DE2314868A1 - Photolackzusammensetzung - Google Patents

Photolackzusammensetzung

Info

Publication number
DE2314868A1
DE2314868A1 DE19732314868 DE2314868A DE2314868A1 DE 2314868 A1 DE2314868 A1 DE 2314868A1 DE 19732314868 DE19732314868 DE 19732314868 DE 2314868 A DE2314868 A DE 2314868A DE 2314868 A1 DE2314868 A1 DE 2314868A1
Authority
DE
Germany
Prior art keywords
azido
photoresist composition
composition according
iodide
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19732314868
Other languages
German (de)
English (en)
Inventor
Nicholas Jeffries Clecak
Robert James Cox
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE2314868A1 publication Critical patent/DE2314868A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B62/00—Reactive dyes, i.e. dyes which form covalent bonds with the substrates or which polymerise with themselves
    • C09B62/44—Reactive dyes, i.e. dyes which form covalent bonds with the substrates or which polymerise with themselves with the reactive group not directly attached to a heterocyclic ring
    • C09B62/78—Reactive dyes, i.e. dyes which form covalent bonds with the substrates or which polymerise with themselves with the reactive group not directly attached to a heterocyclic ring with other reactive groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Plural Heterocyclic Compounds (AREA)
DE19732314868 1972-03-30 1973-03-26 Photolackzusammensetzung Pending DE2314868A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23979472A 1972-03-30 1972-03-30

Publications (1)

Publication Number Publication Date
DE2314868A1 true DE2314868A1 (de) 1973-10-04

Family

ID=22903773

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19732314868 Pending DE2314868A1 (de) 1972-03-30 1973-03-26 Photolackzusammensetzung

Country Status (3)

Country Link
JP (1) JPS5617655B2 (enExample)
DE (1) DE2314868A1 (enExample)
FR (1) FR2177770A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0154994A3 (en) * 1984-03-13 1986-01-22 Asahi Kasei Kogyo Kabushiki Kaisha A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5255399U (enExample) * 1975-10-16 1977-04-21
JPS5494499U (enExample) * 1977-11-09 1979-07-04
JPS6278986U (enExample) * 1985-11-07 1987-05-20

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0154994A3 (en) * 1984-03-13 1986-01-22 Asahi Kasei Kogyo Kabushiki Kaisha A photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method
US4716094A (en) * 1984-03-13 1987-12-29 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive resin composition which is improved with respect to surface tack-free characteristic after curing, and a method

Also Published As

Publication number Publication date
FR2177770B1 (enExample) 1979-01-19
JPS5617655B2 (enExample) 1981-04-23
JPS4917223A (enExample) 1974-02-15
FR2177770A1 (en) 1973-11-09

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