DE112019004100T5 - Vakuumbeschichtungseinrichtung, Verfahren zur Vakuumbeschichtung und Verfahren zur Herstellung einer Filmschicht in einer Filterkammer - Google Patents

Vakuumbeschichtungseinrichtung, Verfahren zur Vakuumbeschichtung und Verfahren zur Herstellung einer Filmschicht in einer Filterkammer Download PDF

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Publication number
DE112019004100T5
DE112019004100T5 DE112019004100.2T DE112019004100T DE112019004100T5 DE 112019004100 T5 DE112019004100 T5 DE 112019004100T5 DE 112019004100 T DE112019004100 T DE 112019004100T DE 112019004100 T5 DE112019004100 T5 DE 112019004100T5
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DE
Germany
Prior art keywords
vacuum
chamber
coating
substrates
transition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE112019004100.2T
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German (de)
English (en)
Inventor
Cong Shao
Jinqiao Zheng
Zhongxiao Song
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZTE Corp
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ZTE Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ZTE Corp filed Critical ZTE Corp
Publication of DE112019004100T5 publication Critical patent/DE112019004100T5/de
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
DE112019004100.2T 2018-08-13 2019-08-13 Vakuumbeschichtungseinrichtung, Verfahren zur Vakuumbeschichtung und Verfahren zur Herstellung einer Filmschicht in einer Filterkammer Pending DE112019004100T5 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201810917305.7A CN110819964A (zh) 2018-08-13 2018-08-13 真空镀膜设备、方法及滤波器腔体膜层的制备方法
CN201810917305.7 2018-08-13
PCT/CN2019/100441 WO2020034967A1 (zh) 2018-08-13 2019-08-13 真空镀膜设备、方法及滤波器腔体膜层的制备方法

Publications (1)

Publication Number Publication Date
DE112019004100T5 true DE112019004100T5 (de) 2021-07-15

Family

ID=69525104

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112019004100.2T Pending DE112019004100T5 (de) 2018-08-13 2019-08-13 Vakuumbeschichtungseinrichtung, Verfahren zur Vakuumbeschichtung und Verfahren zur Herstellung einer Filmschicht in einer Filterkammer

Country Status (4)

Country Link
JP (1) JP7122457B2 (zh)
CN (1) CN110819964A (zh)
DE (1) DE112019004100T5 (zh)
WO (1) WO2020034967A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113784604A (zh) * 2021-09-09 2021-12-10 重庆东玲光学元件有限公司 一种用于5g滤波器表面的薄膜层及其制备方法
CN114525469A (zh) * 2022-02-18 2022-05-24 重庆诺奖二维材料研究院有限公司 一种卷对卷真空镀膜机的控制系统及控制方法
CN115216747B (zh) * 2022-07-12 2023-04-28 中国科学院沈阳科学仪器股份有限公司 一种用于高温超导材料缓冲层的连续制备装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814341A (ja) * 1981-07-17 1983-01-27 Pioneer Electronic Corp デイスク等の被処理物のメタライジング装置におけるパレツト・ガイド機構
JP2845856B2 (ja) * 1997-03-10 1999-01-13 出光興産株式会社 有機エレクトロルミネッセンス素子の製造方法
JP2003313658A (ja) * 2002-04-23 2003-11-06 Nippon Sheet Glass Co Ltd 成膜装置
JP2004227621A (ja) * 2003-01-20 2004-08-12 Fuji Photo Film Co Ltd 磁気記録媒体の製造方法およびその製造装置
JP5330721B2 (ja) * 2007-10-23 2013-10-30 オルボテック エルティ ソラー，エルエルシー 処理装置および処理方法
JP2011058048A (ja) * 2009-09-10 2011-03-24 Nikuni:Kk 真空成膜方法およびその装置
SG11201504191RA (en) * 2011-06-08 2015-07-30 Semiconductor Energy Lab Sputtering target, method for manufacturing sputtering target, and method for forming thin film
US8884476B2 (en) * 2011-09-23 2014-11-11 General Electric Company Hybrid dielectric film for high temperature application
WO2014122700A1 (ja) * 2013-02-05 2014-08-14 キヤノンアネルバ株式会社 成膜装置
CN203333755U (zh) * 2013-05-09 2013-12-11 肇庆市腾胜真空技术工程有限公司 带独立真空锁的真空镀膜装置
US20150040970A1 (en) * 2013-08-06 2015-02-12 First Solar, Inc. Vacuum Deposition System For Solar Cell Production And Method Of Manufacturing
CN104342625A (zh) * 2014-03-21 2015-02-11 宁波海燕家电玻璃技术有限公司 一种用真空镀膜制备黑色硼硅玻璃的方法
JP6423290B2 (ja) * 2015-03-06 2018-11-14 東京エレクトロン株式会社 成膜装置
US10468238B2 (en) * 2015-08-21 2019-11-05 Applied Materials, Inc. Methods and apparatus for co-sputtering multiple targets
CN105256284B (zh) * 2015-11-17 2018-08-28 肇庆市科润真空设备有限公司 环保铝镜真空镀膜设备
CN106747675A (zh) * 2016-11-29 2017-05-31 浙江大学 一种微波介质陶瓷表面金属化的方法
CN207376113U (zh) * 2017-10-11 2018-05-18 广东腾胜真空技术工程有限公司 一种磁材镀膜设备
CN108342705B (zh) * 2018-03-14 2020-01-24 南京理工大学 具有自愈合功能的Ta基高温防护涂层的制备方法

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Publication number Publication date
CN110819964A (zh) 2020-02-21
JP2021533274A (ja) 2021-12-02
JP7122457B2 (ja) 2022-08-19
WO2020034967A1 (zh) 2020-02-20

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