DE1598850C3 - Auftreffplatte für Röntgenstrahlenbeugung - Google Patents

Auftreffplatte für Röntgenstrahlenbeugung

Info

Publication number
DE1598850C3
DE1598850C3 DE1598850A DE1598850A DE1598850C3 DE 1598850 C3 DE1598850 C3 DE 1598850C3 DE 1598850 A DE1598850 A DE 1598850A DE 1598850 A DE1598850 A DE 1598850A DE 1598850 C3 DE1598850 C3 DE 1598850C3
Authority
DE
Germany
Prior art keywords
target
line
intersection
sides
symmetry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE1598850A
Other languages
German (de)
English (en)
Other versions
DE1598850B2 (de
DE1598850A1 (de
Inventor
Wilhelmus Karel De Emmasingel Eindhoven Jongh (Niederlande)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of DE1598850A1 publication Critical patent/DE1598850A1/de
Publication of DE1598850B2 publication Critical patent/DE1598850B2/de
Application granted granted Critical
Publication of DE1598850C3 publication Critical patent/DE1598850C3/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/10—Different kinds of radiation or particles
    • G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
    • G01N2223/1016—X-ray
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/315—Accessories, mechanical or electrical features monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE1598850A 1964-09-10 1965-09-07 Auftreffplatte für Röntgenstrahlenbeugung Expired DE1598850C3 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6410514A NL6410514A (enExample) 1964-09-10 1964-09-10

Publications (3)

Publication Number Publication Date
DE1598850A1 DE1598850A1 (de) 1970-07-30
DE1598850B2 DE1598850B2 (de) 1974-01-24
DE1598850C3 true DE1598850C3 (de) 1974-08-08

Family

ID=19790980

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1598850A Expired DE1598850C3 (de) 1964-09-10 1965-09-07 Auftreffplatte für Röntgenstrahlenbeugung

Country Status (7)

Country Link
US (1) US3439163A (enExample)
AT (1) AT257212B (enExample)
BE (1) BE669377A (enExample)
CH (1) CH441813A (enExample)
DE (1) DE1598850C3 (enExample)
GB (1) GB1089714A (enExample)
NL (1) NL6410514A (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4132653A (en) * 1977-06-29 1979-01-02 Samson James A R Polarization analyzer for vacuum ultraviolet and x-ray radiation
DE3071231D1 (en) * 1979-08-28 1985-12-19 Gec Avionics X-ray diffraction apparatus
NL8300421A (nl) * 1983-02-04 1984-09-03 Philips Nv Roentgen onderzoek apparaat met dubbel focusserend kristal.
NL8302263A (nl) * 1983-06-27 1985-01-16 Philips Nv Roentgen analyse apparaat met dubbel gebogen monochromator kristal.
US4599741A (en) * 1983-11-04 1986-07-08 USC--Dept. of Materials Science System for local X-ray excitation by monochromatic X-rays
US4752945A (en) * 1985-11-04 1988-06-21 North American Philips Corp. Double crystal X-ray spectrometer
NL8801019A (nl) * 1988-04-20 1989-11-16 Philips Nv Roentgen spectrometer met dubbel gebogen kristal.
EP0765472A2 (en) * 1995-04-26 1997-04-02 Koninklijke Philips Electronics N.V. Method of manufacturing an x-ray optical element for an x-ray analysis apparatus
WO1998028609A1 (en) * 1996-12-20 1998-07-02 Koninklijke Philips Electronics N.V. X-ray spectrometer with an analyzer crystal having a partly variable and a partly constant radius of curvature
US6038285A (en) * 1998-02-02 2000-03-14 Zhong; Zhong Method and apparatus for producing monochromatic radiography with a bent laue crystal
US6259763B1 (en) * 1999-05-21 2001-07-10 The United States Of America As Represented By The United States Department Of Energy X-ray imaging crystal spectrometer for extended X-ray sources
CN101520422A (zh) * 2003-03-27 2009-09-02 株式会社理学 荧光x射线分析装置
US7076025B2 (en) 2004-05-19 2006-07-11 Illinois Institute Of Technology Method for detecting a mass density image of an object
US7330530B2 (en) * 2004-10-04 2008-02-12 Illinois Institute Of Technology Diffraction enhanced imaging method using a line x-ray source
JP2007093581A (ja) * 2005-09-01 2007-04-12 Jeol Ltd 波長分散型ｘ線分光器
US7469037B2 (en) * 2007-04-03 2008-12-23 Illinois Institute Of Technology Method for detecting a mass density image of an object
CN102460135A (zh) * 2009-06-03 2012-05-16 特莫尼托恩分析仪器股份有限公司 检测器位于聚焦元件内部的x射线系统和方法
JP2013096750A (ja) * 2011-10-28 2013-05-20 Hamamatsu Photonics Kk Ｘ線分光検出装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2853617A (en) * 1955-01-27 1958-09-23 California Inst Res Found Focusing crystal for x-rays and method of manufacture

Also Published As

Publication number Publication date
CH441813A (de) 1967-08-15
NL6410514A (enExample) 1966-03-11
DE1598850B2 (de) 1974-01-24
DE1598850A1 (de) 1970-07-30
US3439163A (en) 1969-04-15
AT257212B (de) 1967-09-25
BE669377A (enExample) 1966-03-08
GB1089714A (en) 1967-11-08

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E77 Valid patent as to the heymanns-index 1977
8339 Ceased/non-payment of the annual fee