JP6595421B2 - 気化システム - Google Patents
気化システム Download PDFInfo
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- JP6595421B2 JP6595421B2 JP2016163976A JP2016163976A JP6595421B2 JP 6595421 B2 JP6595421 B2 JP 6595421B2 JP 2016163976 A JP2016163976 A JP 2016163976A JP 2016163976 A JP2016163976 A JP 2016163976A JP 6595421 B2 JP6595421 B2 JP 6595421B2
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- container
- solid material
- vaporizer
- containers
- vaporization system
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Immunology (AREA)
- Pathology (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Description
図1は、第1実施形態に係る気化システムの内部構成を示す斜視図である。図1に示すように、本実施形態に係る気化システム10は、本体1と、気化器2と、移動機構3と、供給部4と、回収部5と、を備える。
図8は、第1実施形態の変形例に係る気化器の構成を示す斜視図である。図8に示す気化器2aでは、筐体22の開口面が、複数の開口部22aに仕切られている。複数の容器21は、第1位置と第2位置との間を移動中に複数の開口部22aを個別に通過する。本変形例では、各容器21が各開口部22aを通過するときに、各容器の上端開口面21aが、各開口部22aの上縁22bに対して平行移動する。
図9は、第2実施形態に係る気化システムの構成を概略的に示す図である。以下、上述した第1実施形態に係る気化システム10と同様の構成要素には同じ符号を付し、詳細な説明を省略する。図9に示すように、本実施形態に係る気化システム20では、円筒状の本体11の中に、気化器12および移動機構13が収容されている。
Claims (6)
- 粉状の固体材料を収容可能な複数の容器を有する気化器と、
前記複数の容器に収容された前記固体材料の残量を個別に検出するセンサと、
前記センサの検出結果に基づいて、前記複数の容器を、前記気化器の中に位置する第1位置と前記気化器の外に位置する第2位置との間で個別に移動させる移動機構と、
前記複数の容器のうち、前記第2位置に位置する容器へ前記固体材料を供給する供給部と、
前記気化器の下方で前記供給部に対向し、前記固体材料を回収可能な回収部であって、前記供給部と交換可能な回収部と、
を備える気化システム。 - 前記移動機構は、前記複数の容器のうち、前記残量が所定量よりも少なくなった容器を前記第1位置から前記第2位置へ移動させ、その後、所定時間が経過したときに、当該容器を前記第2位置から前記第1位置へ移動させる、請求項1に記載の気化システム。
- 前記複数の容器が、前記気化器の中で積み重ねられ、
前記供給部は、前記気化器の上方に配置される、請求項1または2に記載の気化システム。 - 前記気化器は、筐体をさらに有し、前記筐体は、前記複数の容器が前記第1位置と前記第2位置との間の移動中に個別に通過する複数の開口部を有し、
前記複数の容器の上端開口面は、各開口部の上縁に対して平行移動する、請求項3に記載の気化システム。 - 前記移動機構が、前記第1位置と前記第2位置との間で前記複数の容器を個別に往復直線運動させる複数のクランク機構と、前記センサの検出結果に基づいて前記複数のクランク機構を制御する制御部と、を有する、請求項1から4のいずれかに記載の気化システム。
- 前記移動機構が、前記第1位置から前記第2位置まで前記複数の容器を回転移動させる回転軸と、前記センサの検出結果に基づいて前記回転軸を制御する制御部と、を有する請求項1から5のいずれかに記載の気化システム。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016163976A JP6595421B2 (ja) | 2016-08-24 | 2016-08-24 | 気化システム |
US15/430,809 US10669621B2 (en) | 2016-08-24 | 2017-02-13 | Vaporization system |
Applications Claiming Priority (1)
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---|---|---|---|
JP2016163976A JP6595421B2 (ja) | 2016-08-24 | 2016-08-24 | 気化システム |
Publications (2)
Publication Number | Publication Date |
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JP2018031059A JP2018031059A (ja) | 2018-03-01 |
JP6595421B2 true JP6595421B2 (ja) | 2019-10-23 |
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JP2016163976A Active JP6595421B2 (ja) | 2016-08-24 | 2016-08-24 | 気化システム |
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US (1) | US10669621B2 (ja) |
JP (1) | JP6595421B2 (ja) |
Families Citing this family (1)
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US20210123134A1 (en) * | 2019-10-24 | 2021-04-29 | Entegris, Inc. | Sublimation ampoule with level sensing |
Family Cites Families (23)
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US3563202A (en) * | 1969-06-25 | 1971-02-16 | Pennwalt Corp | Mobile vbaporative firing source |
US4016310A (en) * | 1975-04-23 | 1977-04-05 | Xerox Corporation | Coater hardware and method for obtaining uniform photoconductive layers on a xerographic photoreceptor |
US4242982A (en) * | 1978-05-25 | 1981-01-06 | International Standard Electric Corporation | Apparatus for metal coating of powders |
US4817557A (en) * | 1983-05-23 | 1989-04-04 | Anicon, Inc. | Process and apparatus for low pressure chemical vapor deposition of refractory metal |
JP3466818B2 (ja) | 1996-07-05 | 2003-11-17 | キヤノン株式会社 | 真空成膜プロセス装置及び該装置用の搬送キャリア兼マスキング部材 |
UA71572C2 (uk) * | 1999-08-04 | 2004-12-15 | Дженерал Електрік Компані | Електронно-променевий пристрій для нанесення покриття на вироби конденсацією із парової фази |
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US8268078B2 (en) | 2006-03-16 | 2012-09-18 | Tokyo Electron Limited | Method and apparatus for reducing particle contamination in a deposition system |
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JP2010144221A (ja) * | 2008-12-18 | 2010-07-01 | Tokyo Electron Ltd | 原料ガス発生装置及び成膜装置 |
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WO2010123004A1 (ja) * | 2009-04-21 | 2010-10-28 | 株式会社アルバック | 真空蒸着システム及び真空蒸着方法 |
US20120027921A1 (en) * | 2010-12-22 | 2012-02-02 | Primestar Solar, Inc. | Vapor deposition apparatus and process for continuous deposition of a thin film layer on a substrate |
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US10385452B2 (en) * | 2012-05-31 | 2019-08-20 | Entegris, Inc. | Source reagent-based delivery of fluid with high material flux for batch deposition |
CN104789930B (zh) * | 2015-04-24 | 2016-05-11 | 京东方科技集团股份有限公司 | 蒸镀设备及采用该蒸镀设备的操作方法 |
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JP2018031059A (ja) | 2018-03-01 |
US20180057926A1 (en) | 2018-03-01 |
US10669621B2 (en) | 2020-06-02 |
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