DE1805861A1 - Verfahren zum Polieren von kristallinem Silicium und Mittel zu seiner Durchfuehrung - Google Patents

Verfahren zum Polieren von kristallinem Silicium und Mittel zu seiner Durchfuehrung

Info

Publication number
DE1805861A1
DE1805861A1 DE19681805861 DE1805861A DE1805861A1 DE 1805861 A1 DE1805861 A1 DE 1805861A1 DE 19681805861 DE19681805861 DE 19681805861 DE 1805861 A DE1805861 A DE 1805861A DE 1805861 A1 DE1805861 A1 DE 1805861A1
Authority
DE
Germany
Prior art keywords
hydroxide
alkaline earth
polishing
silicon
slurry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19681805861
Other languages
German (de)
English (en)
Inventor
Mcintyre Jun Glenn Hazel
Albanese Richard Philip
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tizon Chemical Corp
Original Assignee
Tizon Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tizon Chemical Corp filed Critical Tizon Chemical Corp
Publication of DE1805861A1 publication Critical patent/DE1805861A1/de
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
DE19681805861 1967-10-30 1968-10-29 Verfahren zum Polieren von kristallinem Silicium und Mittel zu seiner Durchfuehrung Pending DE1805861A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US67924867A 1967-10-30 1967-10-30

Publications (1)

Publication Number Publication Date
DE1805861A1 true DE1805861A1 (de) 1969-06-26

Family

ID=24726155

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19681805861 Pending DE1805861A1 (de) 1967-10-30 1968-10-29 Verfahren zum Polieren von kristallinem Silicium und Mittel zu seiner Durchfuehrung

Country Status (4)

Country Link
US (1) US3552071A (https=)
DE (1) DE1805861A1 (https=)
FR (1) FR1603234A (https=)
GB (1) GB1251340A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4057939A (en) * 1975-12-05 1977-11-15 International Business Machines Corporation Silicon wafer polishing
US6114248A (en) * 1998-01-15 2000-09-05 International Business Machines Corporation Process to reduce localized polish stop erosion
JP4428473B2 (ja) * 1999-01-18 2010-03-10 株式会社東芝 気相法無機酸化物粒子の含水固体状物質及び研磨用スラリーの製造方法

Also Published As

Publication number Publication date
GB1251340A (https=) 1971-10-27
FR1603234A (https=) 1971-03-22
US3552071A (en) 1971-01-05

Similar Documents

Publication Publication Date Title
DE2246610C3 (de) Photographischer Farbentwickler
DE2215263A1 (https=)
DE2944140A1 (de) Leuchtstoffmaterial fuer roentgenverstaerkerschirme
AT392465B (de) Verfahren zum herstellen von klinkern
DE1277097B (de) Leichtverputzmasse
DE2412516C2 (de) Gestrichene, druckempfindliche Kopierpapiere, Streichmasse und Pigmentmaterial zur Verwendung darin
DE1963414A1 (de) Wasserloeslicher Aluminium-Polyhydroxyl-Kohlenwasserstoff-Komplex
DE2019995C3 (de) Wäßrige Behandlungslösung zum Hydrophobieren von Silberbildern
DE1805861A1 (de) Verfahren zum Polieren von kristallinem Silicium und Mittel zu seiner Durchfuehrung
DE850384C (de) Photographischer Entwickler
DE1572209A1 (de) Kopierblatt
DE1921863B2 (de) Verfahren zum gewinnen von unverfaerbtem trockenem polyvinyl alkohol
DE645267C (de) Verfahren zur Herstellung von lichtempfindlichen Diazoschichten und Bildern hieraus auf beliebigen Unterlagen
DE200968C (https=)
DE69501528T2 (de) Nichtelektrolytische Goldplattierlösung
DE660599C (de) Verfahren zur Herstellung von Sicherheitspapier
DE406614C (de) Photographischer Film
DE1081760B (de) Diazotypiematerial und Verfahren zu seiner Herstellung
DE69612001T2 (de) Polierzusammensetzung für siliziumscheibe und verfahren
DE1592132A1 (de) Antacide Magnesium-aluminium-hydroxycarbonate und Verfahren zu deren Herstellung
DE691283C (de) Lichtempfindliches Material fuer Diazotypie
DE656137C (de) Verfahren zum Wasserdichtmachen von Baustoffen
DE2138791C3 (de) Verfahren zum Farben von Papier und Farbstoffpräparat zu dessen Durchfuhrung
DE1622921A1 (de) Photographisches lichtempfindliches Material
DE1813180C (de) Stabile Dispersionen von in Wasser loslichen anionischen Farbstoffen, deren Herstellung und Verwendung