DE1590750B1 - Verfahren zur herstellung von isolierschichten fuer elektrischevorrichtungen - Google Patents
Verfahren zur herstellung von isolierschichten fuer elektrischevorrichtungenInfo
- Publication number
- DE1590750B1 DE1590750B1 DE19661590750 DE1590750A DE1590750B1 DE 1590750 B1 DE1590750 B1 DE 1590750B1 DE 19661590750 DE19661590750 DE 19661590750 DE 1590750 A DE1590750 A DE 1590750A DE 1590750 B1 DE1590750 B1 DE 1590750B1
- Authority
- DE
- Germany
- Prior art keywords
- quartz
- vapor
- deposited
- layer
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Ceramic Engineering (AREA)
- Hall/Mr Elements (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US49233965A | 1965-10-01 | 1965-10-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1590750B1 true DE1590750B1 (de) | 1971-04-22 |
Family
ID=23955878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19661590750 Pending DE1590750B1 (de) | 1965-10-01 | 1966-09-28 | Verfahren zur herstellung von isolierschichten fuer elektrischevorrichtungen |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | USB492339I5 (enrdf_load_stackoverflow) |
| CH (1) | CH464303A (enrdf_load_stackoverflow) |
| DE (1) | DE1590750B1 (enrdf_load_stackoverflow) |
| GB (1) | GB1146754A (enrdf_load_stackoverflow) |
| NL (1) | NL6613837A (enrdf_load_stackoverflow) |
| SE (1) | SE332665B (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8624637D0 (en) * | 1986-10-14 | 1986-11-19 | Emi Plc Thorn | Electrical device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB315354A (en) * | 1928-07-12 | 1930-09-18 | Telefunken Gmbh | Improvements in or relating to electric insulating material |
| GB393562A (en) * | 1930-09-01 | 1933-06-08 | Gen Electric | Improvements in and relating to methods of fusing high dielectrics |
| DE596124C (de) * | 1930-01-16 | 1934-04-27 | Telefunken Gmbh | Elektrischer Apparat, bei welchem die sich erhitzenden Teile in ein hauptsaechlich aus Quarz bestehendes Isoliermaterial eingebettet sind |
| DE1159529B (de) * | 1961-01-25 | 1963-12-19 | Siemens Ag | Isolierschicht zwischen elektrischen Leitern |
-
0
- US US492339D patent/USB492339I5/en active Pending
-
1966
- 1966-09-28 DE DE19661590750 patent/DE1590750B1/de active Pending
- 1966-09-29 GB GB43640/66A patent/GB1146754A/en not_active Expired
- 1966-09-30 SE SE13237/66A patent/SE332665B/xx unknown
- 1966-09-30 CH CH1414066A patent/CH464303A/de unknown
- 1966-09-30 NL NL6613837A patent/NL6613837A/xx unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB315354A (en) * | 1928-07-12 | 1930-09-18 | Telefunken Gmbh | Improvements in or relating to electric insulating material |
| DE596124C (de) * | 1930-01-16 | 1934-04-27 | Telefunken Gmbh | Elektrischer Apparat, bei welchem die sich erhitzenden Teile in ein hauptsaechlich aus Quarz bestehendes Isoliermaterial eingebettet sind |
| GB393562A (en) * | 1930-09-01 | 1933-06-08 | Gen Electric | Improvements in and relating to methods of fusing high dielectrics |
| DE1159529B (de) * | 1961-01-25 | 1963-12-19 | Siemens Ag | Isolierschicht zwischen elektrischen Leitern |
Also Published As
| Publication number | Publication date |
|---|---|
| NL6613837A (enrdf_load_stackoverflow) | 1967-04-03 |
| CH464303A (de) | 1968-10-31 |
| GB1146754A (en) | 1969-03-26 |
| SE332665B (enrdf_load_stackoverflow) | 1971-02-15 |
| USB492339I5 (enrdf_load_stackoverflow) |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE1640457C2 (enrdf_load_stackoverflow) | ||
| DE2048915C3 (de) | Verfahren zum Herstellen eines metallischen Musters für eine Halbleiteranordnung | |
| DE2601656A1 (de) | Hochohmige metallkeramikschicht und verfahren zu deren herstellung | |
| DE1640457B1 (de) | Elektrische Verbindungen in Schaltkreisanordnungen und Verfahren zu ihrer Herstellung | |
| DE1950126A1 (de) | Verfahren zur Aufringung isolierender Filme und elektronische Bauelemente | |
| DE1640486C3 (de) | Verfahren zum reaktiven Zerstäuben von elementarem Silicium | |
| DE3014151C2 (de) | Generator für gepulste Elektronenstrahlen | |
| Campbell | Some dielectric properties of electron-beam evaporated yttrium oxide thin films | |
| DE1590682A1 (de) | Verfahren zur Herstellung von Duennfilm-Schaltvorrichtungen | |
| DE2220086B2 (de) | Vorrichtung zur Aufbringung eines Materials | |
| DE1590750B1 (de) | Verfahren zur herstellung von isolierschichten fuer elektrischevorrichtungen | |
| DE1105068B (de) | Verfahren zur Herstellung von Vielfachdioden | |
| DE2440169C2 (de) | Verfahren zur Herstellung von Josephson-Kontakten | |
| CH634605A5 (en) | Process for the preparation of coarsely crystalline and monocrystalline metal layers | |
| DE2550512A1 (de) | Verfahren zur herstellung einer metallisierung auf einem substrat | |
| DE3018510C2 (de) | Josephson-Übergangselement | |
| DE2534414A1 (de) | Magneto-widerstand und verfahren zu dessen herstellung | |
| EP0020395A1 (de) | Verfahren zum herstellen von halbleiterbauelementen | |
| DE1289187B (de) | Verfahren zum Herstellen einer mikroelektronischen Schaltungsanordnung | |
| DE3106212A1 (de) | "waermeableitkoerper fuer eine halbleiterzelle, insbesondere eine solarzelle" | |
| DE1764756A1 (de) | Duennschicht-Feldeffekt-Halbleiterbauelement | |
| DE2513509A1 (de) | Duennschicht-chipkondensator | |
| DE1665750A1 (de) | Magnetfeldabhaengiger Widerstand | |
| DE1163977B (de) | Sperrfreier Kontakt an einer Zone des Halbleiterkoerpers eines Halbleiterbauelementes | |
| DE2262022A1 (de) | Verfahren zur einstellung des widerstands-temperaturkoeffizienten |