DE2003576A1 - Optoelektrisches Schreibsystem - Google Patents

Optoelektrisches Schreibsystem

Info

Publication number
DE2003576A1
DE2003576A1 DE19702003576 DE2003576A DE2003576A1 DE 2003576 A1 DE2003576 A1 DE 2003576A1 DE 19702003576 DE19702003576 DE 19702003576 DE 2003576 A DE2003576 A DE 2003576A DE 2003576 A1 DE2003576 A1 DE 2003576A1
Authority
DE
Germany
Prior art keywords
writing system
deflection unit
unit
plate
displacement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19702003576
Other languages
German (de)
English (en)
Inventor
Raymond Marcy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of DE2003576A1 publication Critical patent/DE2003576A1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/083—Devices involving movement of the workpiece in at least one axial direction
    • B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25H—WORKSHOP EQUIPMENT, e.g. FOR MARKING-OUT WORK; STORAGE MEANS FOR WORKSHOPS
    • B25H7/00—Marking-out or setting-out work
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G02F1/31—Digital deflection, i.e. optical switching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70466—Multiple exposures, e.g. combination of fine and coarse exposures, double patterning or multiple exposures for printing a single feature
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K1/00—Methods or arrangements for marking the record carrier in digital fashion
    • G06K1/12—Methods or arrangements for marking the record carrier in digital fashion otherwise than by punching
    • G06K1/126—Methods or arrangements for marking the record carrier in digital fashion otherwise than by punching by photographic or thermographic registration

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Plasma & Fusion (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE19702003576 1969-01-29 1970-01-27 Optoelektrisches Schreibsystem Pending DE2003576A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR6901745A FR2030468A5 (enExample) 1969-01-29 1969-01-29

Publications (1)

Publication Number Publication Date
DE2003576A1 true DE2003576A1 (de) 1970-07-30

Family

ID=9028320

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19702003576 Pending DE2003576A1 (de) 1969-01-29 1970-01-27 Optoelektrisches Schreibsystem

Country Status (4)

Country Link
US (1) US3632205A (enExample)
DE (1) DE2003576A1 (enExample)
FR (1) FR2030468A5 (enExample)
GB (1) GB1291557A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0154279A3 (en) * 1984-03-01 1986-04-30 Laser Photonics, Inc. Laser beam scanning device and marking system

Families Citing this family (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4120583A (en) * 1970-12-28 1978-10-17 Hyatt Gilbert P High registration photomask method and apparatus
US4445776A (en) * 1980-09-29 1984-05-01 High resistration photomask machine and computerized numerical control system
DE2134144A1 (de) * 1970-07-09 1972-01-20 Thomson Csf Opto-elektrisches Schreibsystem zur Herstellung von Mikroschaltungen
FR2135425B1 (enExample) * 1971-05-04 1973-08-10 Thomson Csf
US3745897A (en) * 1971-06-21 1973-07-17 Ibm Mask bit error indicator
US4110762A (en) * 1974-05-10 1978-08-29 Commissariat A L'energie Atomique Drawing machines especially for integrated circuit masks
SE399628B (sv) * 1975-02-13 1978-02-20 Westerberg Erik Gerhard Natana Drivanordning, speciellt for anvendning vid en avsokningsanordning for framstellning av masker for mikrokretsar
DE2511390C2 (de) * 1975-03-15 1984-03-15 Agfa-Gevaert Ag, 5090 Leverkusen Verfahren und Vorrichtung zur Herstellung von Tageslichtprojektionsschirmen sowie nach diesem Verfahren hergestellter Tageslichtprojektionsschirm
US4190759A (en) * 1975-08-27 1980-02-26 Hitachi, Ltd. Processing of photomask
FR2330030A1 (fr) * 1975-10-31 1977-05-27 Thomson Csf Nouvel appareil photorepeteur de masques de haute precision
US4110594A (en) * 1976-12-13 1978-08-29 International Business Machines Corporation Pattern mask generating method and apparatus
FR2388300A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Dispositif optique de projection de motifs comportant un asservissement de focalisation a grandissement constant
US4262186A (en) * 1977-10-27 1981-04-14 Rohr Industries, Inc. Laser chem-milling method, apparatus and structure resulting therefrom
US4167662A (en) * 1978-03-27 1979-09-11 National Research Development Corporation Methods and apparatus for cutting and welding
US4266548A (en) * 1978-12-18 1981-05-12 Davi S K Apparatus for and method of utilizing energy to excise pathological tissue
US4469098A (en) * 1978-12-18 1984-09-04 Davi Samantha K Apparatus for and method of utilizing energy to excise pathological tissue
USRE33931E (en) * 1981-12-21 1992-05-19 American Semiconductor Equipment Technologies Laser pattern generating system
US4541712A (en) * 1981-12-21 1985-09-17 Tre Semiconductor Equipment Corporation Laser pattern generating system
FR2519156A1 (fr) * 1981-12-28 1983-07-01 Thomson Csf Dispositif optique a source d'energie radiante pour le transfert de motifs sur un substrat et procede de mise en oeuvre
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
IL66817A0 (en) * 1982-09-16 1982-12-31 Gaz Moshe Special visual and sound effects in cinematography using beam lasers on positive and negative copies
FR2536872A1 (fr) * 1982-11-29 1984-06-01 Cii Honeywell Bull Generateur de motifs pour circuits integres et procede de generation de motifs utilisant ce generateur
US4822975A (en) * 1984-01-30 1989-04-18 Canon Kabushiki Kaisha Method and apparatus for scanning exposure
US4773750A (en) * 1984-06-21 1988-09-27 Bruning John H Deep-UV lithography
DE3447405A1 (de) * 1984-12-24 1986-07-03 Winkler & Dünnebier, Maschinenfabrik und Eisengießerei GmbH & Co KG, 5450 Neuwied Vorrichtung zum formbrennschneiden einer bewegten materialbahn mittels eines laserstrahls
DE3624163C2 (de) * 1985-07-24 2001-05-17 Ateq Corp Gerät zur Erzeugung eines Musters auf einem eine strahlungsempfindliche Schicht aufweisenden Werkstück
US4796038A (en) * 1985-07-24 1989-01-03 Ateq Corporation Laser pattern generation apparatus
US4799210A (en) * 1986-11-05 1989-01-17 Unisys Corporation Fiber optic read/write head for an optical disk memory system
US4822987A (en) * 1988-01-25 1989-04-18 Westinghouse Electric Corp. Method and apparatus for providing fuel rod identification to permit traceability during manufacture and use
US4960984A (en) * 1988-02-04 1990-10-02 Westinghouse Electric Corp. Method and apparatus for reading lased bar codes on shiny-finished fuel rod cladding tubes
BG46808A1 (en) * 1988-05-27 1990-03-15 Univ Plovdivski Device for laser engraving
US4940508A (en) * 1989-06-26 1990-07-10 Digital Equipment Corporation Apparatus and method for forming die sites in a high density electrical interconnecting structure
US5120136A (en) * 1989-09-12 1992-06-09 Lasertape Systems, Inc. Optical tape recorder having an acousto-optic device for scanning a radiant energy beam onto a media
US5315111A (en) * 1992-10-15 1994-05-24 Lasa Industries, Inc. Method and apparatus for laser beam drift compensation
DE4326874C3 (de) * 1993-08-11 1999-11-25 Benecke Kaliko Ag Verfahren zum Gravieren eines Musters in eine Oberfläche eines Werkstücks
DE69600131T2 (de) * 1995-04-19 1998-07-23 Gerber Garment Technology Inc Laserschneidgerät und Verfahren zum Schneiden von Flachmaterial
US6555449B1 (en) * 1996-05-28 2003-04-29 Trustees Of Columbia University In The City Of New York Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidfication
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
SE514835C2 (sv) * 1999-01-21 2001-04-30 Micronic Laser Systems Ab System och metod för mikrolitografiskt skrivande
US6368945B1 (en) * 2000-03-16 2002-04-09 The Trustees Of Columbia University In The City Of New York Method and system for providing a continuous motion sequential lateral solidification
US6830993B1 (en) * 2000-03-21 2004-12-14 The Trustees Of Columbia University In The City Of New York Surface planarization of thin silicon films during and after processing by the sequential lateral solidification method
AU2002211507A1 (en) * 2000-10-10 2002-04-22 The Trustees Of Columbia University In The City Of New York Method and apparatus for processing thin metal layers
JP4583709B2 (ja) * 2000-11-27 2010-11-17 ザ・トラスティーズ・オブ・コロンビア・ユニバーシティ・イン・ザ・シティ・オブ・ニューヨーク 基板上の半導体膜領域のレーザー結晶化処理のための方法及びマスク投影装置
US6538230B2 (en) * 2001-05-17 2003-03-25 Preco Laser Systems, Llc Method and apparatus for improving laser hole resolution
KR100916281B1 (ko) * 2001-08-27 2009-09-10 더 트러스티스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 미세구조의 임의 배치를 통하여 다결정성 박막 트랜지스터균일성을 향상시키는 방법
AU2003220611A1 (en) * 2002-04-01 2003-10-20 The Trustees Of Columbia University In The City Of New York Method and system for providing a thin film
AU2003258288A1 (en) * 2002-08-19 2004-03-03 The Trustees Of Columbia University In The City Of New York Process and system for processing a thin film sample and thin film structure
AU2003272222A1 (en) * 2002-08-19 2004-03-03 The Trustees Of Columbia University In The City Of New York Process and system for laser crystallization processing of film regions on a substrate to minimize edge areas, and structure of such film regions
TWI331803B (en) * 2002-08-19 2010-10-11 Univ Columbia A single-shot semiconductor processing system and method having various irradiation patterns
KR101058464B1 (ko) * 2002-08-19 2011-08-24 더 트러스티스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 기판상의 필름영역과 그 에지영역에서의 실질적인 균일성을제공하기 위한 필름영역의 레이저 결정 가공을 위한 방법과 시스템 및 그 필름영역을 가진 구조물
KR101191837B1 (ko) * 2003-02-19 2012-10-18 더 트러스티스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 순차적 측면 고상화 기술을 이용하여 결정화되는 복수의 반도체 박막을 가공하는 방법 및 장치
WO2005029546A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Method and system for providing a continuous motion sequential lateral solidification for reducing or eliminating artifacts, and a mask for facilitating such artifact reduction/elimination
US7318866B2 (en) * 2003-09-16 2008-01-15 The Trustees Of Columbia University In The City Of New York Systems and methods for inducing crystallization of thin films using multiple optical paths
WO2005029547A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Enhancing the width of polycrystalline grains with mask
US7364952B2 (en) * 2003-09-16 2008-04-29 The Trustees Of Columbia University In The City Of New York Systems and methods for processing thin films
WO2005029549A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Method and system for facilitating bi-directional growth
WO2005029550A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York Method and system for producing crystalline thin films with a uniform crystalline orientation
WO2005029548A2 (en) * 2003-09-16 2005-03-31 The Trustees Of Columbia University In The City Of New York System and process for providing multiple beam sequential lateral solidification
US7164152B2 (en) * 2003-09-16 2007-01-16 The Trustees Of Columbia University In The City Of New York Laser-irradiated thin films having variable thickness
TWI359441B (en) 2003-09-16 2012-03-01 Univ Columbia Processes and systems for laser crystallization pr
US7311778B2 (en) 2003-09-19 2007-12-25 The Trustees Of Columbia University In The City Of New York Single scan irradiation for crystallization of thin films
US7645337B2 (en) * 2004-11-18 2010-01-12 The Trustees Of Columbia University In The City Of New York Systems and methods for creating crystallographic-orientation controlled poly-silicon films
US8221544B2 (en) * 2005-04-06 2012-07-17 The Trustees Of Columbia University In The City Of New York Line scan sequential lateral solidification of thin films
EP1927127A2 (en) * 2005-08-16 2008-06-04 The Trustees of Columbia University in the City of New York High throughput crystallization of thin films
CN101617069B (zh) * 2005-12-05 2012-05-23 纽约市哥伦比亚大学理事会 处理膜的系统和方法以及薄膜
TW200942935A (en) 2007-09-21 2009-10-16 Univ Columbia Collections of laterally crystallized semiconductor islands for use in thin film transistors and systems and methods for making same
KR20100074179A (ko) 2007-09-25 2010-07-01 더 트러스티이스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 측방향으로 결정화된 박막상에 제조된 박막 트랜지스터 장치에 높은 균일성을 생산하기 위한 방법
KR20100105606A (ko) * 2007-11-21 2010-09-29 더 트러스티이스 오브 콜롬비아 유니버시티 인 더 시티 오브 뉴욕 에피택셜하게 텍스쳐화된 후막의 제조를 위한 시스템 및 방법
WO2009067688A1 (en) 2007-11-21 2009-05-28 The Trustees Of Columbia University In The City Of New York Systems and methods for preparing epitaxially textured polycrystalline films
US8012861B2 (en) 2007-11-21 2011-09-06 The Trustees Of Columbia University In The City Of New York Systems and methods for preparing epitaxially textured polycrystalline films
US8569155B2 (en) * 2008-02-29 2013-10-29 The Trustees Of Columbia University In The City Of New York Flash lamp annealing crystallization for large area thin films
US20110108108A1 (en) * 2008-02-29 2011-05-12 The Trustees Of Columbia University In The City Of Flash light annealing for thin films
WO2009108936A1 (en) * 2008-02-29 2009-09-03 The Trustees Of Columbia University In The City Of New York Lithographic method of making uniform crystalline si films
RU2372634C1 (ru) * 2008-03-17 2009-11-10 Общество с ограниченной ответственностью "ИМТ Групп" Устройство для нанесения информации на пленку
US7929660B2 (en) * 2008-07-18 2011-04-19 Xcounter Ab Support structure for mammography
US8802580B2 (en) * 2008-11-14 2014-08-12 The Trustees Of Columbia University In The City Of New York Systems and methods for the crystallization of thin films
US9646831B2 (en) 2009-11-03 2017-05-09 The Trustees Of Columbia University In The City Of New York Advanced excimer laser annealing for thin films
US8440581B2 (en) 2009-11-24 2013-05-14 The Trustees Of Columbia University In The City Of New York Systems and methods for non-periodic pulse sequential lateral solidification
US9087696B2 (en) 2009-11-03 2015-07-21 The Trustees Of Columbia University In The City Of New York Systems and methods for non-periodic pulse partial melt film processing

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1208407A (fr) * 1958-06-10 1960-02-23 Victor Bouzard Et Ses Fils Dispositif de commande automatique pour machines à copier photomécaniques, en particulier pour l'offset
US3524394A (en) * 1966-11-16 1970-08-18 Ibm Monolithic circuit manufacture and photoresist exposure technique utilized therein
FR1516152A (fr) * 1967-01-25 1968-03-08 Thomson Houston Comp Francaise Perfectionnements aux bancs photographiques répétiteurs
US3498711A (en) * 1967-10-18 1970-03-03 Texas Instruments Inc Step and repeat camera

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0154279A3 (en) * 1984-03-01 1986-04-30 Laser Photonics, Inc. Laser beam scanning device and marking system

Also Published As

Publication number Publication date
GB1291557A (en) 1972-10-04
US3632205A (en) 1972-01-04
FR2030468A5 (enExample) 1970-11-13

Similar Documents

Publication Publication Date Title
DE2003576A1 (de) Optoelektrisches Schreibsystem
EP0527166B1 (de) Belichtungsvorrichtung
DE2246152C2 (de) Verfahren und Vorrichtung zum gegenseitigen Ausrichten von Halbleiterplättchen und Masken
DE2503851C2 (de) Schaltung zur Ansteuerung einer Lichtquellenzeile zur gerasterten Reproduktion eines Bildes
DE2845603A1 (de) Verfahren und einrichtung zum projektionskopieren
DE2556151C2 (de) Vorrichtung zum automatischen programmierten Anfertigen von Zeichnungen auf einem Substrat mittels eines Teilchenbündels
DE1272583B (de) Verfahren zur photooptischen Aufzeichnung bzw. Speicherung von aus Einzelsymbolen bestehenden Informationen
DE69105167T2 (de) Laserbearbeitungsvorrichtung.
DE2822027C3 (de) Vorrichtung zur Scharfeinstellung des Objektivs einer einäugigen Spiegelreflexkamera
DE2535561C3 (de) Antriebseinrichtung für den Träger von Strahlumlenkmitteln bzw. des Werkstücks einer Laserbearbeitungsvorrichtung
DE2224083A1 (de) Photoelektrische Positioniereinrichtung
EP0004584B1 (de) Anordnung zur Messung der Entfernung oder Geschwindigkeit eines Gegenstandes, ihre Verwendung und Verfahren zu ihrem Betrieb
DE2221914A1 (de) Anordnung zur Aufzeichnung von Motiven auf einem lichtempfindlichen Traeger
DE3134705C2 (de) Aufzeichnungsgerät
DE1958663A1 (de) Verfahren und Vorrichtung zur photooptischen Herstellung von Halbleitererzeugnissen
DE69011178T2 (de) Faksimilegerät mit integrierter Optik.
DE2134144A1 (de) Opto-elektrisches Schreibsystem zur Herstellung von Mikroschaltungen
DE2836428A1 (de) Verfahren und vorrichtung zur automatischen scharfeinstellung von objektiven
DE1816198A1 (de) Einrichtung zum aufeinanderfolgenden Projizieren von Bildern,insbesondere fuer Photosetzeinrichtungen
DE2441472A1 (de) Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente
DE1932083A1 (de) Optische Anlage zum Speichern und Lesen von Informationen
DE2820482A1 (de) Servomechanismus fuer die scharfeinstellung
DE2264173A1 (de) Lichtstrahl-ablenkungssystem
DE102014203525A1 (de) Vorrichtung und Verfahren zur Bearbeitung eines Werkstückes
EP0627675A1 (de) Diffraktive optische Einrichtung zur optischen Abbildung eines Raumpunktes auf andere Raumpunkte