Energy Commission Detector system for a scanning electron microscope
US3812288A (en) * 1972-11-21 1974-05-21 Edax Int Inc Television display system

Also Published As

Publication number Publication date
FR2220871A1 (enrdf_load_stackoverflow) 1974-10-04
DE2436160B2 (de) 1978-03-23
DE2436160A1 (de) 1975-02-20
US4068123A (en) 1978-01-10
FR2220871B1 (enrdf_load_stackoverflow) 1978-01-20

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
8328 Change in the person/name/address of the agent

Free format text: LIEDL, G., DIPL.-PHYS., PAT.-ANW., 8000 MUENCHEN

8339 Ceased/non-payment of the annual fee