DE1614877C3 - - Google Patents
Info
- Publication number
- DE1614877C3 DE1614877C3 DE1614877A DET0035057A DE1614877C3 DE 1614877 C3 DE1614877 C3 DE 1614877C3 DE 1614877 A DE1614877 A DE 1614877A DE T0035057 A DET0035057 A DE T0035057A DE 1614877 C3 DE1614877 C3 DE 1614877C3
- Authority
- DE
- Germany
- Prior art keywords
- diffusion
- base
- zone
- emitter
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000009792 diffusion process Methods 0.000 claims description 71
- 230000002401 inhibitory effect Effects 0.000 claims description 27
- 239000004065 semiconductor Substances 0.000 claims description 21
- 239000012535 impurity Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 10
- 230000004888 barrier function Effects 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1967T0035057 DE1614877B2 (de) | 1967-10-19 | 1967-10-19 | Verfahren zum herstellen eines planartransistors |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1967T0035057 DE1614877B2 (de) | 1967-10-19 | 1967-10-19 | Verfahren zum herstellen eines planartransistors |
Publications (3)
Publication Number | Publication Date |
---|---|
DE1614877A1 DE1614877A1 (de) | 1970-12-23 |
DE1614877B2 DE1614877B2 (de) | 1978-02-02 |
DE1614877C3 true DE1614877C3 (enrdf_load_stackoverflow) | 1978-10-19 |
Family
ID=7558944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1967T0035057 Granted DE1614877B2 (de) | 1967-10-19 | 1967-10-19 | Verfahren zum herstellen eines planartransistors |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE1614877B2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2417854A1 (fr) * | 1978-02-21 | 1979-09-14 | Radiotechnique Compelec | Transistor comportant une zone resistive integree dans sa region d'emetteur |
-
1967
- 1967-10-19 DE DE1967T0035057 patent/DE1614877B2/de active Granted
Also Published As
Publication number | Publication date |
---|---|
DE1614877B2 (de) | 1978-02-02 |
DE1614877A1 (de) | 1970-12-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C3 | Grant after two publication steps (3rd publication) | ||
EHJ | Ceased/non-payment of the annual fee |