DE112015006061T5 - Lichtemittierende Vorrichtung - Google Patents
Lichtemittierende Vorrichtung Download PDFInfo
- Publication number
- DE112015006061T5 DE112015006061T5 DE112015006061.8T DE112015006061T DE112015006061T5 DE 112015006061 T5 DE112015006061 T5 DE 112015006061T5 DE 112015006061 T DE112015006061 T DE 112015006061T DE 112015006061 T5 DE112015006061 T5 DE 112015006061T5
- Authority
- DE
- Germany
- Prior art keywords
- light
- electrodes
- electrode
- emitting device
- bulking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009413 insulation Methods 0.000 claims abstract description 324
- 239000004065 semiconductor Substances 0.000 claims description 170
- 239000000463 material Substances 0.000 claims description 56
- 230000000994 depressogenic effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 157
- 239000010410 layer Substances 0.000 description 564
- 238000000034 method Methods 0.000 description 117
- 229910052751 metal Inorganic materials 0.000 description 72
- 230000035882 stress Effects 0.000 description 72
- 239000002184 metal Substances 0.000 description 68
- 230000008569 process Effects 0.000 description 45
- 230000008878 coupling Effects 0.000 description 40
- 238000010168 coupling process Methods 0.000 description 40
- 238000005859 coupling reaction Methods 0.000 description 40
- 229910052759 nickel Inorganic materials 0.000 description 23
- 238000000926 separation method Methods 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 20
- 238000000576 coating method Methods 0.000 description 19
- 230000005855 radiation Effects 0.000 description 19
- 238000000151 deposition Methods 0.000 description 17
- 238000005516 engineering process Methods 0.000 description 17
- 229910052719 titanium Inorganic materials 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000005530 etching Methods 0.000 description 15
- 229910000679 solder Inorganic materials 0.000 description 15
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 14
- 229910052804 chromium Inorganic materials 0.000 description 14
- 239000007769 metal material Substances 0.000 description 14
- 229910052737 gold Inorganic materials 0.000 description 13
- 229910052709 silver Inorganic materials 0.000 description 13
- 229910052802 copper Inorganic materials 0.000 description 12
- 230000008021 deposition Effects 0.000 description 12
- 229910052697 platinum Inorganic materials 0.000 description 12
- 229910004298 SiO 2 Inorganic materials 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 11
- 230000007547 defect Effects 0.000 description 11
- 230000003287 optical effect Effects 0.000 description 11
- 238000000059 patterning Methods 0.000 description 11
- 238000009792 diffusion process Methods 0.000 description 10
- 239000002356 single layer Substances 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 229910052763 palladium Inorganic materials 0.000 description 9
- 230000003405 preventing effect Effects 0.000 description 9
- 238000005566 electron beam evaporation Methods 0.000 description 8
- 229920006336 epoxy molding compound Polymers 0.000 description 7
- 238000002955 isolation Methods 0.000 description 7
- 230000002829 reductive effect Effects 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 238000007650 screen-printing Methods 0.000 description 7
- 239000012790 adhesive layer Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 229910052721 tungsten Inorganic materials 0.000 description 6
- 238000001039 wet etching Methods 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 230000032798 delamination Effects 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 239000011810 insulating material Substances 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 229910052703 rhodium Inorganic materials 0.000 description 5
- 229910052594 sapphire Inorganic materials 0.000 description 5
- 239000010980 sapphire Substances 0.000 description 5
- 229920002050 silicone resin Polymers 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 5
- 229910002601 GaN Inorganic materials 0.000 description 4
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 3
- 210000004197 pelvis Anatomy 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910004205 SiNX Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910008599 TiW Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000000149 argon plasma sintering Methods 0.000 description 2
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000000407 epitaxy Methods 0.000 description 2
- 230000005496 eutectics Effects 0.000 description 2
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000001451 molecular beam epitaxy Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920000052 poly(p-xylylene) Polymers 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 239000002096 quantum dot Substances 0.000 description 2
- 230000002040 relaxant effect Effects 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910017083 AlN Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- LICUQAFOHXHWQC-UHFFFAOYSA-N [S].OP(O)(O)=O Chemical compound [S].OP(O)(O)=O LICUQAFOHXHWQC-UHFFFAOYSA-N 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000002223 garnet Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000000088 plastic resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/56—Materials, e.g. epoxy or silicone resin
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/64—Heat extraction or cooling elements
- H01L33/647—Heat extraction or cooling elements the elements conducting electric current to or from the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0091—Scattering means in or on the semiconductor body or semiconductor body package
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/12—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a stress relaxation structure, e.g. buffer layer
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Led Device Packages (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2015-0012864 | 2015-01-27 | ||
KR20150012864 | 2015-01-27 | ||
KR1020150076527A KR102407827B1 (ko) | 2015-01-27 | 2015-05-29 | 발광 소자 |
KR10-2015-0076527 | 2015-05-29 | ||
PCT/KR2015/009087 WO2016122076A1 (en) | 2015-01-27 | 2015-08-28 | Light emitting device |
Publications (1)
Publication Number | Publication Date |
---|---|
DE112015006061T5 true DE112015006061T5 (de) | 2017-10-19 |
Family
ID=56709498
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE112015006061.8T Pending DE112015006061T5 (de) | 2015-01-27 | 2015-08-28 | Lichtemittierende Vorrichtung |
Country Status (3)
Country | Link |
---|---|
KR (2) | KR102407827B1 (zh) |
CN (2) | CN110854251B (zh) |
DE (1) | DE112015006061T5 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102018119734A1 (de) * | 2018-08-14 | 2020-02-20 | Osram Opto Semiconductors Gmbh | Optoelektronisches halbleiterbauelement mit einem trägerelement, welches ein elektrisch leitendes material umfasst |
CN114023858A (zh) * | 2021-11-02 | 2022-02-08 | 厦门三安光电有限公司 | 一种发光二极管、发光模块及发光装置 |
DE102020215562A1 (de) | 2020-12-09 | 2022-06-09 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur herstellung eines optoelektronischen halbleiterbauelements, verfahren zur herstellung elektrischer kontakte und optoelektronisches halbleiterbauelement |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114188471A (zh) * | 2016-09-05 | 2022-03-15 | 首尔伟傲世有限公司 | 芯片级封装发光二极管 |
JP7096261B2 (ja) | 2017-07-18 | 2022-07-05 | ルーメンス カンパニー リミテッド | 発光ダイオードモジュール製造装置及び方法 |
WO2019017584A1 (ko) * | 2017-07-18 | 2019-01-24 | 주식회사 루멘스 | 발광다이오드 모듈 제조 장치 및 방법 |
CN107768491B (zh) * | 2017-10-31 | 2019-11-22 | 江苏新广联半导体有限公司 | 用于手环的MicroLED显示模块制作方法 |
CN108091753B (zh) * | 2018-01-22 | 2023-08-25 | 扬州大学 | 一种光源元件 |
KR102066517B1 (ko) * | 2018-06-11 | 2020-01-15 | 주식회사 세미콘라이트 | 반도체 발광소자 |
WO2019240371A1 (ko) * | 2018-06-11 | 2019-12-19 | 주식회사 세미콘라이트 | 반도체 발광소자 |
KR102624112B1 (ko) | 2018-10-23 | 2024-01-12 | 서울바이오시스 주식회사 | 플립칩형 발광 다이오드 칩 |
CN111863853A (zh) * | 2019-04-24 | 2020-10-30 | 深圳第三代半导体研究院 | 一种垂直集成单元二极管芯片 |
CN110491976A (zh) * | 2019-08-22 | 2019-11-22 | 佛山市国星半导体技术有限公司 | 一种抗水解的倒装led芯片及其制备方法 |
TWI795790B (zh) | 2021-05-26 | 2023-03-11 | 隆達電子股份有限公司 | 發光元件與應用其之顯示裝置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4810746B2 (ja) * | 2000-03-31 | 2011-11-09 | 豊田合成株式会社 | Iii族窒化物系化合物半導体素子 |
JP2003273408A (ja) | 2000-07-31 | 2003-09-26 | Nichia Chem Ind Ltd | 発光装置 |
US7179670B2 (en) * | 2004-03-05 | 2007-02-20 | Gelcore, Llc | Flip-chip light emitting diode device without sub-mount |
JP5008263B2 (ja) * | 2005-03-02 | 2012-08-22 | 日亜化学工業株式会社 | 半導体発光素子 |
US8368100B2 (en) * | 2007-11-14 | 2013-02-05 | Cree, Inc. | Semiconductor light emitting diodes having reflective structures and methods of fabricating same |
US8008683B2 (en) * | 2008-10-22 | 2011-08-30 | Samsung Led Co., Ltd. | Semiconductor light emitting device |
KR101252032B1 (ko) | 2010-07-08 | 2013-04-10 | 삼성전자주식회사 | 반도체 발광소자 및 이의 제조방법 |
KR101142965B1 (ko) * | 2010-09-24 | 2012-05-08 | 서울반도체 주식회사 | 웨이퍼 레벨 발광 다이오드 패키지 및 그것을 제조하는 방법 |
KR101691589B1 (ko) * | 2011-09-16 | 2017-01-02 | 서울바이오시스 주식회사 | 발광 다이오드 및 그것을 제조하는 방법 |
KR101969334B1 (ko) * | 2011-11-16 | 2019-04-17 | 엘지이노텍 주식회사 | 발광 소자 및 이를 구비한 발광 장치 |
US9577172B2 (en) | 2013-02-19 | 2017-02-21 | Koninklijke Philips N.V. | Light emitting die component formed by multilayer structures |
KR102075147B1 (ko) | 2013-06-05 | 2020-02-10 | 엘지이노텍 주식회사 | 발광 소자 및 발광 소자 패키지 |
US9640729B2 (en) * | 2013-07-03 | 2017-05-02 | Koninklijke Philips N.V. | LED with stress-buffer layer under metallization layer |
-
2015
- 2015-05-29 KR KR1020150076527A patent/KR102407827B1/ko active IP Right Grant
- 2015-08-28 DE DE112015006061.8T patent/DE112015006061T5/de active Pending
- 2015-08-28 CN CN201911071816.2A patent/CN110854251B/zh active Active
- 2015-08-28 CN CN201580038935.1A patent/CN106537616B/zh active Active
-
2022
- 2022-06-07 KR KR1020220069034A patent/KR102546262B1/ko active IP Right Grant
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102018119734A1 (de) * | 2018-08-14 | 2020-02-20 | Osram Opto Semiconductors Gmbh | Optoelektronisches halbleiterbauelement mit einem trägerelement, welches ein elektrisch leitendes material umfasst |
DE102020215562A1 (de) | 2020-12-09 | 2022-06-09 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Verfahren zur herstellung eines optoelektronischen halbleiterbauelements, verfahren zur herstellung elektrischer kontakte und optoelektronisches halbleiterbauelement |
CN114023858A (zh) * | 2021-11-02 | 2022-02-08 | 厦门三安光电有限公司 | 一种发光二极管、发光模块及发光装置 |
CN114023858B (zh) * | 2021-11-02 | 2023-07-14 | 厦门三安光电有限公司 | 一种发光二极管、发光模块及发光装置 |
Also Published As
Publication number | Publication date |
---|---|
CN106537616B (zh) | 2019-12-03 |
CN106537616A (zh) | 2017-03-22 |
KR102546262B1 (ko) | 2023-06-23 |
KR20160092465A (ko) | 2016-08-04 |
CN110854251B (zh) | 2023-03-07 |
KR102407827B1 (ko) | 2022-06-13 |
CN110854251A (zh) | 2020-02-28 |
KR20220088382A (ko) | 2022-06-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE112015006061T5 (de) | Lichtemittierende Vorrichtung | |
DE102012109460B4 (de) | Verfahren zur Herstellung eines Leuchtdioden-Displays und Leuchtdioden-Display | |
DE112014000592B4 (de) | Verfahren zum Herstellen von lichtemittierenden Nanostrukturhalbleitervorrichtungen | |
DE102009018603B9 (de) | Leuchtvorrichtung und Herstellungsverfahren derselben | |
EP2162928B1 (de) | Verfahren zur herstellung einer mehrzahl optoelektronischer bauelemente und optoelektronisches bauelement | |
DE10325951B4 (de) | Licht emittierende Diode mit zugehörigem Kontaktschema | |
DE10204386B4 (de) | Leuchtdiode und Verfahren zu ihrer Herstellung | |
EP2612372B1 (de) | Leuchtdiodenchip | |
DE202007019433U1 (de) | Licht emittierende Vorrichtung mit vertikaler Struktur, und Baugruppe hiervon | |
WO2014048988A1 (de) | Verfahren zur herstellung eines optoelektronischen bauelements | |
DE102013108769A1 (de) | Lichtemittierende Halbleitervorrichtung und Verfahren zum Herstellen derselben | |
DE102009025456A1 (de) | Lichtemittierendes Bauelement, selbiges enthaltende lichtemittierende Vorrichtung und Verfahren zur Herstellung desselben | |
DE112016000731T5 (de) | Lichtaussendeelement und leuchtdiode | |
DE102006061167A1 (de) | Optoelektronisches Halbleiterbauelement | |
DE112016000430T5 (de) | Hocheffiziente leds und verfahren zu deren herstellung | |
DE102004036295A1 (de) | Flip-Chip-Leuchtdioden-Bauelemente mit Substraten, deren Dicke verringert wurde oder die entfernt wurden | |
DE102007004302A1 (de) | Halbleiterchip und Verfahren zur Herstellung eines Halbleiterchips | |
DE102014011893A1 (de) | Leuchtdiode | |
DE102015114587A1 (de) | Optoelektronisches Halbleiterbauelement und Verfahren zu dessen Herstellung | |
DE102007062046A1 (de) | Lichtemittierende Bauelementeanordnung, lichtemittierendes Bauelementes sowie Verfahren zum Herstellen einer Bauelementeanordnung | |
US11784176B2 (en) | Light emitting diode device containing a positive photoresist insulating spacer and a conductive sidewall contact and method of making the same | |
WO2012013523A1 (de) | Strahlungsemittierender halbleiterchip und verfahren zur herstellung eines strahlungsemittierenden halbleiterchips | |
WO2019115344A1 (de) | Lichtemittierendes halbleiterbauteil und verfahren zur herstellung eines licht emittierenden halbleiterbauteils | |
WO2020064947A1 (de) | Optoelektronisches bauelement mit dielektrischer spiegelschicht und dessen herstellungsverfahren | |
CN115989590A (zh) | 用于直视型显示器的次像素发光二极管及其制造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
R012 | Request for examination validly filed | ||
R016 | Response to examination communication |