DE112012002094B4 - Siliziumcarbidpulver und Verfahren für die Herstellung von Siliziumcarbidpulver - Google Patents
Siliziumcarbidpulver und Verfahren für die Herstellung von Siliziumcarbidpulver Download PDFInfo
- Publication number
- DE112012002094B4 DE112012002094B4 DE112012002094.4T DE112012002094T DE112012002094B4 DE 112012002094 B4 DE112012002094 B4 DE 112012002094B4 DE 112012002094 T DE112012002094 T DE 112012002094T DE 112012002094 B4 DE112012002094 B4 DE 112012002094B4
- Authority
- DE
- Germany
- Prior art keywords
- silicon carbide
- carbide powder
- silicon
- powder
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 211
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 238000000034 method Methods 0.000 title claims description 24
- 229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 94
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 90
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 49
- 239000013078 crystal Substances 0.000 claims abstract description 25
- 238000010438 heat treatment Methods 0.000 claims abstract description 25
- 239000000203 mixture Substances 0.000 claims abstract description 22
- 238000010298 pulverizing process Methods 0.000 claims abstract description 8
- 239000002243 precursor Substances 0.000 claims description 29
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 15
- 229910052796 boron Inorganic materials 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 238000002156 mixing Methods 0.000 claims description 6
- 238000002360 preparation method Methods 0.000 claims description 5
- HJELPJZFDFLHEY-UHFFFAOYSA-N silicide(1-) Chemical compound [Si-] HJELPJZFDFLHEY-UHFFFAOYSA-N 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 abstract description 40
- 239000010703 silicon Substances 0.000 abstract description 40
- 229910052799 carbon Inorganic materials 0.000 description 51
- 238000002441 X-ray diffraction Methods 0.000 description 37
- 239000000843 powder Substances 0.000 description 31
- 229910002804 graphite Inorganic materials 0.000 description 26
- 239000010439 graphite Substances 0.000 description 26
- 239000002994 raw material Substances 0.000 description 20
- 239000007858 starting material Substances 0.000 description 17
- 239000000126 substance Substances 0.000 description 15
- 239000000470 constituent Substances 0.000 description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000000634 powder X-ray diffraction Methods 0.000 description 9
- 239000007789 gas Substances 0.000 description 7
- 238000004451 qualitative analysis Methods 0.000 description 7
- 238000004445 quantitative analysis Methods 0.000 description 7
- 238000007796 conventional method Methods 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 239000011261 inert gas Substances 0.000 description 5
- 238000011049 filling Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 101100493820 Caenorhabditis elegans best-1 gene Proteins 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001036 glow-discharge mass spectrometry Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
- C01B32/956—Silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
- C01B32/956—Silicon carbide
- C01B32/963—Preparation from compounds containing silicon
- C01B32/984—Preparation from elemental silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/007—Apparatus for preparing, pre-treating the source material to be used for crystal growth
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Carbon And Carbon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011-110959 | 2011-05-18 | ||
JP2011110959A JP2012240869A (ja) | 2011-05-18 | 2011-05-18 | 炭化珪素粉末および炭化珪素粉末の製造方法 |
PCT/JP2012/051621 WO2012157293A1 (ja) | 2011-05-18 | 2012-01-26 | 炭化珪素粉末および炭化珪素粉末の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE112012002094T5 DE112012002094T5 (de) | 2014-07-24 |
DE112012002094B4 true DE112012002094B4 (de) | 2014-12-24 |
Family
ID=47175131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE112012002094.4T Expired - Fee Related DE112012002094B4 (de) | 2011-05-18 | 2012-01-26 | Siliziumcarbidpulver und Verfahren für die Herstellung von Siliziumcarbidpulver |
Country Status (5)
Country | Link |
---|---|
US (1) | US20120295112A1 (enrdf_load_stackoverflow) |
JP (1) | JP2012240869A (enrdf_load_stackoverflow) |
CN (1) | CN102958834A (enrdf_load_stackoverflow) |
DE (1) | DE112012002094B4 (enrdf_load_stackoverflow) |
WO (1) | WO2012157293A1 (enrdf_load_stackoverflow) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9630854B2 (en) | 2013-06-26 | 2017-04-25 | Bridgestone Corporation | Silicon carbide powder |
KR102092279B1 (ko) * | 2013-08-29 | 2020-03-23 | 엘지이노텍 주식회사 | 탄화규소 분말 |
KR102092280B1 (ko) * | 2013-08-29 | 2020-03-23 | 엘지이노텍 주식회사 | 탄화규소 분말 |
JP6304477B2 (ja) * | 2013-09-04 | 2018-04-04 | 太平洋セメント株式会社 | 炭化珪素粉粒体及びその製造方法 |
JP2016532629A (ja) * | 2013-09-06 | 2016-10-20 | ジーティーエイティー コーポレーションGtat Corporation | 炭化ケイ素前駆体からのバルクの炭化ケイ素の製造方法及び装置 |
JP6337389B2 (ja) * | 2013-12-06 | 2018-06-06 | 太平洋セメント株式会社 | 炭化珪素粉粒体の製造方法 |
CN105603530B (zh) * | 2016-01-12 | 2018-02-27 | 台州市一能科技有限公司 | 用于碳化硅晶体高速生长的原料及碳化硅晶体的生长方法 |
JP6809912B2 (ja) * | 2017-01-25 | 2021-01-06 | 太平洋セメント株式会社 | 炭化珪素粉末、その製造方法、及び炭化珪素単結晶の製造方法 |
JP7000104B2 (ja) * | 2017-10-04 | 2022-01-19 | キヤノン株式会社 | 造形方法および造形用の粉末材料 |
JP7442288B2 (ja) * | 2019-09-30 | 2024-03-04 | 株式会社フジミインコーポレーテッド | セラミックス粉末 |
CN111172593B (zh) * | 2020-03-06 | 2021-01-29 | 福建三邦硅材料有限公司 | 一种碳化硅晶体的生长方法 |
KR102442730B1 (ko) * | 2021-12-23 | 2022-09-13 | 주식회사 쎄닉 | 탄화규소 분말, 이를 이용하여 탄화규소 잉곳을 제조하는 방법 및 탄화규소 웨이퍼 |
US20250162882A1 (en) | 2022-02-24 | 2025-05-22 | Tokuyama Corporation | Silicon Carbide Powder, and Production Method Thereof |
JPWO2024122174A1 (enrdf_load_stackoverflow) | 2022-12-09 | 2024-06-13 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000004211A1 (de) * | 1998-07-13 | 2000-01-27 | Siemens Aktiengesellschaft | VERFAHREN ZUR ZÜCHTUNG VON SiC-EINKRISTALLEN |
JP2001180919A (ja) * | 1999-12-24 | 2001-07-03 | Sumitomo Electric Ind Ltd | 炭化珪素−炭素系複合粉末とそれを用いた複合材料 |
JP2005239496A (ja) * | 2004-02-27 | 2005-09-08 | Nippon Steel Corp | 炭化珪素単結晶育成用炭化珪素原料と炭化珪素単結晶及びその製造方法 |
JP2005314217A (ja) * | 2004-03-29 | 2005-11-10 | Nippon Steel Corp | 炭化珪素単結晶およびその製造方法 |
WO2009075935A1 (en) * | 2007-12-12 | 2009-06-18 | Dow Corning Corporation | Method to manufacture large uniform ingots of silicon carbide by sublimation/condensation processes |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1142332C (zh) * | 2001-03-13 | 2004-03-17 | 中国科学院山西煤炭化学研究所 | 一种制备碳化硅纤维或织物的方法 |
US20040043888A1 (en) * | 2002-08-28 | 2004-03-04 | Noritake Co., Limited | Compositions and methods for making microporous ceramic materials |
US7419545B2 (en) * | 2004-12-28 | 2008-09-02 | Matsushita Electric Industrial Co., Ltd. | Method for producing silicon carbide (SiC) single crystal and silicon carbide (SiC) single crystal obtained by such method |
CN100560486C (zh) * | 2007-07-30 | 2009-11-18 | 中国地质大学(武汉) | 一种制备纳米碳化硅的方法 |
JP2009173501A (ja) * | 2008-01-28 | 2009-08-06 | Bridgestone Corp | 炭化ケイ素単結晶製造用高純度炭化ケイ素粉体の製造方法及び炭化ケイ素単結晶 |
CN101525134B (zh) * | 2009-04-02 | 2010-10-06 | 山东大学 | 一种用废塑料低温制备立方碳化硅超细粉的方法 |
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2011
- 2011-05-18 JP JP2011110959A patent/JP2012240869A/ja active Pending
-
2012
- 2012-01-26 WO PCT/JP2012/051621 patent/WO2012157293A1/ja active Application Filing
- 2012-01-26 CN CN201280001101XA patent/CN102958834A/zh active Pending
- 2012-01-26 DE DE112012002094.4T patent/DE112012002094B4/de not_active Expired - Fee Related
- 2012-05-07 US US13/465,296 patent/US20120295112A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000004211A1 (de) * | 1998-07-13 | 2000-01-27 | Siemens Aktiengesellschaft | VERFAHREN ZUR ZÜCHTUNG VON SiC-EINKRISTALLEN |
JP2001180919A (ja) * | 1999-12-24 | 2001-07-03 | Sumitomo Electric Ind Ltd | 炭化珪素−炭素系複合粉末とそれを用いた複合材料 |
JP2005239496A (ja) * | 2004-02-27 | 2005-09-08 | Nippon Steel Corp | 炭化珪素単結晶育成用炭化珪素原料と炭化珪素単結晶及びその製造方法 |
JP2005314217A (ja) * | 2004-03-29 | 2005-11-10 | Nippon Steel Corp | 炭化珪素単結晶およびその製造方法 |
WO2009075935A1 (en) * | 2007-12-12 | 2009-06-18 | Dow Corning Corporation | Method to manufacture large uniform ingots of silicon carbide by sublimation/condensation processes |
Also Published As
Publication number | Publication date |
---|---|
CN102958834A (zh) | 2013-03-06 |
DE112012002094T5 (de) | 2014-07-24 |
JP2012240869A (ja) | 2012-12-10 |
US20120295112A1 (en) | 2012-11-22 |
WO2012157293A1 (ja) | 2012-11-22 |
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