DE1926849A1 - Vorrichtung zur Registrierung mit Elektronenstrahlen - Google Patents

Vorrichtung zur Registrierung mit Elektronenstrahlen

Info

Publication number
DE1926849A1
DE1926849A1 DE19691926849 DE1926849A DE1926849A1 DE 1926849 A1 DE1926849 A1 DE 1926849A1 DE 19691926849 DE19691926849 DE 19691926849 DE 1926849 A DE1926849 A DE 1926849A DE 1926849 A1 DE1926849 A1 DE 1926849A1
Authority
DE
Germany
Prior art keywords
bundle
lenses
registration
organ
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19691926849
Other languages
German (de)
English (en)
Inventor
Fontijn Dipl-Phys Lee Antonius
Le Poole Jan Bart
Bok Dr-Ing Alfred Bram
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Original Assignee
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO filed Critical Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Publication of DE1926849A1 publication Critical patent/DE1926849A1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/151—Electrostatic means
    • H01J2237/1514—Prisms
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S101/00—Printing
    • Y10S101/37—Printing employing electrostatic force

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19691926849 1968-05-27 1969-05-27 Vorrichtung zur Registrierung mit Elektronenstrahlen Pending DE1926849A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6807439A NL6807439A (enrdf_load_stackoverflow) 1968-05-27 1968-05-27

Publications (1)

Publication Number Publication Date
DE1926849A1 true DE1926849A1 (de) 1969-12-11

Family

ID=19803740

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19691926849 Pending DE1926849A1 (de) 1968-05-27 1969-05-27 Vorrichtung zur Registrierung mit Elektronenstrahlen

Country Status (5)

Country Link
US (1) US3638231A (enrdf_load_stackoverflow)
CA (1) CA921548A (enrdf_load_stackoverflow)
DE (1) DE1926849A1 (enrdf_load_stackoverflow)
GB (1) GB1269156A (enrdf_load_stackoverflow)
NL (1) NL6807439A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1301030B (de) * 1967-10-19 1969-08-14 Hakle Werke Hans Klenk Halter fuer Papierrollen
FR2284186A1 (fr) * 1974-09-06 1976-04-02 Agency Ind Science Techn Appareil et procede pour former un modele de dessin desire sur un objet au moyen d'un faisceau de particules chargees
DE2647855A1 (de) * 1975-10-23 1977-05-05 Rikagaku Kenkyusho Verfahren zum projizieren eines buendels aus geladenen partikeln
FR2361190A1 (fr) * 1976-08-09 1978-03-10 Zeiss Carl Fa Procede et dispositif d'usinage a froid par faisceau electronique
FR2382091A1 (fr) * 1977-02-23 1978-09-22 Ibm Procede et dispositif de formation d'un faisceau electronique de taille variable
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4041532A (en) * 1971-04-28 1977-08-09 Decca Limited Of Decca House Method of recording wide-band signals on a thermoplastic film by use of a beam of electrons
US3750189A (en) * 1971-10-18 1973-07-31 Ibm Light scanning and printing system
DE2241850C3 (de) * 1972-08-25 1978-06-29 European Rotogravure Association, 8000 Muenchen Verfahren zur Herstellung von Druckformen mittels eines Energiestrahles
US4000440A (en) * 1974-07-26 1976-12-28 International Business Machines Corporation Method and apparatus for controlling brightness and alignment of a beam of charged particles
US4010318A (en) * 1975-05-20 1977-03-01 Rca Corporation Probe forming electron optical column having means for examining magnified image of the probe source
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
US4393312A (en) * 1976-02-05 1983-07-12 Bell Telephone Laboratories, Incorporated Variable-spot scanning in an electron beam exposure system
GB1523033A (en) * 1976-03-03 1978-08-31 Crosfield Electronics Ltd Image reproducing systems
JPS52126760U (enrdf_load_stackoverflow) * 1976-03-24 1977-09-27
JPS52122083A (en) * 1976-04-02 1977-10-13 Jeol Ltd Electron beam exposing device
NL177578C (nl) * 1976-05-14 1985-10-16 Thomson Csf Inrichting voor het beschrijven van een voorwerp met een deeltjesbundel.
JPS6051261B2 (ja) * 1976-05-26 1985-11-13 株式会社東芝 荷電粒子ビ−ム描画装置
JPS52151568A (en) * 1976-06-11 1977-12-16 Jeol Ltd Electron beam exposure apparatus
DE2627632A1 (de) * 1976-06-19 1977-12-22 Jenoptik Jena Gmbh Verfahren und einrichtung zur nichtthermischen elektronenstrahlbearbeitung
JPS5625233Y2 (enrdf_load_stackoverflow) * 1976-09-01 1981-06-15
JPS6040186B2 (ja) * 1976-11-04 1985-09-10 富士通株式会社 磁場形成装置
FR2412939A1 (fr) * 1977-12-23 1979-07-20 Anvar Implanteur d'ions a fort courant
US4277685A (en) * 1978-06-12 1981-07-07 Ohio-Nuclear, Inc. Adjustable collimator
JPS54101982U (enrdf_load_stackoverflow) * 1978-10-12 1979-07-18
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
DE2947444C2 (de) * 1979-11-24 1983-12-08 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Elektronenstrahl-Gravierverfahren
WO1982001787A1 (en) * 1980-11-22 1982-05-27 Grieger Dieter Method for engraving by means of an electron beam
US4445041A (en) * 1981-06-02 1984-04-24 Hewlett-Packard Company Electron beam blanker
NL8602196A (nl) * 1986-08-29 1988-03-16 Philips Nv Geladen deeltjes bestralingsapparaat met optisch vervormbaar bundel begrenzend diafragma.
GB8911392D0 (en) * 1989-05-18 1989-07-05 Humphreys Colin J Fabrication of electronic devices
WO2011071015A1 (ja) * 2009-12-11 2011-06-16 株式会社日立製作所 電子線バイプリズム装置および電子線装置
EP2365514B1 (en) * 2010-03-10 2015-08-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Twin beam charged particle column and method of operating thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3118050A (en) * 1960-04-06 1964-01-14 Alloyd Electronics Corp Electron beam devices and processes
US3113896A (en) * 1961-01-31 1963-12-10 Space Technology Lab Inc Electron beam masking for etching electrical circuits
DE1301209B (de) * 1964-07-24 1969-08-14 Steigerwald Strahltech Verfahren zum Abtragen, insbesondere zum Perforieren von flexiblen Kunststoffen
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1301030B (de) * 1967-10-19 1969-08-14 Hakle Werke Hans Klenk Halter fuer Papierrollen
FR2284186A1 (fr) * 1974-09-06 1976-04-02 Agency Ind Science Techn Appareil et procede pour former un modele de dessin desire sur un objet au moyen d'un faisceau de particules chargees
DE2647855A1 (de) * 1975-10-23 1977-05-05 Rikagaku Kenkyusho Verfahren zum projizieren eines buendels aus geladenen partikeln
FR2361190A1 (fr) * 1976-08-09 1978-03-10 Zeiss Carl Fa Procede et dispositif d'usinage a froid par faisceau electronique
FR2382091A1 (fr) * 1977-02-23 1978-09-22 Ibm Procede et dispositif de formation d'un faisceau electronique de taille variable
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen

Also Published As

Publication number Publication date
CA921548A (en) 1973-02-20
GB1269156A (en) 1972-04-06
NL6807439A (enrdf_load_stackoverflow) 1969-12-01
US3638231A (en) 1972-01-25

Similar Documents

Publication Publication Date Title
DE1926849A1 (de) Vorrichtung zur Registrierung mit Elektronenstrahlen
DE69432098T2 (de) Elektronenstrahl-Lithographie-System
DE2332091C2 (de) Verfahren zum Betrieb einer fokussierbaren und ausrichtbaren Elektronenstrahlprojektionsvorrichtung und dafür bestimmte Elektronenstrahlprojektionsvorrichtung
DE3011053C2 (de) Optisches System für eine Entfernungsmeßeinrichtung
DE3010945C2 (de) Verfahren und Vorrichtung zur Steuerung der Belichtung in einem photographischen Kopiergerät
DE1639464B2 (de) Kathodenstrahlroehre
DE2917163A1 (de) Optisches aufzeichnungssystem
DE2702445A1 (de) Korpuskularstrahloptisches geraet zur verkleinernden abbildung einer maske auf ein zu bestrahlendes praeparat
DE19848070A1 (de) Niedrigenergie-Elektronenstrahllithographie
DE2620262A1 (de) Rechner-gesteuertes elektronenstrahllithographie-verfahren
DE3307138A1 (de) Belichtungssystem mit einem strahl geladener teilchen
DE887685C (de) Elektronenmikroskop mit magnetischer Fokussierung
DE2106678A1 (de) Verfahren zur Herstellung einer gedruckten Magnetfeldspule
DE3215630A1 (de) Schattenprojektionssystem
DE2502591C2 (de) Verfahren und Vorrichtung zur Ermittlung einer Ausrichtmarkierung
DE2622064A1 (de) Belichtungsverfahren
DE10024634B4 (de) Elektronenstrahl-Belichtungsvorrichtung und -verfahren
DE2441288C2 (de) Korpuskularstrahlmikroskop, insbesondere elektronenmikroskop, mit verstelleinrichtungen zur aenderung der lage des abzubildenen objekts oder des objektbildes
DE1572868C3 (de) Vorrichtung zur vervielfachten Abbildung eines Musterbilds
DE2834391A1 (de) Einrichtung zur erzeugung von zeichenmustern auf einer objektflaeche mittels elektronenstrahlen
DE19915572A1 (de) Immersionslinse und Elektronenstrahl-Projektionssystem zu deren Anwendung
DE3601828A1 (de) Optisches lichtabtastsystem einer bildausgabe-abtastvorrichtung mit einem elektromechanischen lichtmodulator
DE3025830C2 (de) Verfahren und Vorrichtung zur Korrektur von Astigmatismus bei Raster-Elektronenmikroskopen und dergleichen
DE2805371A1 (de) Elektronenstrahlgeraet mit strahlfleckformung
DE1572821A1 (de) Optische Abbildungseinrichtung