DE2030688A1 - Vorrichtung zum Aufdampfen von Gut auf eine laufende Matenalbahn - Google Patents

Vorrichtung zum Aufdampfen von Gut auf eine laufende Matenalbahn

Info

Publication number
DE2030688A1
DE2030688A1 DE19702030688 DE2030688A DE2030688A1 DE 2030688 A1 DE2030688 A1 DE 2030688A1 DE 19702030688 DE19702030688 DE 19702030688 DE 2030688 A DE2030688 A DE 2030688A DE 2030688 A1 DE2030688 A1 DE 2030688A1
Authority
DE
Germany
Prior art keywords
conveyor
vessels
material web
evaporated
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19702030688
Other languages
German (de)
English (en)
Inventor
Thomas Cherry Hill N J Welch William Edward Abington Pa Mackrael, (V St A)
Original Assignee
Pennwalt Corp , Philadelphia, Pa (VStA)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pennwalt Corp , Philadelphia, Pa (VStA) filed Critical Pennwalt Corp , Philadelphia, Pa (VStA)
Publication of DE2030688A1 publication Critical patent/DE2030688A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE19702030688 1969-06-25 1970-06-22 Vorrichtung zum Aufdampfen von Gut auf eine laufende Matenalbahn Pending DE2030688A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US83633469A 1969-06-25 1969-06-25

Publications (1)

Publication Number Publication Date
DE2030688A1 true DE2030688A1 (de) 1971-01-14

Family

ID=25271741

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702030688 Pending DE2030688A1 (de) 1969-06-25 1970-06-22 Vorrichtung zum Aufdampfen von Gut auf eine laufende Matenalbahn

Country Status (4)

Country Link
US (1) US3563202A (enExample)
DE (1) DE2030688A1 (enExample)
FR (1) FR2052433A5 (enExample)
NL (1) NL7007310A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0121443A3 (en) * 1983-04-04 1985-01-09 Energy Conversion Devices, Inc. Apparatus for and method of continuously depositing a highly conductive, highly transmissive film
FR2611746A1 (fr) * 1987-03-06 1988-09-09 Centre Nat Etd Spatiales Dispositif d'evaporation sous vide d'un metal en continu
EP0474964A3 (en) * 1990-08-27 1992-04-08 Leybold Aktiengesellschaft Apparatus for continuous coating of strip substrates

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3908585A (en) * 1974-04-25 1975-09-30 Goodyear Tire & Rubber Apparatus using super-heated vapor for drying solvent-treated tire cord fabric
US4023523A (en) * 1975-04-23 1977-05-17 Xerox Corporation Coater hardware and method for obtaining uniform photoconductive layers on a xerographic photoreceptor
DE2916080C2 (de) * 1979-04-20 1984-12-06 Kišinevskij Gosudarstvennyj universitet imeni V.I. Lenina, Kišinev Verfahren zum Molekular-Aufdampfen von Halbleiterschichten und Vorrichtung zur Durchführung dieses Verfahrens
DE3530106A1 (de) * 1985-08-23 1987-02-26 Kempten Elektroschmelz Gmbh Aufdampfgut zum aufdampfen anorganischer verbindungen mittels einer photonen-erzeugenden strahlungsheizquelle in kontinuierlich betriebenen vakuumbedampfungsanlagen
US4776299A (en) * 1986-05-15 1988-10-11 The United States Of America As Represented By The United States Department Of Energy Source replenishment device for vacuum deposition
JP2612602B2 (ja) * 1987-12-17 1997-05-21 東洋インキ製造 株式会社 連続蒸着フィルムの製造方法および装置
DE4016225C2 (de) * 1990-05-19 1997-08-14 Leybold Ag Reihenverdampfer für Vakuumbedampfungsanlagen
US5716206A (en) * 1995-01-05 1998-02-10 Sumitomo Wiring Systems, Ltd. Apparatus for heating a wire connection or connector
JP4906018B2 (ja) * 2001-03-12 2012-03-28 株式会社半導体エネルギー研究所 成膜方法、発光装置の作製方法及び成膜装置
DE102004047938B4 (de) * 2004-10-01 2008-10-23 Leybold Optics Gmbh Vorrichtung für die Verdampferbeschichtung eines bandförmigen Substrates
WO2007135870A1 (ja) * 2006-05-19 2007-11-29 Ulvac, Inc. 有機蒸着材料用蒸着装置、有機薄膜の製造方法
US8241938B2 (en) 2010-07-02 2012-08-14 Primestar Solar, Inc. Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device
US8236601B2 (en) * 2010-07-02 2012-08-07 Primestar Solar, Inc. Apparatus and methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device
KR101785562B1 (ko) 2010-10-18 2017-10-18 삼성디스플레이 주식회사 연속 증착이 가능한 박막 증착 장치 및 그 박막 증착 장치에 사용되는 마스크유닛과 도가니유닛
US20120090544A1 (en) * 2010-10-18 2012-04-19 Kim Mu-Gyeom Thin film deposition apparatus for continuous deposition, and mask unit and crucible unit included in thin film deposition apparatus
TWI425105B (zh) * 2011-09-20 2014-02-01 Ind Tech Res Inst 蒸鍍裝置以及蒸鍍機台
US8673777B2 (en) * 2011-09-30 2014-03-18 First Solar, Inc. In-line deposition system and process for deposition of a thin film layer
JP6595421B2 (ja) * 2016-08-24 2019-10-23 東芝メモリ株式会社 気化システム

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0121443A3 (en) * 1983-04-04 1985-01-09 Energy Conversion Devices, Inc. Apparatus for and method of continuously depositing a highly conductive, highly transmissive film
FR2611746A1 (fr) * 1987-03-06 1988-09-09 Centre Nat Etd Spatiales Dispositif d'evaporation sous vide d'un metal en continu
EP0283374A1 (fr) * 1987-03-06 1988-09-21 Centre National D'etudes Spatiales Dispositif d'évaporation sous vide d'un métal en continu
US4880960A (en) * 1987-03-06 1989-11-14 Centre National D'etudes Spatiales Continuous vacuum evaporation device for metal
EP0474964A3 (en) * 1990-08-27 1992-04-08 Leybold Aktiengesellschaft Apparatus for continuous coating of strip substrates

Also Published As

Publication number Publication date
NL7007310A (enExample) 1970-12-29
FR2052433A5 (enExample) 1971-04-09
US3563202A (en) 1971-02-16

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