DE112020002625T5 - Halbleitervorrichtung und Herstellungsverfahren dafür - Google Patents
Halbleitervorrichtung und Herstellungsverfahren dafür Download PDFInfo
- Publication number
- DE112020002625T5 DE112020002625T5 DE112020002625.6T DE112020002625T DE112020002625T5 DE 112020002625 T5 DE112020002625 T5 DE 112020002625T5 DE 112020002625 T DE112020002625 T DE 112020002625T DE 112020002625 T5 DE112020002625 T5 DE 112020002625T5
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- insulating layer
- conductor
- semiconductor device
- bonding
- semiconductor
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PCT/JP2020/023520 WO2020262097A1 (ja) | 2019-06-28 | 2020-06-16 | 半導体装置およびその製造方法 |
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