NL7100609A - - Google Patents

Info

Publication number
NL7100609A
NL7100609A NL7100609A NL7100609A NL7100609A NL 7100609 A NL7100609 A NL 7100609A NL 7100609 A NL7100609 A NL 7100609A NL 7100609 A NL7100609 A NL 7100609A NL 7100609 A NL7100609 A NL 7100609A
Authority
NL
Netherlands
Application number
NL7100609A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP45010813A external-priority patent/JPS4831685B1/ja
Priority claimed from JP45026777A external-priority patent/JPS498449B1/ja
Application filed filed Critical
Publication of NL7100609A publication Critical patent/NL7100609A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H01J37/292—Reflection microscopes using scanning ray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2444—Electron Multiplier
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
NL7100609A 1970-02-07 1971-01-18 NL7100609A (enrdf_load_stackoverflow)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP45010813A JPS4831685B1 (enrdf_load_stackoverflow) 1970-02-07 1970-02-07
JP45026777A JPS498449B1 (enrdf_load_stackoverflow) 1970-03-30 1970-03-30

Publications (1)

Publication Number Publication Date
NL7100609A true NL7100609A (enrdf_load_stackoverflow) 1971-08-10

Family

ID=26346152

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7100609A NL7100609A (enrdf_load_stackoverflow) 1970-02-07 1971-01-18

Country Status (4)

Country Link
US (1) US3714425A (enrdf_load_stackoverflow)
DE (1) DE2105455A1 (enrdf_load_stackoverflow)
GB (1) GB1351513A (enrdf_load_stackoverflow)
NL (1) NL7100609A (enrdf_load_stackoverflow)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1447983A (en) * 1973-01-10 1976-09-02 Nat Res Dev Detector for electron microscopes
US4068123A (en) * 1973-07-27 1978-01-10 Nihon Denshi Kabushiki Kaisha Scanning electron microscope
JPS5243058B2 (enrdf_load_stackoverflow) * 1974-04-22 1977-10-28
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
DE3888712D1 (de) * 1987-02-02 1994-05-05 Integrated Circuit Testing Detektorobjectiv für Rastermikroskope.
JP2927627B2 (ja) * 1992-10-20 1999-07-28 株式会社日立製作所 走査電子顕微鏡
DE69638126D1 (de) * 1995-10-19 2010-04-01 Hitachi Ltd Rasterelektronenmikroskop
DE19543652C1 (de) * 1995-11-23 1997-01-09 Focus Gmbh Reflexionselektronenmikroskop
WO1999009582A1 (fr) 1997-08-19 1999-02-25 Nikon Corporation Dispositif et procede servant a observer un objet
JP3534582B2 (ja) * 1997-10-02 2004-06-07 株式会社日立製作所 パターン欠陥検査方法および検査装置
JP4093662B2 (ja) * 1999-01-04 2008-06-04 株式会社日立製作所 走査形電子顕微鏡
US6633034B1 (en) * 2000-05-04 2003-10-14 Applied Materials, Inc. Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
EP1255278B1 (en) * 2001-04-24 2005-06-15 Advantest Corporation Scanning particle mirror microscope
JP3996774B2 (ja) * 2002-01-09 2007-10-24 株式会社日立ハイテクノロジーズ パターン欠陥検査方法及びパターン欠陥検査装置
EP1389797B1 (en) * 2002-08-13 2008-10-08 Carl Zeiss NTS GmbH Particle-optical apparatus and its use as an electron microscopy system
US7138629B2 (en) 2003-04-22 2006-11-21 Ebara Corporation Testing apparatus using charged particles and device manufacturing method using the testing apparatus
JP2004363085A (ja) * 2003-05-09 2004-12-24 Ebara Corp 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2464419A (en) * 1947-12-26 1949-03-15 Rca Corp Method of and apparatus for selectively achieving electronic darkfield and bright field illumation
US2901627A (en) * 1953-02-19 1959-08-25 Leitz Ernst Gmbh Method of and apparatus for the electronic magnification of objects
FR1306719A (fr) * 1961-09-07 1962-10-19 Csf Détection et mesure de faisceaux de particules d'énergie élevée
NL285495A (enrdf_load_stackoverflow) * 1961-11-18
GB1058037A (en) * 1964-11-03 1967-02-08 Jeol Ltd Electron beam apparatus
US3614311A (en) * 1968-02-28 1971-10-19 Hitachi Ltd Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device

Also Published As

Publication number Publication date
US3714425A (en) 1973-01-30
DE2105455A1 (de) 1971-08-19
GB1351513A (en) 1974-05-01

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